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1.发明授权Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof 失效光调制装置和光开关，移动检测装置和距离测量装置，对准装置和半导体对准器及其处理公开(公告)号：US06628392B2
公开(公告)日：2003-09-30
申请号：US09931720
申请日：2001-08-20
申请人： Ryo Kuroda , Yasuhiro Shimada , Junichi Seki , Takako Yamaguchi , Yasuhisa Inao
发明人： Ryo Kuroda , Yasuhiro Shimada , Junichi Seki , Takako Yamaguchi , Yasuhisa Inao
IPC分类号： G01B1100
CPC分类号： G03F9/703 , G03F9/7038 , G03F9/7049 , G03F9/7088
摘要： Disclosed herein is a light modulating apparatus comprising first and second two periodic structures each having a period smaller than the wavelength of light emitted from a light source, and a moving means for relatively moving the two periodic structures, wherein the surface of the first periodic structure is brought near to the surface of the second periodic structure to a space not longer than the wavelength to arrange them in a state opposed to each other, the light incident on the first periodic structure is converted into near-field light by the first periodic structure, the converted near-field light is transmitted through the second periodic structure and converted into propagation light by scattering the near-field light on the back surface of the second periodic structure, and the intensity of the propagation light is modulated by relatively moving the two periodic structures by the moving means.
摘要翻译： 这里公开了一种光调制装置，其包括第一和第二两个周期性结构，每个周期结构的周期小于从光源发射的光的波长;以及移动装置，用于相对移动两个周期性结构，其中第一周期性结构的表面 被带到第二周期性结构的表面附近到不长于波长的空间以将它们布置成彼此相对的状态，入射到第一周期性结构的光被第一周期性结构转换成近场光 转换的近场光透过第二周期结构传播，并通过散射第二周期结构的背面上的近场光而转换为传播光，并且传播光的强度通过相对移动两个 通过移动装置的周期性结构。
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2.发明授权公开(公告)号：US07733491B2
公开(公告)日：2010-06-08
申请号：US12131433
申请日：2008-06-02
CPC分类号： G01N21/648 , G01N21/554 , Y10T436/11
摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.
摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。
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3.发明申请公开(公告)号：US20080246970A1
公开(公告)日：2008-10-09
申请号：US12131433
申请日：2008-06-02
IPC分类号： G01N21/55
CPC分类号： G01N21/648 , G01N21/554 , Y10T436/11
摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.
摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。
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4.发明授权Exposure method and exposure apparatus using near-field light and exposure mask 失效使用近场光和曝光掩模的曝光方法和曝光装置公开(公告)号：US06720115B2
公开(公告)日：2004-04-13
申请号：US09795497
申请日：2001-03-01
申请人： Yasuhisa Inao , Ryo Kuroda , Takako Yamaguchi
发明人： Yasuhisa Inao , Ryo Kuroda , Takako Yamaguchi
IPC分类号： G03F900
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/36 , G03F1/50 , G03F7/70325 , G03F7/70558 , G03F9/703
摘要： A photolithography method using near-field light includes a step of controlling the position of an exposure mask and an object to be processed so as to make the object to be located in a region where near-field light is present, and a step of exposing the object to near-field light while controlling the intensity of such light as a function of the aperture density of the exposure mask. The intensity of near-field light is controlled by modifying the aperture width or modifying the transmissivity of the exposure mask depending on the aperture density.
摘要翻译： 使用近场光的光刻方法包括控制曝光掩模和待处理物体的位置以使物体位于存在近场光的区域的步骤，以及曝光步骤 该对象成为近场光，同时根据曝光掩模的孔径密度控制这种光的强度。 通过根据孔径密度修改孔径宽度或修改曝光掩模的透射率来控制近场光的强度。
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公开(公告)号：US07399445B2
公开(公告)日：2008-07-15
申请号：US10340152
申请日：2003-01-10
CPC分类号： G01N21/648 , G01N21/554 , Y10T436/11
摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.
摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。
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6.发明授权公开(公告)号：US06785445B2
公开(公告)日：2004-08-31
申请号：US10107447
申请日：2002-03-28
申请人： Ryo Kuroda , Takako Yamaguchi , Yasuhisa Inao , Tomohiro Yamada
发明人： Ryo Kuroda , Takako Yamaguchi , Yasuhisa Inao , Tomohiro Yamada
IPC分类号： G02B626
摘要： A near field light probe is capable of emanating a near field light having a sufficient intensity while allowing reduction of aperture size to improve resolution. The near field light probe can be incorporated in a near-field optical microscope, a near field light lithography apparatus, and a near field light storage apparatus. A near field light probe has a configuration in which a light-blocking film is formed with an aperture having slits surrounding the major opening. Light emitted from a light source is coupled into the probe from one side of the light-blocking film, the light being polarized in a predetermined direction with respect to the slits so that a near field light emanates from the major opening.
