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公开(公告)号：US6058997A
公开(公告)日：2000-05-09
申请号：US11758
申请日：1998-02-25
CPC分类号： B60C9/263 , B60C9/2006 , B60C9/2009 , Y10T152/10783 , Y10T152/10792
摘要： A pneumatic radial tire has at least two belt layers disposed at a tread portion thereof, wherein the two belt layers are constituted by inclining a strip formed by aligning a plurality of reinforcing cords to a tire circumferential direction and extending it zigzag in the tire circumferential direction so that the strip is turned back from the lower belt layer to the upper belt layer at both end portions of the two belt layers, and zone portions in which the reinforcing cords incline to the right in the tire circumferential direction and the zone portions in which the reinforcing cords incline to the left in the tire circumferential direction are alternately arranged.
摘要翻译： PCT No.PCT / JP97 / 02587第 371日期：1998年2月25日 102（e）1998年2月25日PCT 1997年7月25日PCT公布。 第WO98 / 04424号公报 日期1998年2月5日充气子午线轮胎在其胎面部分具有至少两个带束层，其中两个带束层通过将通过将多根加强帘线对准轮胎周向形成的条带倾斜而形成，并且以锯齿形延伸 在轮胎周向方向上，使得条带在两个带束层的两个端部处从下带束层转移到上带束层，以及加强帘线在轮胎周向方向上向右倾斜的区域部分，以及 加强帘线在轮胎周向上向左倾斜的区域交替布置。
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公开(公告)号：US08575515B2
公开(公告)日：2013-11-05
申请号：US13002010
申请日：2009-06-17
申请人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Jun Izawa , Miyuki Masaki , Masaru Morita
发明人： Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Jun Izawa , Miyuki Masaki , Masaru Morita
IPC分类号： B23K26/00 , B23K26/02 , H01L21/268
CPC分类号： H01L21/268 , B23K26/0853 , B23K26/127 , B23K26/128 , B23K26/147 , B23K26/702 , B23K2103/56 , H01L21/02532 , H01L21/02675 , H01L21/67115
摘要： A laser annealing apparatus is provided that is capable of reducing irradiation unevenness of laser light caused by a refraction phenomenon of the laser light due to fluctuation in the temperature of inert gas. The laser annealing apparatus includes a gas supply unit for supplying inert gas G to at least a laser irradiation area of a workpiece, and a gas temperature controller for regulating the temperature of the inert gas G. The gas temperature controller controls the temperature of the inert gas G supplied to the laser irradiation area so as to decrease a temperature difference between the temperature of the inert gas G and the atmospheric temperature of a space (a room R) that is disposed outside the supply area of the inert gas so the temperature controlled inert gas surrounds the optical path of the laser light.
摘要翻译： 提供一种激光退火装置，其能够减少由于惰性气体的温度波动引起的激光的折射现象引起的激光的照射不均匀性。 激光退火装置包括用于向工件的至少激光照射区域供给惰性气体G的气体供给单元和用于调节惰性气体G的温度的气体温度控制器。气体温度控制器控制惰性气体的温度 气体G供应到激光照射区域，以便降低惰性气体G的温度与设置在惰性气体的供给区域之外的空间（室R）的气氛温度之间的温度差，从而控制温度 惰性气体围绕激光的光路。
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公开(公告)号：US08170072B2
公开(公告)日：2012-05-01
申请号：US12811818
申请日：2008-05-30
IPC分类号： H01S3/10
CPC分类号： B23K26/0608 , B23K26/0676 , B23K26/0738 , B23K26/082 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L21/02691 , H01L21/268
摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。
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公开(公告)号：US06890839B2
公开(公告)日：2005-05-10
申请号：US10257460
申请日：2002-01-15
申请人： Norihito Kawaguchi , Kenichiro Nishida , Mikito Ishii , Takehito Yagi , Miyuki Masaki , Atsushi Yoshinouchi , Koichiro Tanaka
发明人： Norihito Kawaguchi , Kenichiro Nishida , Mikito Ishii , Takehito Yagi , Miyuki Masaki , Atsushi Yoshinouchi , Koichiro Tanaka
IPC分类号： A61B18/20 , B23K26/06 , B23K26/073 , H01L21/268 , H01S3/00 , H01L21/00 , H01L21/20 , H01L21/26 , H01L21/331
CPC分类号： H01S3/005 , B23K26/0732
摘要： An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample can be achieved because a linear cross-sectional configuration can be created in an optical system with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam from a laser light source at a prescribed angle by means of rotating means even when the beam pattern of the beam from the laser light source has a non-uniform intensity distribution.
