公开(公告)号：US06788385B2

公开(公告)日：2004-09-07

申请号：US10134607

申请日：2002-04-30

申请人： Keiichi Tanaka ,  Michael Binnard ,  Robert Martinek ,  Andrew J. Hazelton

发明人： Keiichi Tanaka ,  Michael Binnard ,  Robert Martinek ,  Andrew J. Hazelton

IPC分类号： G03B2742

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70766 ,  G03F7/709

摘要： In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices. The above configuration of the stage device permits and restrains a change in attitude of each stage due to driving of the substrate table.

摘要翻译： 在曝光装置的舞台装置中，第一级通过第一X轴电动机沿X轴方向驱动，同时由第一导杆一侧支撑，并且第二级在X轴上被驱动 方向由第二X轴电机同时由第二引导杆一侧支撑。 第一导杆和第二导杆通过Y轴线性电动机在Y轴方向上独立地驱动。 在第一引导杆和第二引导杆彼此最靠近的状态下，与由第一引导杆支撑的一侧相对的第一级的端部设置在第二引导杆的上方，而第二引导杆的端部 与由第二导杆支撑的一侧相对的台架放置在第一导杆的上方。 第一和第二衬底台分别经由第一和第二微动驱动装置支撑在第一和第二级上方。 舞台装置的上述构造允许并且抑制由于衬底台的驱动而引起的每一级的姿态变化。

公开(公告)号：US06958808B2

公开(公告)日：2005-10-25

申请号：US10458384

申请日：2003-06-11

申请人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

发明人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

IPC分类号： G03B27/62 ,  G03F7/20 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03B27/62 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70766 ,  G03F7/709

摘要： A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly. With this design, the reaction mover assembly has less influence upon the position of the stage base. This allows for more accurate positioning of the device by the stage assembly and better performance of the stage assembly.

摘要翻译： 本文提供了用于移动和定位设备的台架组件。 舞台组件包括舞台基座，舞台，舞台推动器组件，反作用组件，反作用器组件和控制系统。 平台移动器组件相对于舞台底座移动舞台。 反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。 反应动子组件调整反应物料组件相对于载物台的位置。 独特地，控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。 更具体地，改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的干扰的影响。 通过这种设计，反作用器组件对舞台底座的位置的影响较小。 这允许通过平台组件更好地定位设备并且更好地实现舞台组件的性能。

公开(公告)号：US06252234B1

公开(公告)日：2001-06-26

申请号：US09134278

申请日：1998-08-14

申请人： Andrew J. Hazelton ,  Keiichi Tanaka ,  Yutaka Hayashi ,  Nobukazu Ito

发明人： Andrew J. Hazelton ,  Keiichi Tanaka ,  Yutaka Hayashi ,  Nobukazu Ito

IPC分类号： G01F2300

CPC分类号： G03F7/70358 ,  F16F15/02 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70833 ,  G03F7/709

摘要： The present invention provides a structure for isolating the reaction forces generated by a planar motor. Specifically, the fixed portion of the reaction motor, which is subject to reaction forces, is structurally isolated from the rest of the system in which the planar motor is deployed. In accordance with one embodiment of the present invention, the fixed portion of the planar motor is separated from the rest of the system and coupled to ground. The rest of the system is isolated from ground by deploying vibration isolation means. Alternatively or in addition, the fixed portion of the planar motor may be structured to move (e.g., on bearings) in the presence of reaction forces, so as to absorb the reaction forces with its inertia. In a further embodiment of the present invention, the fixed portion of the planar motor and the article to be moved are supported by the same frame, with the fixed portion of the planar motor movable on bearings.

