公开(公告)号：US20080157011A1

公开(公告)日：2008-07-03

申请号：US11792923

申请日：2005-08-29

申请人： Keiji Nagai ,  Qincui Gu ,  Takayoshi Norimatsu ,  Shinsuke Fujioka ,  Hiroaki Nishimura ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Yasukazu Izawa

发明人： Keiji Nagai ,  Qincui Gu ,  Takayoshi Norimatsu ,  Shinsuke Fujioka ,  Hiroaki Nishimura ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Yasukazu Izawa

IPC分类号： G21G4/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/7095 ,  H01J2235/087 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： The present invention is made to provide an extreme ultraviolet light source target or an X-ray source target having a good operationality. An extreme ultraviolet light source target in accordance with an aspect of the present invention is obtained by including a heavy metal such as tin into a matrix made of a polymeric material such as hydroxylpropylcellulose (HPC). The target can be manufactured by mixing the heavy metal and the polymeric material with a solvent, and evaporating the solvent. Since the target uses the polymeric material as a matrix, the target can be easily deformed to have a desired shape. For this reason, the target can be easily attached to a target holder irrespective of the shape of the holder, resulting in a good operationality of the target. Furthermore, an emission efficiency can be improved by including the heavy metal at a low density.

摘要翻译： 本发明提供一种具有良好操作性的极紫外光源靶或X射线源靶。 根据本发明的一个方面的极紫外光源目标是通过将诸如锡的重金属包括在由诸如羟丙基纤维素（HPC）的聚合材料制成的基质中而获得的。 可以通过将重金属和聚合物材料与溶剂混合并蒸发溶剂来制造目标物。 由于目标使用聚合物材料作为基质，因此靶容易变形以具有所需的形状。 为此，目标可以容易地附着到目标支架上，而不管支架的形状如何，导致目标的良好操作性。 此外，通过以低密度包含重金属可以提高排放效率。

公开(公告)号：US07885387B2

公开(公告)日：2011-02-08

申请号：US11792923

申请日：2005-08-29

申请人： Keiji Nagai ,  Qincui Gu ,  Takayoshi Norimatsu ,  Shinsuke Fujioka ,  Hiroaki Nishimura ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Yasukazu Izawa

发明人： Keiji Nagai ,  Qincui Gu ,  Takayoshi Norimatsu ,  Shinsuke Fujioka ,  Hiroaki Nishimura ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Yasukazu Izawa

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/7095 ,  H01J2235/087 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： The present invention is made to provide an extreme ultraviolet light source target or an X-ray source target having a good operationality. An extreme ultraviolet light source target in accordance with an aspect of the present invention is obtained by including a heavy metal such as tin into a matrix made of a polymeric material such as hydroxylpropylcellulose (HPC). The target can be manufactured by mixing the heavy metal and the polymeric material with a solvent, and evaporating the solvent. Since the target uses the polymeric material as a matrix, the target can be easily deformed to have a desired shape. For this reason, the target can be easily attached to a target holder irrespective of the shape of the holder, resulting in a good operationality of the target. Furthermore, an emission efficiency can be improved by including the heavy metal at a low density.

摘要翻译： 本发明提供一种具有良好操作性的极紫外光源靶或X射线源靶。 根据本发明的一个方面的极紫外光源目标是通过将诸如锡的重金属包括在由诸如羟丙基纤维素（HPC）的聚合材料制成的基质中而获得的。 可以通过将重金属和聚合物材料与溶剂混合并蒸发溶剂来制造目标物。 由于目标使用聚合物材料作为基质，因此靶容易变形以具有所需的形状。 为此，目标可以容易地附着到目标支架上，而不管支架的形状如何，导致目标的良好操作性。 此外，通过以低密度包含重金属可以提高排放效率。

公开(公告)号：US07521702B2

公开(公告)日：2009-04-21

申请号：US10550800

申请日：2003-12-26

申请人： Keiji Nagai ,  Hiroaki Nishimura ,  Takayoshi Norimatsu ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Masahiro Nakatsuka ,  Yasukazu Izawa ,  Tatsuhiko Yamanaka ,  Mitsuo Nakai ,  Keisuke Shigemori ,  Masakatsu Murakami ,  Yoshinori Shimada ,  Shigeaki Uchida ,  Hiroyuki Furukawa ,  Atsushi Sunahara ,  Vasilli Zhakhovski ,  Ryouji Matsui ,  Takahiro Hibino ,  Tomoharu Okuno

