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    FLUID TREATMENT APPARATUS
    3.
    发明申请
    FLUID TREATMENT APPARATUS 审中-公开
    流体处理设备

    公开(公告)号：US20150376042A1

    公开(公告)日：2015-12-31

    申请号：US14730498

    申请日：2015-06-04

    申请人： Toshiyuki MUTOH ,  Shogo SUZUKI ,  Yuu ZAMA ,  Aya UTSUKI ,  Kimio AOKI ,  Hideyuki MIYAZAWA ,  Makito NAKASHIMA ,  Kenichi HAYAKAWA ,  Shigeru YAMADA

    发明人： Toshiyuki MUTOH ,  Shogo SUZUKI ,  Yuu ZAMA ,  Aya UTSUKI ,  Kimio AOKI ,  Hideyuki MIYAZAWA ,  Makito NAKASHIMA ,  Kenichi HAYAKAWA ,  Shigeru YAMADA

    IPC分类号： C02F1/72 ,  C02F1/52 ,  B01D21/00

    CPC分类号： C02F1/725 ,  B01J19/006 ,  B01J19/26 ,  C02F1/02 ,  C02F1/444 ,  C02F11/06 ,  C02F2101/30 ,  C02F2101/363 ,  C02F2101/366

    摘要： A fluid treatment apparatus for treating a target fluid is provided. The fluid treatment apparatus includes a cylindrical reactor and one or more catalyst members each having a rod-like or plate-like shape extending in a longitudinal direction within the reactor. The cylindrical reactor decomposes an organic substance contained in a mixed fluid of the target fluid with an oxidant by an oxidation reaction under heat and pressure. The cylindrical reactor has an introduction port on one end and a discharge port on the other end. An upstream end surface, relative to a direction of flow of the target fluid, of each of the catalyst members is located in a downstream vicinity of or upstream from an inflow position where the target fluid flows into the reactor through the introduction port. Each of the catalyst members is suspended with the upstream end surface being fixed.

    摘要翻译： 提供了一种用于处理目标流体的流体处理装置。 流体处理装置包括圆柱形反应器和一个或多个催化剂构件，每个催化剂构件具有在反应器内沿纵向延伸的棒状或板状形状。 圆筒形反应器在热和压力下通过氧化反应将目标流体的混合流体中的有机物质与氧化剂分解。 圆柱形反应器在一端具有引入口，另一端具有排出口。 每个催化剂构件相对于目标流体的流动方向的上游端表面位于通过引入口流入反应器的流入位置的下游附近或上游。 每个催化剂构件被悬挂，上游端面被固定。

    KEY SWITCH STRUCTURE
    5.
    发明申请
    KEY SWITCH STRUCTURE 有权
    钥匙开关结构

    公开(公告)号：US20130043113A1

    公开(公告)日：2013-02-21

    申请号：US13542650

    申请日：2012-07-05

    申请人： Shigeru YAMADA

    发明人： Shigeru YAMADA

    IPC分类号： H01H13/14

    CPC分类号： H01H3/125 ,  H01H2217/004

    摘要： A key switch structure can include a key top, a link structure, a back plate, a membrane sheet, an elastic member, an arm bar, and a pushing member. The link structure can guide the key top in the pushing direction while the key top is pushed. The back plate can support the link structure. The membrane sheet can include a contact portion arranged on the membrane sheet and connectable, in response to a predetermined pressure, to an electrical contact to form a closed circuit. The elastic member can push and separate the key top from the back plate, and be elastically deformable. The arm bar can movably support the key top, and the arm bar can be supported movably at the back plate. The pushing member can push the link structure while the key top is pushed.

