公开(公告)号：US06628392B2

公开(公告)日：2003-09-30

申请号：US09931720

申请日：2001-08-20

申请人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

IPC分类号： G01B1100

CPC分类号： G03F9/703 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7088

摘要： Disclosed herein is a light modulating apparatus comprising first and second two periodic structures each having a period smaller than the wavelength of light emitted from a light source, and a moving means for relatively moving the two periodic structures, wherein the surface of the first periodic structure is brought near to the surface of the second periodic structure to a space not longer than the wavelength to arrange them in a state opposed to each other, the light incident on the first periodic structure is converted into near-field light by the first periodic structure, the converted near-field light is transmitted through the second periodic structure and converted into propagation light by scattering the near-field light on the back surface of the second periodic structure, and the intensity of the propagation light is modulated by relatively moving the two periodic structures by the moving means.

摘要翻译： 这里公开了一种光调制装置，其包括第一和第二两个周期性结构，每个周期结构的周期小于从光源发射的光的波长;以及移动装置，用于相对移动两个周期性结构，其中第一周期性结构的表面 被带到第二周期性结构的表面附近到不长于波长的空间以将它们布置成彼此相对的状态，入射到第一周期性结构的光被第一周期性结构转换成近场光 转换的近场光透过第二周期结构传播，并通过散射第二周期结构的背面上的近场光而转换为传播光，并且传播光的强度通过相对移动两个 通过移动装置的周期性结构。

公开(公告)号：US20080246970A1

公开(公告)日：2008-10-09

申请号：US12131433

申请日：2008-06-02

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G01N21/55

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US07733491B2

公开(公告)日：2010-06-08

申请号：US12131433

申请日：2008-06-02

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G12Q1/68 ,  G01N1/02 ,  G01N21/55

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US07399445B2

公开(公告)日：2008-07-15

申请号：US10340152

申请日：2003-01-10

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： C12Q1/68 ,  G01N1/02

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US06785445B2

公开(公告)日：2004-08-31

申请号：US10107447

申请日：2002-03-28

申请人： Ryo Kuroda ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G02B626

CPC分类号： G01Q60/22 ,  G02B6/262

摘要： A near field light probe is capable of emanating a near field light having a sufficient intensity while allowing reduction of aperture size to improve resolution. The near field light probe can be incorporated in a near-field optical microscope, a near field light lithography apparatus, and a near field light storage apparatus. A near field light probe has a configuration in which a light-blocking film is formed with an aperture having slits surrounding the major opening. Light emitted from a light source is coupled into the probe from one side of the light-blocking film, the light being polarized in a predetermined direction with respect to the slits so that a near field light emanates from the major opening.

摘要翻译： 近场光探测器能够发出具有足够强度的近场光，同时允许减小光圈​​尺寸以提高分辨率。 近场光探测器可以结合在近场光学显微镜，近场光刻设备和近场光存储设备中。 近场光探测器具有其中形成有具有围绕主开口的狭缝的孔的遮光膜的构造。 从光源发射的光从遮光膜的一侧耦合到探针中，光被相对于狭缝沿预定方向极化，使得近场光从主开口发出。

公开(公告)号：US06720115B2

公开(公告)日：2004-04-13

申请号：US09795497

申请日：2001-03-01

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Takako Yamaguchi

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Takako Yamaguchi

IPC分类号： G03F900

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/36 ,  G03F1/50 ,  G03F7/70325 ,  G03F7/70558 ,  G03F9/703

摘要： A photolithography method using near-field light includes a step of controlling the position of an exposure mask and an object to be processed so as to make the object to be located in a region where near-field light is present, and a step of exposing the object to near-field light while controlling the intensity of such light as a function of the aperture density of the exposure mask. The intensity of near-field light is controlled by modifying the aperture width or modifying the transmissivity of the exposure mask depending on the aperture density.