摘要翻译： 本发明的一个目的是提供能够执行均匀的束发射的激光退火方法和装置。 通过本发明，可以实现对样品的均匀波束施加，因为可以在具有高斯分布的光束的光学系统中产生线性横截面配置，而通过将光束从 即使当来自激光光源的光束的光束图案具有不均匀的强度分布时，通过旋转装置以规定角度的激光光源。
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公开(公告)号：US06621636B2
公开(公告)日：2003-09-16
申请号：US10026340
申请日：2001-12-21
申请人： Koichiro Tanaka , Setsuo Nakajima , Takehito Yagi , Mikito Ishii , Kenichiro Nishida , Norihito Kawaguchi , Miyuki Masaki , Atsushi Yoshinouchi
发明人： Koichiro Tanaka , Setsuo Nakajima , Takehito Yagi , Mikito Ishii , Kenichiro Nishida , Norihito Kawaguchi , Miyuki Masaki , Atsushi Yoshinouchi
IPC分类号： G02B2710
CPC分类号： G02B27/108 , G02B27/145
摘要： A laser irradiation apparatus having a low running cost compared to the conventional, and a laser irradiation method using the laser irradiation apparatus, are provided. Crystal grains having a size in the same order as, or greater than, conventional grains are formed. The cooling speed of a semiconductor film is made slower, and it becomes possible to form crystal grains having a grain size in the same order as, or greater than, the size of grains formed in the case of irradiating laser light having a long output time to the semiconductor film. This is achieved by delaying one laser light with respect to another laser light, combining the laser lights, and performing irradiation to the semiconductor film in the case of irradiating laser light using a solid state laser as a light source, which has a short output time.
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公开(公告)号：US06545248B2
公开(公告)日：2003-04-08
申请号：US10096858
申请日：2002-03-14
IPC分类号： B23K2600
CPC分类号： B23K26/0608 , B23K26/0604 , B23K26/067 , B23K26/0732 , C03B25/025 , C03B29/025
摘要： Disclosed is a laser irradiating apparatus which forms a laser beam having an improved and uniform energy distribution on or near its irradiation surface in case where a laser oscillator having a high coherence is used. The laser irradiating apparatus forms a laser beam having a cyclic energy distribution by intentionally forming interference fringes on or near the irradiation surface by utilizing a high coherence, so that the energy distribution of the laser beam is cyclically repeated. From a macro viewpoint, such a laser beam can be considered as having a uniform energy distribution.
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公开(公告)号：US08598050B2
公开(公告)日：2013-12-03
申请号：US13001311
申请日：2009-06-19
IPC分类号： H01L21/00
CPC分类号： H01L21/02678 , B23K26/066 , B23K26/0738 , C30B1/023 , C30B29/06
摘要： Disclosed are a laser annealing method and apparatus capable of forming a crystalline semiconductor thin film on the entire surface of a substrate without sacrificing the uniformity of crystallinity in a seam portion in a long-axis direction of laser light, the crystalline semiconductor thin film having good properties and high uniformity to an extent that the seam portion is not visually recognizable. During the irradiation of a linear beam, portions corresponding to the edges of the linear beam are shielded by a mask 10 which is disposed on the optical path of a laser light 2, and the mask 10 is operated so that the amount of shielding is periodically increased and decreased.
摘要翻译： 公开了一种激光退火方法和装置，其能够在不牺牲激光长轴方向的接缝部分中的结晶度的均匀性的基板的整个表面上形成结晶半导体薄膜，该结晶半导体薄膜具有良好的 性能和高均匀性，使得接缝部分不能在视觉上识别。 在直线光束的照射期间，对应于直线光束的边缘的部分被设置在激光2的光路上的掩模10屏蔽，并且掩模10被操作以使屏蔽量周期性地 增加和减少。
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公开(公告)号：US08446924B2
公开(公告)日：2013-05-21
申请号：US13418653
申请日：2012-03-13
IPC分类号： H01S3/10
CPC分类号： B23K26/0608 , B23K26/0676 , B23K26/0738 , B23K26/082 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L21/02691 , H01L21/268
摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。
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公开(公告)号：US20110097907A1
公开(公告)日：2011-04-28
申请号：US13001311
申请日：2009-06-19
IPC分类号： H01L21/268 , B23K26/06
CPC分类号： H01L21/02678 , B23K26/066 , B23K26/0738 , C30B1/023 , C30B29/06
摘要： Disclosed are a laser annealing method and apparatus capable of forming a crystalline semiconductor thin film on the entire surface of a substrate without sacrificing the uniformity of crystallinity in a seam portion in a long-axis direction of laser light, the crystalline semiconductor thin film having good properties and high uniformity to an extent that the seam portion is not visually recognizable.During the irradiation of a linear beam, portions corresponding to the edges of the linear beam are shielded by a mask 10 which is disposed on the optical path of a laser light 2, and the mask 10 is operated so that the amount of shielding is periodically increased and decreased.
摘要翻译： 公开了一种激光退火方法和装置，其能够在不牺牲激光长轴方向的接缝部分中的结晶度的均匀性的基板的整个表面上形成结晶半导体薄膜，该结晶半导体薄膜具有良好的 性能和高均匀性，使得接缝部分不能在视觉上识别。 在直线光束的照射期间，对应于直线光束的边缘的部分被设置在激光2的光路上的掩模10屏蔽，并且掩模10被操作以使屏蔽量周期性地 增加和减少。
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公开(公告)号：US20110008973A1
公开(公告)日：2011-01-13
申请号：US12811818
申请日：2008-05-30
IPC分类号： H01L21/268 , B23K26/06 , B23K26/067 , B23K26/00
CPC分类号： B23K26/0608 , B23K26/0676 , B23K26/0738 , B23K26/082 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L21/02691 , H01L21/268
摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。
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