摘要:
According to one embodiment, a method for removing carbon dioxide in an exhaust gas utilizing seawater includes: blowing ammonia into seawater to produce ammonia-saturated seawater; contacting an exhaust gas under a state of non-heat with the ammonia-saturated seawater so that carbon dioxide in the exhaust gas is absorbed in the ammonia-saturated seawater; and splaying a solution containing sodium hydrogen carbonate and ammonium chloride which are produced through absorption of the carbon dioxide by the ammonia-saturated seawater utilizing pressure of the exhaust gas while cooling the solution utilizing heat of evaporation of a solvent of the solution so as to settle out and recover the sodium hydrogen carbonate and the ammonium chloride.
摘要:
According to one embodiment, a method for removing carbon dioxide in an exhaust gas utilizing seawater includes: blowing ammonia into seawater to produce ammonia-saturated seawater; contacting an exhaust gas under a state of non-heat with the ammonia-saturated seawater so that carbon dioxide in the exhaust gas is absorbed in the ammonia-saturated seawater; and splaying a solution containing sodium hydrogen carbonate and ammonium chloride which are produced through absorption of the carbon dioxide by the ammonia-saturated seawater utilizing pressure of the exhaust gas while cooling the solution utilizing heat of evaporation of a solvent of the solution so as to settle out and recover the sodium hydrogen carbonate and the ammonium chloride.
摘要:
An ink jet recording apparatus comprising a color ink container having a capacity V1 accommodating therein a solvent polymerizable in the presence of an acid and a colorant, a reaction liquid container having a capacity V2 (V2
摘要:
There is provided a pigment dispersion comprising at least one resin-coated pigment comprising a resin and a pigment, and having an average particle diameter of 250 nm or less, and a dispersion medium containing as a major component a cation polymeric compound having a viscosity of 30 mPa·s or less at a temperature of 25° C. and a boiling point of 150° C. or more at 1 atm. The pigment is incorporated in the pigment dispersion at a ratio ranging from 3 to 41% by weight based on a total weight of the dispersion medium, and the resin is incorporated in the resin-coated pigment at a ratio ranging from 5 to 37% by weight based on the weight of the pigment.
摘要:
There is provided an inkjet ink comprising a photo-acid generating agent which is capable of generating an acid as it is irradiated with light, a color component, and an acid-polymerizable compound which can be polymerized in the presence of an acid, wherein at least 40% of the acid-polymerizable solvent is a vinyl ether compound represented by the following general formula (1): R13—R14—(R13)p (1) (Wherein R13(s) is a group selected from the group consisting of a vinyl ether group, a group having a vinyl ether skeleton, an alkoxy group, substituted hydroxyl group and hydroxyl group wherein at least one of R13(s) is vinyl ether group or a group having a vinyl ether skeleton, R14 is a group comprising a substituted or unsubstituted cyclic skeleton and having a valence of (p+1), and p is a positive integer including zero).
摘要:
There is disclosed a liquid ink including a photo acid generating agent that generates an acid upon irradiation with light, a coloring component, and at least one kind of a solvent that is polymerized in the presence of an acid. It is preferable that the amount of the photo acid generating agent contained in the liquid ink falls within a range of between 1 part by weight and 10 parts by weight relative to 100 parts by weight of the solvent, the coloring component consists of a pigment, and the solvent contains at least 50 parts by weight of an acid polymerizable compound, the acid polymerizing compound polymerizing in the presence of the acid, having an alicyclic skeleton and/or an aliphatic skeleton having a viscosity of 50 mpa·s or less and a boiling point of 150° C. or more under room temperature and atmospheric pressure.
摘要:
An inkjet ink is provided, which includes a pigment dispersion containing an organic dispersant, a black pigment having an average particle diameter of not more than 200 nm, and a resinous dispersing agent, the organic dispersant being formed of at least one polymerizable compound, and the black pigment being included therein at an amount ranging from 2 to 30% by weight based on the organic dispersant, and an ionic compound. A ζ-potential of the black pigment to the at least one polymerizable compound of the organic dispersant is confined within the range of −10 mV to +100 mV.
摘要:
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要:
A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3 (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.
摘要:
Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range shorter than the maximum wavelength in the third absorption band from the long-wave side in the absorption spectrum of the aromatic compound and longer than the maximum wavelength in the fourth absorption band from the same, thereby to cause a photochemical reaction in the light-sensitive layer, and a step of developing the exposed light-sensitive layer, optionally after heat-treating the layer, so as to selectively remove the exposed area of the layer or leave the area as it is. The method gives a pattern having a high resolving power and an excellent dry-etching resistance.