摘要翻译： 本发明提供了用于隔离由平面电动机产生的反作用力的结构。 具体地，反应电动机的受到反作用力的固定部分与其中布置有平面电动机的系统的其余部分结构地隔离。 根据本发明的一个实施例，平面电动机的固定部分与系统的其余部分分离并耦合到地面。 系统的其余部分通过部署隔振装置与地面隔离。 或者或另外，平面电动机的固定部分可以被构造成在反作用力的存在下移动（例如，在轴承上），以便以其惯性吸收反作用力。 在本发明的另一实施例中，平面电动机的固定部分和待移动的物品由相同的框架支撑，平面电动机的固定部分可在轴承上移动。

公开(公告)号：US06885430B2

公开(公告)日：2005-04-26

申请号：US10458373

申请日：2003-06-11

申请人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

发明人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

IPC分类号： G03B27/62 ,  G03F7/20 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/707 ,  G03B27/62 ,  G03F7/70708 ,  G03F7/70766 ,  G03F7/709

摘要： A stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. The control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. The timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly.

摘要翻译： 舞台组件包括舞台基座，舞台，舞台动子组件，反作用组件，反作用动力组件和控制系统。 平台移动器组件相对于舞台底座移动舞台。 反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。 反应动子组件调整反应物料组件相对于载物台的位置。 控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。 改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的干扰的影响。

公开(公告)号：US09019459B2

公开(公告)日：2015-04-28

申请号：US13581089

申请日：2010-11-29

申请人： Yoshitaka Okumoto ,  Toshinori Sugihara ,  Toshihide Tsubata ,  Keiichi Tanaka

发明人： Yoshitaka Okumoto ,  Toshinori Sugihara ,  Toshihide Tsubata ,  Keiichi Tanaka

IPC分类号： G02F1/1339 ,  G02F1/1335 ,  G02F1/1362

CPC分类号： G02F1/133514 ,  G02F1/13394 ,  G02F2001/136222

摘要： The present invention provides a liquid crystal display panel which can prevent an electric short circuit (leakage) between a pair of substrates with no additional production step in the case where a multilayer spacer is used. The present invention is a liquid crystal display panel comprising: a pair of substrates; and a liquid crystal layer between the substrates, wherein a first substrate of the substrates has a support substrate, a plurality of pixel electrodes, transparent colored layers of plural colors overlapping with the pixel electrodes, and a multilayer spacer formed of a stacked body of three or more resin layers including transparent colored layers of plural colors, and a second substrate of the substrates has a supporting substrate and a common electrode.

摘要翻译： 本发明提供了一种液晶显示面板，其可以防止一对基板之间的电短路（泄漏），而在使用多层隔板的情况下，无需额外的制造步骤。 本发明是一种液晶显示面板，包括：一对基板; 以及基板之间的液晶层，其中基板的第一基板具有支撑基板，多个像素电极，与像素电极重叠的多种颜色的透明着色层，以及由三层叠层体形成的多层隔板 或多个包括多种颜色的透明着色层的树脂层，并且该基板的第二基板具有支撑基板和公共电极。

公开(公告)号：US08811783B2

公开(公告)日：2014-08-19

申请号：US10514813

申请日：2003-05-16

申请人： Kousuke Tanaka ,  Hiroyasu Sugiyama ,  Takehiro Hosokawa ,  Keiichi Tanaka ,  Tsuyoshi Ikada ,  Kazuaki Negishi ,  Yoshiaki Nagao ,  Toshio Akiyoshi ,  Kazuhiro Sato

发明人： Kousuke Tanaka ,  Hiroyasu Sugiyama ,  Takehiro Hosokawa ,  Keiichi Tanaka ,  Tsuyoshi Ikada ,  Kazuaki Negishi ,  Yoshiaki Nagao ,  Toshio Akiyoshi ,  Kazuhiro Sato

IPC分类号： G02B6/44 ,  G02B6/08

CPC分类号： G02B6/4436 ,  G02B6/08 ,  G02B6/4403 ,  G02B6/4495

摘要： An optical fiber ribbon comprising a plurality of the coated optical fibers 2 arranged in plane and flame-retardant films 4a and 4b to integrate the coated optical fibers 2 is provided. The flame-retardant films 4a and 4b have an adhesive layer 5 formed thereon, and a plurality of the coated optical fibers 2 arranged in plane are integrated by the adhesive layer. The optical fiber ribbon 1 in this constitution uses flame-retardant films, wherein the ribbon thickness can be lowered and separation of single fiber can be facilitated by tearing off the film.

