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    Positive resist composition and pattern forming method using the same
    3.
    发明授权
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07923196B2

    公开(公告)日：2011-04-12

    申请号：US12672329

    申请日：2008-08-01

    申请人： Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Shuji Hirano ,  Jiro Yokoyama ,  Shinichi Sugiyama

    发明人： Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Shuji Hirano ,  Jiro Yokoyama ,  Shinichi Sugiyama

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  C08F8/12 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0392 ,  Y10S430/114 ,  Y10S430/146 ,  C08F220/18 ,  C08F2220/1825 ,  C08F220/14

    摘要： A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R1 independently represents hydrogen or a methyl group, R2 represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.

    摘要翻译： 一种正型抗蚀剂组合物，其包含（A）含有由式（I）至（III）表示的所有重复单元的树脂，并且通过酸的作用变得可溶于碱性显影剂，和（B）能够 在用光化射线或辐射照射时产生酸; 以及使用该组合物的图案形成方法。 A表示能够通过酸的分解和离去的基团，每个R 1独立地表示氢或甲基，R 2表示苯基或环己基，m表示1或2，n表示0〜 通过这种结构，提供了确保高分辨率，良好的图案轮廓，足够的焦深，显影后的小缺陷以及足够高的耐等离子体耐蚀刻性的抗蚀剂组合物。

    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    4.
    发明申请
    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
    正极性组合物和使用其的图案形成方法

    公开(公告)号：US20100248146A1

    公开(公告)日：2010-09-30

    申请号：US12672329

    申请日：2008-08-01

    申请人： Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Shuji Hirano ,  Jiro Yokoyama ,  Shinichi Sugiyama

    发明人： Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Shuji Hirano ,  Jiro Yokoyama ,  Shinichi Sugiyama

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  C08F8/12 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0392 ,  Y10S430/114 ,  Y10S430/146 ,  C08F220/18 ,  C08F2220/1825 ,  C08F220/14

    摘要： A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R1 independently represents hydrogen or a methyl group, R2 represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.

    摘要翻译： 一种正型抗蚀剂组合物，其包含（A）含有由式（I）至（III）表示的所有重复单元的树脂，并且通过酸的作用变得可溶于碱性显影剂，和（B）能够 在用光化射线或辐射照射时产生酸; 以及使用该组合物的图案形成方法。 A表示能够通过酸的分解和离去的基团，每个R 1独立地表示氢或甲基，R 2表示苯基或环己基，m表示1或2，n表示0〜 通过这种结构，提供了确保高分辨率，良好的图案轮廓，足够的焦深，显影后的小缺陷以及足够高的耐等离子体耐蚀刻性的抗蚀剂组合物。

    Resist composition and pattern-forming method using the same
    5.
    发明授权
    Resist composition and pattern-forming method using the same 有权
    抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07989137B2

    公开(公告)日：2011-08-02

    申请号：US12238856

    申请日：2008-09-26

    申请人： Shuji Hirano ,  Kazuyoshi Mizutani ,  Shinichi Sugiyama ,  Jiro Yokoyama

    发明人： Shuji Hirano ,  Kazuyoshi Mizutani ,  Shinichi Sugiyama ,  Jiro Yokoyama

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A resist composition includes (A) a resin including: a repeating unit capable of decomposing by the action of an acid to increase solubility in an alkali developing solution and represented by formula (I), and a repeating unit represented by formula (II); and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation: wherein A represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxyl group, a halogen atom, a cyano group, a nitro group, an acyl group, an acyloxy group, a cycloalkyl group, an aryl group, a carboxyl group, an alkyloxycarbonyl group, an alkylcarbonyloxy group, or an aralkyl group; Ra represents a group containing a group capable of decomposing by the action of an acid; Rb represents an alkylene group, a cycloalkylene group, or a group of combining these groups; Y represents a heterocyclic group; and m represents 0 or 1.

    摘要翻译： 抗蚀剂组合物包括（A）树脂，其包含：能够通过酸的分解而分解的碱性显影液中的溶解度并由式（I）表示的重复单元和由式（II）表示的重复单元的重复单元; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中A表示氢原子，烷基，羟基，烷氧基，卤素原子，氰基，硝基， 酰基，酰氧基，环烷基，芳基，羧基，烷氧基羰基，烷基羰基氧基或芳烷基; Ra表示含有能够通过酸的作用分解的基团的基团; Rb表示亚烷基，亚环烷基或组合这些基团的基团; Y表示杂环基; m表示0或1。