摘要翻译： 近场光探测器能够发出具有足够强度的近场光，同时允许减小光圈尺寸以提高分辨率。 近场光探测器可以结合在近场光学显微镜，近场光刻设备和近场光存储设备中。 近场光探测器具有其中形成有具有围绕主开口的狭缝的孔的遮光膜的构造。 从光源发射的光从遮光膜的一侧耦合到探针中，光被相对于狭缝沿预定方向极化，使得近场光从主开口发出。
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7.发明授权公开(公告)号：US06408123B1
公开(公告)日：2002-06-18
申请号：US09708587
申请日：2000-11-09
申请人： Ryo Kuroda , Yasuhiro Shimada , Takako Yamaguchi
发明人： Ryo Kuroda , Yasuhiro Shimada , Takako Yamaguchi
IPC分类号： G02B610
CPC分类号： G01Q60/22 , Y10S977/862
摘要： A near-field optical probe comprises a micro-aperture for irradiating and/or detecting evanescent light through the front end of the probe, an elastically deformable cantilever supporting the micro-aperture at the free end thereof, and a surface plasmon polariton waveguide arranged on the cantilever to guide light from a light source to the micro-aperture and/or to guide light from a light source introduced through the micro-aperture.
摘要翻译： 近场光学探针包括用于照射和/或检测通过探针的前端的ev逝光的微孔，在其自由端支撑微孔的可弹性变形的悬臂和布置在其上的表面等离子体激元波导管 所述悬臂将光从光源引导到微孔和/或引导来自通过微孔引入的光源的光。
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公开(公告)号：US07863061B2
公开(公告)日：2011-01-04
申请号：US12509635
申请日：2009-07-27
申请人： Mitsuhiro Ikuta , Yasuhisa Inao , Takako Yamaguchi
发明人： Mitsuhiro Ikuta , Yasuhisa Inao , Takako Yamaguchi
IPC分类号： H01L21/00
CPC分类号： H01S5/18391 , H01S5/18311 , H01S5/18347 , H01S2301/166 , H01S2301/176
摘要： Provided is a surface emitting laser manufacturing method, etc., which reduces process damage occurring to a surface relief structure, enabling stable provision of a single transverse mode characteristic. Provided is a method including a surface relief structure for controlling a reflectance in a light emitting portion of an upper mirror, the surface relief structure including a stepped structure, includes: forming a resist pattern including a pattern for forming a mesa structure and a pattern for forming a stepped structure, on or above the upper mirror, and performing first-phase etching for etching the surface layer of the upper mirror to determine the horizontal position of the stepped structure; forming a current confining structure after the performing first-phase etching; and performing second-phase etching for further etching the area that the first-phase etching has been performed, to determine the depth position of the stepped structure, after the forming a current confining structure.
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9.发明申请公开(公告)号：US20070218398A1
公开(公告)日：2007-09-20
申请号：US11705787
申请日：2007-02-14
IPC分类号： G03C5/18
CPC分类号： G03F7/0755 , C07F7/12 , C07F7/1804 , G03F7/022 , G03F7/0751 , G03F7/165
摘要： Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl. group.
摘要翻译： 提供了用于通过较少步骤形成低缺陷微粒图案，点阵列图案或孔阵列图案的感光性硅烷偶联剂，以及使用这种感光性硅烷偶联剂形成图案的方法。 使用的是含有1,2-萘醌-2-二叠氮基-5-磺酰基或1,2-萘醌-2-二叠氮基-4-磺酰基的感光性硅烷偶联剂。 组。
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公开(公告)号：US20050064301A1
公开(公告)日：2005-03-24
申请号：US10931985
申请日：2004-09-02
申请人： Takako Yamaguchi , Yasuhisa Inao
发明人： Takako Yamaguchi , Yasuhisa Inao
CPC分类号： B82Y10/00 , G03F1/50 , G03F7/7035
摘要： A mask manufacturing method includes a first step of forming, on a workpiece substrate, a fine pattern on the basis of a pattern of a fine opening having a size of not more than a wavelength of exposure light by irradiating the workpiece substrate with the exposure light through a first mask provided with the fine opening and using near-field light leaking from the fine opening; and a second step of forming a second mask by processing the workpiece substrate on the basis of the fine pattern formed in the first step.
摘要翻译： 掩模制造方法包括：第一步骤，通过用曝光光照射工件基板，在工件基板上形成基于具有不大于曝光光的波长的尺寸的微细开口的图案的精细图案 通过设置有微细开口的第一掩模和使用从微细开口泄漏的近场光; 以及通过基于在第一步骤中形成的精细图案处理工件基板来形成第二掩模的第二步骤。
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