发明人： Keiji Nagai ,  Hiroaki Nishimura ,  Takayoshi Norimatsu ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Masahiro Nakatsuka ,  Yasukazu Izawa ,  Tatsuhiko Yamanaka ,  Mitsuo Nakai ,  Keisuke Shigemori ,  Masakatsu Murakami ,  Yoshinori Shimada ,  Shigeaki Uchida ,  Hiroyuki Furukawa ,  Atsushi Sunahara ,  Vasilli Zhakhovski ,  Ryouji Matsui ,  Takahiro Hibino ,  Tomoharu Okuno

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033

摘要： An object of the present invention is to provide an extreme ultraviolet light source target which can emits extreme ultraviolet light with high emission efficiency. A solid target made of heavy metal or heavy-metal compound and having a density 0.5 to 80% that of the crystal density is used. When the target is irradiated with a laser beam, plasma of the heavy metal contained in the target is generated, and extreme ultraviolet light having a predetermined wavelength which corresponds to the kind of the heavy metal is emitted from the plasma. When the density of the target is made to be smaller than the crystal density as described above, space distribution of the density of the generated plasma can be controlled, and the region in which plasma absorbs energy of the laser beam overlaps the region in which the plasma emits the extreme ultraviolet light. Thus, emission efficiency can be improved, preventing energy loss. For example, in a case where the SnO2 target having a density 24% of the crystal density is used, the emission efficiency at around 13.5 nm wavelength is higher than in the case where a Sn crystal target is used.

摘要翻译： 本发明的目的是提供一种能够发射具有高发射效率的极紫外光的极紫外光源靶。 使用由重金属或重金属化合物制成的具有密度为晶体密度的0.5〜80％的固体靶。 当用激光束照射靶时，产生包含在靶中的重金属的等离子体，并且从等离子体发射具有对应于重金属的种类的预定波长的极紫外光。 当如上所述使靶的密度小于晶体密度时，可以控制产生的等离子体的密度的空间分布，并且等离子体吸收激光束的能量的区域与 等离子体发出极紫外光。 因此，可以提高排放效率，防止能量损失。 例如，在使用密度为结晶密度的24％的SnO 2靶的情况下，波长13.5nm左右的发光效率高于使用Sn晶体靶的情况。

公开(公告)号：US20060133574A1

公开(公告)日：2006-06-22

申请号：US10550800

申请日：2003-12-26

申请人： Keiji Nagai ,  Hiroaki Nishimura ,  Takayoshi Norimatsu ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Masahiro Nakatsuka ,  Yasukazu Izawa ,  Tatsuhiko Yamanaka ,  Mitsuo Nakai ,  Keisuke Shigemori ,  Masakatsu Murakami ,  Yoshinori Shimada ,  Shigeaki Uchida ,  Atsushi Sunahara ,  Vasilli Zhakhovski ,  Ryouji Matsui ,  Takahiro Hibino ,  Tomoharu Okuno

发明人： Keiji Nagai ,  Hiroaki Nishimura ,  Takayoshi Norimatsu ,  Katsunobu Nishihara ,  Noriaki Miyanaga ,  Masahiro Nakatsuka ,  Yasukazu Izawa ,  Tatsuhiko Yamanaka ,  Mitsuo Nakai ,  Keisuke Shigemori ,  Masakatsu Murakami ,  Yoshinori Shimada ,  Shigeaki Uchida ,  Atsushi Sunahara ,  Vasilli Zhakhovski ,  Ryouji Matsui ,  Takahiro Hibino ,  Tomoharu Okuno

IPC分类号： G21K5/00 ,  H05G2/00 ,  G21G4/00 ,  H01J35/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033

摘要： An object of the present invention is to provide an extreme ultraviolet light source target which can emits extreme ultraviolet light with high emission efficiency. A solid target made of heavy metal or heavy-metal compound and having a density 0.5 to 80% that of the crystal density is used. When the target is irradiated with a laser beam, plasma of the heavy metal contained in the target is generated, and extreme ultraviolet light having a predetermined wavelength which corresponds to the kind of the heavy metal is emitted from the plasma. When the density of the target is made to be smaller than the crystal density as described above, space distribution of the density of the generated plasma can be controlled, and the region in which plasma absorbs energy of the laser beam overlaps the region in which the plasma emits the extreme ultraviolet light. Thus, emission efficiency can be improved, preventing energy loss. For example, in a case where the SnO2 target having a density 24% of the crystal density is used, the emission efficiency at around 13.5 nm wavelength is higher than in the case where a Sn crystal target is used.