    摘要翻译： 键开关结构可以包括键顶，连杆结构，背板，膜片，弹性构件，手臂杆和推动构件。 当按键顶部时，连杆结构可以在推动方向上引导键顶。 后板可以支撑连杆结构。 膜片可以包括布置在膜片上的接触部分，并且响应于预定压力可连接到电接触件以形成闭合回路。 弹性构件可以将键顶与背板推压分离，并且可弹性变形。 扶手杆可以移动地支撑钥匙顶部，并且臂杆可以在后板上可移动地被支撑。 推动构件可以在键顶被推动的同时推动连杆结构。

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
    6.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号：US20090230563A1

    公开(公告)日：2009-09-17

    申请号：US12395861

    申请日：2009-03-02

    申请人： Shigeru YAMADA

    发明人： Shigeru YAMADA

    IPC分类号： H01L23/48

    CPC分类号： H01L21/76898 ,  H01L23/3114 ,  H01L23/481 ,  H01L24/94 ,  H01L27/14603 ,  H01L27/14618 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/13024 ,  H01L2924/10253 ,  H01L2924/15788 ,  H01L2924/00

    摘要： A semiconductor device capable of preventing a crack from occurring in an electrode layer exposed through a through hole which is formed in a semiconductor substrate and a method of manufacturing the semiconductor device. In exemplary embodiments, a through via and an opening in a passivation film are disposed so that an opening diameter of the through via is larger than an opening diameter of the opening of the passivation film, and an opening edge of the through via is located outside an opening edge of the opening of the passivation film. In other embodiments, the through via and the opening of the passivation film are disposed so that the opening edge of the through via is disposed at a location which does not overlap with the opening edge (opening edge of a portion in contact with a pad electrode) of the opening of the passivation film.

    摘要翻译： 一种能够防止在形成在半导体衬底中的通孔露出的电极层中发生裂纹的半导体器件及其制造方法。 在示例性实施例中，钝化膜中的通孔和开口被设置成使得通孔的开口直径大于钝化膜的开口的开口直径，并且通孔的开口边缘位于外侧 钝化膜的开口的开口边缘。 在其它实施例中，钝化膜的通孔和开口被设置成使得通孔的开口边缘设置在不与开口边缘重叠的位置处（与焊盘电极接触的部分的开口边缘 ）钝化膜的开口。

    USAGE STATUS MANAGEMENT DEVICE, RECORDING MEDIUM STORING USAGE STATUS PROCESSING PROGRAM, USAGE STATUS MANAGEMENT SYSTEM, AND USAGE STATUS MANAGEMENT METHOD
    7.
    发明申请
    USAGE STATUS MANAGEMENT DEVICE, RECORDING MEDIUM STORING USAGE STATUS PROCESSING PROGRAM, USAGE STATUS MANAGEMENT SYSTEM, AND USAGE STATUS MANAGEMENT METHOD 有权
    使用状态管理设备，记录存储使用状态处理程序，使用状态管理系统和使用状态管理方法

    公开(公告)号：US20090002748A1

    公开(公告)日：2009-01-01

    申请号：US11948208

    申请日：2007-11-30

    申请人： Shigeru YAMADA

    发明人： Shigeru YAMADA

    IPC分类号： G06F3/12

    CPC分类号： H04N1/00832 ,  G03G15/502 ,  G03G15/5087 ,  G03G2215/00109 ,  G03G2215/00126 ,  H04N1/00344 ,  H04N2201/0039 ,  H04N2201/0082 ,  H04N2201/0094

    摘要： A usage status management device, which includes a collection section that collects usage history information of an image forming device, the usage history information including information on a usage of a display operation section of the image forming device, an analysis section that analyzes a usage status of the image forming device based on the usage history information collected by the collection section, and an output control section that controls to output the usage status of the image forming device analyzed by the analysis section.

    摘要翻译： 一种使用状态管理装置，包括：收集部，其收集图像形成装置的使用历史信息;所述使用历史信息包括关于所述图像形成装置的显示操作部的使用的信息;分析部，其分析使用状态 基于由收集部分收集的使用历史信息的图像形成装置以及控制输出由分析部分分析的图像形成装置的使用状态的输出控制部。