公开(公告)号：US06788385B2

公开(公告)日：2004-09-07

申请号：US10134607

申请日：2002-04-30

申请人： Keiichi Tanaka ,  Michael Binnard ,  Robert Martinek ,  Andrew J. Hazelton

发明人： Keiichi Tanaka ,  Michael Binnard ,  Robert Martinek ,  Andrew J. Hazelton

IPC分类号： G03B2742

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70766 ,  G03F7/709

摘要： In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices. The above configuration of the stage device permits and restrains a change in attitude of each stage due to driving of the substrate table.

摘要翻译： 在曝光装置的舞台装置中，第一级通过第一X轴电动机沿X轴方向驱动，同时由第一导杆一侧支撑，并且第二级在X轴上被驱动 方向由第二X轴电机同时由第二引导杆一侧支撑。 第一导杆和第二导杆通过Y轴线性电动机在Y轴方向上独立地驱动。 在第一引导杆和第二引导杆彼此最靠近的状态下，与由第一引导杆支撑的一侧相对的第一级的端部设置在第二引导杆的上方，而第二引导杆的端部 与由第二导杆支撑的一侧相对的台架放置在第一导杆的上方。 第一和第二衬底台分别经由第一和第二微动驱动装置支撑在第一和第二级上方。 舞台装置的上述构造允许并且抑制由于衬底台的驱动而引起的每一级的姿态变化。

公开(公告)号：US07869000B2

公开(公告)日：2011-01-11

申请号：US11048405

申请日：2005-01-31

申请人： Yoichi Arai ,  Andrew J. Hazelton ,  Michael Binnard ,  W. Thomas Novak ,  Douglas C. Watson ,  Kirk Lok

发明人： Yoichi Arai ,  Andrew J. Hazelton ,  Michael Binnard ,  W. Thomas Novak ,  Douglas C. Watson ,  Kirk Lok

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70716

摘要： A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.

摘要翻译： 沿着第二轴线沿着第三轴线沿着第一轴线移动工件（200）的台架组件（220）包括第一阶段（238），第一移动器组件（242），其使第一阶段（238）移动 ），保持所述工件（200）的第二级（240），第二移动器组件（244）和非接触式轴承（257）。 第二移动器组件（244）沿着第一轴线沿着第二轴线和第三轴线相对于第一阶段（238）移动第二阶段（240）。 非接触轴承（257）支撑第二级（240）的质量。 此外，非接触式轴承（257）允许第二级（240）相对于第一级（238）沿着第一轴线并沿着第二轴线移动。 第二移动器组件（244）可以以至少四个移动程度移动第二平台（240）。

公开(公告)号：US06979920B2

公开(公告)日：2005-12-27

申请号：US10769307

申请日：2004-01-30

申请人： Ed Reynolds ,  Andrew J. Hazelton ,  Michael Binnard

发明人： Ed Reynolds ,  Andrew J. Hazelton ,  Michael Binnard

IPC分类号： H02K5/20 ,  H02K9/00 ,  H02K9/19 ,  H02K41/00 ,  H02K41/02 ,  H02K41/03

CPC分类号： H02K41/03 ,  H02K5/20 ,  H02K9/00

摘要： A mover (36) for an exposure apparatus (10) includes a conductor array (358) and a circulation housing (362) that defines at least a portion of a fluid passageway (364) near the conductor array (358). The circulation housing (362) includes a wall (366A) having a wall thickness. In one embodiment, the wall thickness at a first position on the wall (366A) is different than the wall thickness at a second position on the wall (366A). The wall (366A) can be curved and the shape of the curve is different at the first position than at the second position. Further, a cross-sectional shape of the wall (366A) at the first position is different from a cross-sectional shape of the wall (366A) at the second position.

公开(公告)号：US06750625B2

公开(公告)日：2004-06-15

申请号：US09929025

申请日：2001-08-15

申请人： Michael Binnard ,  Kazuya Ono ,  Andrew J. Hazelton

发明人： Michael Binnard ,  Kazuya Ono ,  Andrew J. Hazelton

IPC分类号： G05B1118

CPC分类号： G03F7/70716 ,  G03F7/70725 ,  G03F7/70825 ,  H01L21/682 ,  H02K41/03 ,  H02K2201/18

摘要： A high accuracy stage supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are controlled by variable reluctance actuators which are mounted between the high accuracy stage and a coarse stage so as not to distort the high accuracy stage during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuators disposed between the coarse stage and the high accuracy stage and aided by a supplemental vertical support disposed adjacent to the actuators. Preferably, the high accuracy stage is suspended from a bar supported by the supplemental vertical support, which is preferably air bellows.