摘要翻译： 本发明的目的是提供一种能够发射具有高发射效率的极紫外光的极紫外光源靶。 使用由重金属或重金属化合物制成的具有密度为晶体密度的0.5〜80％的固体靶。 当用激光束照射靶时，产生包含在靶中的重金属的等离子体，并且从等离子体发射具有对应于重金属的种类的预定波长的极紫外光。 当如上所述使靶的密度小于晶体密度时，可以控制产生的等离子体的密度的空间分布，并且等离子体吸收激光束的能量的区域与其中的 等离子体发出极紫外光。 因此，可以提高排放效率，防止能量损失。 例如，在使用具有密度为结晶密度的24％的SnO 2 N靶的情况下，波长13.5nm左右的发光效率高于Sn晶体靶为 用过的。

公开(公告)号：US08354657B2

公开(公告)日：2013-01-15

申请号：US13047131

申请日：2011-03-14

申请人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： A61N5/06 ,  G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target material into the chamber, a collector mirror for collecting extreme ultra violet light radiated from plasma generated by irradiating the target material with a laser beam to output the extreme ultra violet light, an electromagnet arranged outside of the chamber, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the electromagnet extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 该装置包括：室，用于将目标材料供应到室中的目标供应单元，用于收集由用激光束照射目标材料而产生的等离子体辐射的极紫外光以输出极紫外光的集光镜; 设置在室外的电磁体，以及设置在室的两个表面中的至少一个表面上的电荷粒子收集机构，由电磁体产生的磁力线延伸。

公开(公告)号：US07928418B2

公开(公告)日：2011-04-19

申请号：US12385569

申请日：2009-04-13

申请人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由 用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用 线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

公开(公告)号：US20140226772A1

公开(公告)日：2014-08-14

申请号：US14348137

申请日：2012-08-08

申请人： Takeshi Watari ,  Katsunobu Nishihara ,  Masaru Takagi ,  Nakahiro Satoh ,  Toshiyuki Kawashima ,  Hirofumi Kan

发明人： Takeshi Watari ,  Katsunobu Nishihara ,  Masaru Takagi ,  Nakahiro Satoh ,  Toshiyuki Kawashima ,  Hirofumi Kan

IPC分类号： G21B3/00

CPC分类号： G21B3/006 ,  H05G2/005 ,  H05G2/006 ,  H05H3/06

摘要： A radiation generating apparatus comprises a fuel storage unit 20 for storing a mixed liquid 61, a pressure application unit 10 for applying a pressure to the mixed liquid 61, a jet formation unit 30 for forming a jet 61a of the mixed liquid 61, a reaction unit 44 for forming the jet 61a of the mixed liquid 61 therein, a pressure adjustment unit 41 for setting a pressure in the reaction unit 44 lower than an internal pressure of the jet formation unit 30, and a light source unit 45 for irradiating a particle group 63a with laser light L1.

摘要翻译： 辐射发生装置包括用于储存混合液体61的燃料存储单元20，用于向混合液体61施加压力的压力施加单元10，用于形成混合液体61的喷射61a的射流形成单元30， 用于在其中形成混合液体61的喷射61a的单元44，用于将反应单元44中的压力设定为低于喷射形成单元30的内压的压力调节单元41，以及用于照射粒子的光源单元45 63a组激光L1。

公开(公告)号：US09953729B2

公开(公告)日：2018-04-24

申请号：US14348137

申请日：2012-08-08

申请人： Takeshi Watari ,  Katsunobu Nishihara ,  Masaru Takagi ,  Nakahiro Satoh ,  Toshiyuki Kawashima ,  Hirofumi Kan

发明人： Takeshi Watari ,  Katsunobu Nishihara ,  Masaru Takagi ,  Nakahiro Satoh ,  Toshiyuki Kawashima ,  Hirofumi Kan

IPC分类号： G21B1/03 ,  G21B3/00 ,  H05H3/06 ,  H05G2/00

CPC分类号： G21B3/006 ,  H05G2/005 ,  H05G2/006 ,  H05H3/06

摘要： A radiation generating apparatus comprises a fuel storage unit 20 for storing a mixed liquid 61, a pressure application unit 10 for applying a pressure to the mixed liquid 61, a jet formation unit 30 for forming a jet 61a of the mixed liquid 61, a reaction unit 44 for forming the jet 61a of the mixed liquid 61 therein, a pressure adjustment unit 41 for setting a pressure in the reaction unit 44 lower than an internal pressure of the jet formation unit 30, and a light source unit 45 for irradiating a particle group 63a with laser light L1.

公开(公告)号：US20090261277A1

公开(公告)日：2009-10-22

申请号：US12385569

申请日：2009-04-13

申请人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由 用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用 线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

公开(公告)号：US20110163247A1

公开(公告)日：2011-07-07

申请号：US13047131

申请日：2011-03-14

申请人： Georg SOUMAGNE ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg SOUMAGNE ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由 用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用 线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。