摘要翻译： 提供了包括布置在平面上的多个被覆光纤2和使被覆光纤2一体化的阻燃膜4a和4b的光纤带。 阻燃膜4a和4b具有形成在其上的粘合剂层5，并且布置成平面的多个被覆光纤2被粘合剂层一体化。 在这种结构中的光纤带1使用阻燃膜，其中可以降低带厚度，并且通过撕下膜可以促进单纤维的分离。

公开(公告)号：US20140075003A1

公开(公告)日：2014-03-13

申请号：US13989220

申请日：2012-10-03

申请人： Keiichi Tanaka ,  Yuki Taoka ,  Kenji Masuda

发明人： Keiichi Tanaka ,  Yuki Taoka ,  Kenji Masuda

IPC分类号： H04L12/24

CPC分类号： H04L41/50 ,  H04L12/6418 ,  H04L41/085

摘要： An application information acquisition unit 405 transmits a device list of unconnected devices, which are owned devices recorded in a local storage 407 but not retrieved by a device retrieval unit 402, and connected devices, which are owned devices retrieved by the device retrieval unit 402, to an external server 107 via an external network. A service list display unit 406 displays a list of device cooperation services indicated in device cooperation service list information obtained by the application information acquisition unit 405 from the external server 107 and a list of devices determined to be owned devices by an owned device management unit 404 on a display unit 410, whereby a user is prompted to select a device cooperation service.

摘要翻译： 应用信息获取单元405发送作为本地存储器407中记录的但未被设备检索单元402检索的所有设备的未连接设备的设备列表以及由设备检索单元402检索到的所有设备的连接设备， 经由外部网络到外部服务器107。 服务列表显示单元406显示由应用信息获取单元405从外部服务器107获得的设备合作服务列表信息中所指示的设备协作服务的列表以及被拥有设备管理单元404确定为所有设备的设备列表 在显示单元410上，由此提示用户选择设备协作服务。

公开(公告)号：US08588580B2

公开(公告)日：2013-11-19

申请号：US13016066

申请日：2011-01-28

申请人： Keiichi Tanaka ,  Hidetaka Oto

发明人： Keiichi Tanaka ,  Hidetaka Oto

IPC分类号： H04N9/80 ,  H04N5/92

CPC分类号： H04N5/913 ,  G06F21/445 ,  G06F21/52 ,  G06F21/79 ,  G11B20/00086 ,  G11B20/00173 ,  G11B20/00181 ,  G11B20/00224 ,  G11B20/00862 ,  G11B27/105 ,  G11B2220/2541 ,  H04N5/765 ,  H04N5/907 ,  H04N9/8205 ,  H04N2005/91328 ,  H04N2005/91357

摘要： A bytecode processing unit provided in a playback device is platform unit 20 that reads and runs a bytecode application recorded on read-only medium 105. The playback device includes: playback control unit 10 for controlling AV playback of digital streams; and machine unique function control unit 33 for performing machine unique functions unique to the playback device, to perform a control onto a content. APIs used by the bytecode application include API for playback control function, and API for socket communication. When the bytecode application requests playback control unit 10 to control the playback, it calls the playback control API to can instruct playback control unit 10 to execute the process. When the bytecode application requests execution of a machine unique function of the playback device, it instructs a machine unique function control unit to perform the process via a function call by the socket communication API.