摘要翻译： 使用近场光的光刻方法包括控制曝光掩模和待处理物体的位置以使物体位于存在近场光的区域的步骤，以及曝光步骤 该对象成为近场光，同时根据曝光掩模的孔径密度控制这种光的强度。 通过根据孔径密度修改孔径宽度或修改曝光掩模的透射率来控制近场光的强度。

公开(公告)号：US06408123B1

公开(公告)日：2002-06-18

申请号：US09708587

申请日：2000-11-09

申请人： Ryo Kuroda ,  Yasuhiro Shimada ,  Takako Yamaguchi

发明人： Ryo Kuroda ,  Yasuhiro Shimada ,  Takako Yamaguchi

IPC分类号： G02B610

CPC分类号： G01Q60/22 ,  Y10S977/862

摘要： A near-field optical probe comprises a micro-aperture for irradiating and/or detecting evanescent light through the front end of the probe, an elastically deformable cantilever supporting the micro-aperture at the free end thereof, and a surface plasmon polariton waveguide arranged on the cantilever to guide light from a light source to the micro-aperture and/or to guide light from a light source introduced through the micro-aperture.

摘要翻译： 近场光学探针包括用于照射和/或检测通过探针的前端的ev逝光的微孔，在其自由端支撑微孔的可弹性变形的悬臂和布置在其上的表面等离子体激元波导管 所述悬臂将光从光源引导到微孔和/或引导来自通过微孔引入的光源的光。

公开(公告)号：US20070146680A1

公开(公告)日：2007-06-28

申请号：US10554993

申请日：2005-06-24

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03B27/62

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70433 ,  G03F7/70691 ,  G03F9/703 ,  G03F9/7053 ,  G03F9/7088

摘要： Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.

摘要翻译： 公开了一种用于改进的光刻技术的曝光装置，曝光方法和曝光掩模。 具体地，根据本发明的一个优选形式，曝光装置被布置成与具有可弹性变形的保持构件和设置在保持构件上并形成有开口图案的遮光膜的曝光掩模一起使用，其中， 暴露曝光掩模被弯曲以与待曝光的物体接触。 曝光装置包括用于检测在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离检测系统，以及用于控制在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离控制系统， 来自距离检测系统的信号的基础。

公开(公告)号：US20070065734A1

公开(公告)日：2007-03-22

申请号：US11548756

申请日：2006-10-12

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03C5/00 ,  G03F1/00

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask. The method includes projecting non-polarized exposure light having a predetermined wavelength, emitted from a laser light source and passed through a depolarization device and a diffusion device, onto an exposure mask having a light blocking film formed with a plurality of rectangular openings therein, the openings having (i) a width in a widthwise direction not greater than one-third of the wavelength of the exposure light and (ii) two or more lengthwise directions extending along the mask surface, so that near-field light escaping from the openings performs exposure of a pattern on the basis of the openings.

摘要翻译： 一种用于基于从掩模的开口逸出的近场光暴露工件的曝光方法。 该方法包括将从激光源射出并通过去极化装置和扩散装置的具有预定波长的非偏振曝光光投射到具有形成有多个矩形开口的遮光膜的曝光掩模上， 具有（i）宽度方向的宽度不大于曝光光的波长的三分之一的开口和（ii）沿着掩模表面延伸的两个或更多个长度方向，使得从开口逸出的近场光执行 在开口的基础上曝光图案。

公开(公告)号：US07262851B2

公开(公告)日：2007-08-28

申请号：US11166106

申请日：2005-06-27

申请人： Ryo Kuroda ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhisa Inao

IPC分类号： G01B11/00

CPC分类号： G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7042

摘要： Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.

摘要翻译： 公开了一种用于检测第一和第二物体之间的相对位置偏差的方法和装置。 在本发明的一个优选形式中，检测方法包括以下步骤：（i）分别为第一和第二物体提供衍射光栅，每个衍射光栅具有大于所使用的光源的波长的光栅间距，（ii） 第一和第二物体，使得具有小于所使用的光源的波长的厚度的介电材料层插入在第一和第二物体之间，并且使得第一和第二物体的衍射光栅彼此相对（（ iii）将来自光源的光投射到第一和第二物体的衍射光栅上，以及（iv）基于从衍射光栅投影到衍射光栅的衍射光来检测第一和第二物体之间的相对位置偏差。