摘要翻译： 电磁轴承采用六自由度的高精度级。 在舞台的水平面中的运动由可变磁阻致动器控制，该致动器安装在高精度级与粗级之间，以便在其运动期间不会使高精度级失真。 高精度级通过设置在粗级和高精度级之间的电磁致动器在三个垂直自由度中得到支持，并且辅助于靠近致动器设置的辅助垂直支撑。 优选地，高精度级从由辅助垂直支撑件支撑的杆悬挂，该杆优选为空气波纹管。

公开(公告)号：US06551045B2

公开(公告)日：2003-04-22

申请号：US09759218

申请日：2001-01-16

申请人： Michael Binnard ,  Andrew J. Hazelton

发明人： Michael Binnard ,  Andrew J. Hazelton

IPC分类号： G05D1900

CPC分类号： H01L21/67126 ,  G03F7/70691 ,  H01L21/6719

摘要： A wafer stage chamber assembly is provided to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber for sealing a wafer stage device from the atmosphere outside the wafer stage chamber, and at least one loader port for loading and unloading substrates into the wafer stage chamber. The wafer stage chamber is constructed of a chamber frame to enclose the wafer stage device, and a plurality of chamber walls including a front panel having the at least one loader port for loading and unloading a plurality of semiconductor substrates into the wafer stage chamber. The wafer stage chamber assembly also includes a top wall and a base frame. The chamber walls are layered with insulating materials, while the joint between the chamber frame with the top wall and base frame are sealed with sealing materials. The wafer stage chamber assembly is supported by an apparatus frame of an exposure device via a plurality of body supports.

公开(公告)号：US06252234B1

公开(公告)日：2001-06-26

申请号：US09134278

申请日：1998-08-14

申请人： Andrew J. Hazelton ,  Keiichi Tanaka ,  Yutaka Hayashi ,  Nobukazu Ito

发明人： Andrew J. Hazelton ,  Keiichi Tanaka ,  Yutaka Hayashi ,  Nobukazu Ito

IPC分类号： G01F2300

CPC分类号： G03F7/70358 ,  F16F15/02 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70833 ,  G03F7/709

摘要： The present invention provides a structure for isolating the reaction forces generated by a planar motor. Specifically, the fixed portion of the reaction motor, which is subject to reaction forces, is structurally isolated from the rest of the system in which the planar motor is deployed. In accordance with one embodiment of the present invention, the fixed portion of the planar motor is separated from the rest of the system and coupled to ground. The rest of the system is isolated from ground by deploying vibration isolation means. Alternatively or in addition, the fixed portion of the planar motor may be structured to move (e.g., on bearings) in the presence of reaction forces, so as to absorb the reaction forces with its inertia. In a further embodiment of the present invention, the fixed portion of the planar motor and the article to be moved are supported by the same frame, with the fixed portion of the planar motor movable on bearings.

摘要翻译： 本发明提供了用于隔离由平面电动机产生的反作用力的结构。 具体地，反应电动机的受到反作用力的固定部分与其中布置有平面电动机的系统的其余部分结构地隔离。 根据本发明的一个实施例，平面电动机的固定部分与系统的其余部分分离并耦合到地面。 系统的其余部分通过部署隔振装置与地面隔离。 或者或另外，平面电动机的固定部分可以被构造成在反作用力的存在下移动（例如，在轴承上），以便以其惯性吸收反作用力。 在本发明的另一实施例中，平面电动机的固定部分和待移动的物品由相同的框架支撑，平面电动机的固定部分可在轴承上移动。

公开(公告)号：US06885430B2

公开(公告)日：2005-04-26

申请号：US10458373

申请日：2003-06-11

申请人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

发明人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

IPC分类号： G03B27/62 ,  G03F7/20 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/707 ,  G03B27/62 ,  G03F7/70708 ,  G03F7/70766 ,  G03F7/709

摘要： A stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. The control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. The timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly.

摘要翻译： 舞台组件包括舞台基座，舞台，舞台动子组件，反作用组件，反作用动力组件和控制系统。 平台移动器组件相对于舞台底座移动舞台。 反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。 反应动子组件调整反应物料组件相对于载物台的位置。 控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。 改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的干扰的影响。

公开(公告)号：US06958808B2

公开(公告)日：2005-10-25

申请号：US10458384

申请日：2003-06-11

申请人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

发明人： Keiichi Tanaka ,  Mike Binnard ,  Andrew J. Hazelton

IPC分类号： G03B27/62 ,  G03F7/20 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03B27/62 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70766 ,  G03F7/709

摘要： A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly. With this design, the reaction mover assembly has less influence upon the position of the stage base. This allows for more accurate positioning of the device by the stage assembly and better performance of the stage assembly.

摘要翻译： 本文提供了用于移动和定位设备的台架组件。 舞台组件包括舞台基座，舞台，舞台推动器组件，反作用组件，反作用器组件和控制系统。 平台移动器组件相对于舞台底座移动舞台。 反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。 反应动子组件调整反应物料组件相对于载物台的位置。 独特地，控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。 更具体地，改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的干扰的影响。 通过这种设计，反作用器组件对舞台底座的位置的影响较小。 这允许通过平台组件更好地定位设备并且更好地实现舞台组件的性能。

公开(公告)号：US20120019792A1

公开(公告)日：2012-01-26

申请号：US13200982

申请日：2011-10-06

申请人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

发明人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.

摘要翻译： 液浸光刻设备包括其上保持晶片的台。 投影系统通过浸没液将图案图像投影到曝光区域，以露出台上的晶片。 多个供应开口布置成围绕曝光区域，液体从曝光区域的上方供应。 多个恢复开口被布置成围绕曝光区域，通过该曝光区域从曝光区域上方收集液体。 选择供给开口的一部分，以便在台架移动的方向上将曝光区域前方的液体供给。

公开(公告)号：US07929111B2

公开(公告)日：2011-04-19

申请号：US11819447

申请日：2007-06-27

申请人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

发明人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a mesh member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，该液体收集系统包括具有网状构件的液体收集构件，通过该网状构件从与液体收集构件相对的物体的表面收集液体。