摘要翻译： 设置在再现装置中的字节码处理单元是读取并运行记录在只读介质105上的字节码应用的平台单元20.回放设备包括：用于控制数字流的AV回放的回放控制单元10; 以及机器独特的功能控制单元33，用于执行重放设备独有的机器独特功能，以对内容执行控制。 字节码应用程序使用的API包括用于播放控制功能的API和用于套接字通信的API。 当字节码应用程序请求播放控制单元10控制播放时，它呼叫播放控制API以指示播放控制单元10执行该过程。 当字节码应用程序请求执行重放设备的机器唯一功能时，它指示机器唯一功能控制单元通过套接字通信API的功能调用来执行处理。

公开(公告)号：US08433178B2

公开(公告)日：2013-04-30

申请号：US12950692

申请日：2010-11-19

申请人： Wataru Ikeda ,  Tomoyuki Okada ,  Keiichi Tanaka ,  Masahiro Oashi

发明人： Wataru Ikeda ,  Tomoyuki Okada ,  Keiichi Tanaka ,  Masahiro Oashi

IPC分类号： H04N9/80

CPC分类号： H04N9/8205 ,  G11B20/0021 ,  G11B27/10 ,  G11B27/329 ,  G11B2020/1288 ,  G11B2220/213 ,  G11B2220/2541 ,  H04N5/765 ,  H04N5/775 ,  H04N5/85 ,  H04N9/8042 ,  H04N9/8063 ,  H04N9/8227

摘要： A BD-ROM stores PlayList information. The PlayList information defines a playback section of each of a plurality of AV clips and includes MainPath information and SubPath information. The MainPath information designates one of the AV clips as a Main Clip and defines a portion of the Main Clip as a primary playback section. The SubPath information designates another one of the AV clips as a SubClip and defines a portion of the SubClip as a secondary playback section that is to be played back in synchronism with the primary playback section. The BD-ROM stores, the one of the AV clips designated as the SubClip along with an EP_map. The EP_map shows a plurality of entry points on the SubClip in a one-to-one correspondence with entry times on the SubClip timeline.

摘要翻译： BD-ROM存储播放列表信息。 播放列表信息定义多个AV剪辑中的每一个的回放部分，并且包括MainPath信息和SubPath信息。 MainPath信息将AV剪辑中的一个指定为主剪辑，并将主剪辑的一部分定义为主要播放部分。 SubPath信息将AV片段中的另一个指定为SubClip，并将SubClip的一部分定义为与主播放部分同步地再现的辅助播放部分。 BD-ROM存储指定为SubClip的AV片段之一以及EP_map。 EP_map在子剪辑上显示多个入口点，与SubClip时间轴上的输入时间一一对应。

公开(公告)号：US08420303B2

公开(公告)日：2013-04-16

申请号：US12957442

申请日：2010-12-01

申请人： Yoshiaki Yamada ,  Keiichi Tanaka ,  Hitoshi Kosugi

发明人： Yoshiaki Yamada ,  Keiichi Tanaka ,  Hitoshi Kosugi

IPC分类号： G03F7/26

CPC分类号： G03F7/38

摘要： A PEB unit has a first heat plate and a second heat plate. After an exposure process for a resist film for EUV on a wafer and before a development process, the PEB unit heats the wafer through the first heat plate at a first heating temperature. A heating time through the first heat plate is not less than 10 seconds and not more than 30 seconds. Thereafter, the PEB unit heats the wafer through the second heat plate at a second heating temperature lower than the first heating temperature. A temperature difference between the first heating temperature and the second heating temperature is not less than 20° C. and not more than 60° C.

摘要翻译： PEB单元具有第一加热板和第二加热板。 在晶片上并且在显影处理之前用于EUV的抗蚀剂膜的曝光处理之后，PEB单元在第一加热温度下通过第一加热板加热晶片。 通过第一加热板的加热时间不小于10秒且不超过30秒。 此后，PEB单元在低于第一加热温度的第二加热温度下通过第二加热板加热晶片。 第一加热温度和第二加热温度之间的温差不小于20℃且不大于60℃。