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    Ignition timing control apparatus and ignition timing control method for internal combustion engine
    1.
    发明授权
    Ignition timing control apparatus and ignition timing control method for internal combustion engine 有权
    点火正时控制装置和内燃机点火正时控制方法

    公开(公告)号：US07712450B2

    公开(公告)日：2010-05-11

    申请号：US12128964

    申请日：2008-05-29

    申请人： Kenichiro Sato ,  Tomohiro Fujita ,  Akito Onishi ,  Mitsuhiro Nada

    发明人： Kenichiro Sato ,  Tomohiro Fujita ,  Akito Onishi ,  Mitsuhiro Nada

    IPC分类号： F02P5/00 ,  F02P1/00

    CPC分类号： F02P5/152 ,  F02D41/2451 ,  Y02T10/46

    摘要： In an ignition timing control apparatus for an engine, a KCS learning value learned when the engine is in a given operating state is used in an ignition timing control executed when the engine is in the other operating state. An estimated knocking occurrence ignition timing is set based on a most retarded ignition timing using the KCS learning value. A final ignition timing is set by changing a KCS feedback correction value based on whether knocking occurs when ignition is performed at the estimated knocking occurrence ignition timing. When a point indicating the engine operating state moves into a region where it is difficult to set the estimated knocking occurrence ignition timing, the KCS feedback correction value is changed to retard the final ignition timing, and the final ignition timing is set using the KCS learning value and the changed KCS feedback correction value.

    摘要翻译： 在用于发动机的点火正时控制装置中，当发动机处于其他运行状态时执行的点火正时控制中使用当发动机处于给定运行状态时学习的KCS学习值。 基于使用KCS学习值的大多数延迟点火正时来设定估计的爆震发生点火正时。 通过基于在估计的爆震发生点火正时进行点火时是否发生爆震来改变KCS反馈校正值来设定最终的点火正时。 当指示发动机工作状态的点移动到难以设定估计的爆震发生点火正时的区域时，改变KCS反馈校正值以延迟最终点火正时，并且使用KCS学习来设定最终点火正时 值和更改的KCS反馈校正值。

    Oil Separator
    4.
    发明申请
    Oil Separator 审中-公开

    公开(公告)号：US20120037554A1

    公开(公告)日：2012-02-16

    申请号：US13263936

    申请日：2010-04-08

    申请人： Akira Sakano ,  Kenichiro Sato

    发明人： Akira Sakano ,  Kenichiro Sato

    IPC分类号： F25B43/02

    CPC分类号： B04C5/103 ,  F25B43/02 ,  F25B2400/02

    摘要： Provided is an oil separator which can separate refrigerant and refrigeration machine oil with high efficiency, which can effectively prevent the outflow of separated oil towards the refrigerant discharge path side, which can reduce pressure loss in the flow of refrigerant, and which can be made compact especially in the radial direction. The oil separator is provided with: a tubular outer pipe which is disposed on the compressor outlet side; an inlet pipe for introducing refrigerant containing refrigeration machine oil into the tubular outer pipe in such a manner as to produce a downward helical flow of refrigerant containing refrigeration machine oil along the inner surface of the tubular outer pipe; a refrigerant outlet pipe which has an external outflow port for the outflow of refrigerant to outside the tubular outer pipe, has a section extending in the axial direction of the tubular outer pipe at the central position of the tubular outer pipe, and allows the inflow, from the lower end of the above-mentioned section, of refrigerant separated from the refrigerant containing refrigeration machine oil having flowed down in the helical flow, and wherein the flow direction has been inverted in relation to the vertical direction at a first refrigerant inversion part; a refrigerant return pipe which extends in the axial direction of the tubular outer pipe at the central position of the tubular outer pipe, below the refrigerant outlet pipe, and which allows the inflow, from the lower end thereof, of refrigerant separated from the refrigerant containing refrigeration machine oil having flowed down in the helical flow, and wherein the flow direction has been inverted in relation to the vertical direction at a second refrigerant inversion part; and an oil storage part which is formed at the bottom of the tubular outer pipe. Furthermore, a part exhibiting a reflector function for preventing refrigeration machine oil stored in the oil storage part from flowing out into the refrigerant outlet pipe is provided between the refrigerant return pipe and the inner surface of the tubular outer pipe.

    Positive-working resist composition
    7.
    发明授权
    Positive-working resist composition 有权

    公开(公告)号：US06670095B2

    公开(公告)日：2003-12-30

    申请号：US10022363

    申请日：2001-12-20

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.

    Positive resist composition
    8.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US06632586B1

    公开(公告)日：2003-10-14

    申请号：US09392588

    申请日：1999-09-09

    申请人： Toshiaki Aoai ,  Kenichiro Sato

    发明人： Toshiaki Aoai ,  Kenichiro Sato

    IPC分类号： G03C172

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive resist composition which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and contains repeating units represented by formulae (I) and (V):

    摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，和（B）通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，并且包含重复 由式（I）和（V）表示的单元：

    Positive photosensitive composition
    9.
    发明授权
    Positive photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US06479209B1

    公开(公告)日：2002-11-12

    申请号：US09075246

    申请日：1998-05-11

    申请人： Toshiaki Aoai ,  Kenichiro Sato ,  Morio Yagihara

    发明人： Toshiaki Aoai ,  Kenichiro Sato ,  Morio Yagihara

    IPC分类号： G03C173

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： Disclosed is a positive photosensitive composition capable of giving good sensitivity, resolution and resist pattern and exhibiting sufficiently high dry etching resistance on use of an exposure light source of 250 nm or less, particularly 220 nm or less, which composition comprises (A) a compound generating an acid on irradiation of an active light ray or radiation and (B) a resin having (i) at least one polycyclic-type alicyclic group, (ii) at least one ester group which decomposes by the action of an acid and increases the solubility in an alkali developer and (iii) at least one acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer, or comprises (A) a compound generating an acid on irradiation of an active light ray or radiation, (C) a resin having a polycyclic-type alicyclic group and an ester group which decomposes by the action of an acid and increases the solubility in an alkali developer, and (D) a resin having a polycyclic-type alicyclic group and an acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer.

    摘要翻译： 公开了一种能够提供良好的灵敏度，分辨率和抗蚀剂图案并且在使用250nm或更小，特别是220nm或更小的曝光光源时表现出足够高的耐干蚀刻性的正性光敏组合物，该组合物包含（A）化合物 在活性光线或辐射照射时产生酸，和（B）具有（i）至少一种多环式脂环族基团的树脂，（ii）至少一种通过酸的作用分解并增加酸的酯基 在碱性显影剂中的溶解度和（iii）至少一种通过酸的作用分解并提高其在碱性显影剂中的溶解度的缩醛基，或包含（A）在活性光线或辐射照射时产生酸的化合物 ，（C）具有多环型脂环族基团和酯基的树脂，其通过酸的作用而分解并增加在碱性显影剂中的溶解度，（D）具有多环基的树脂 ype脂环族基团和通过酸的作用而分解并增加在碱性显影剂中的溶解度的缩醛基。

    Positive working photosensitive composition
    10.
    发明授权
    Positive working photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US06416925B1

    公开(公告)日：2002-07-09

    申请号：US09497281

    申请日：2000-02-02

    申请人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

    发明人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

    IPC分类号： G03C173

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

    摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

    摘要翻译： 适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团 的酸以增加在碱性显影剂中的溶解度。