公开(公告)号：US20060158638A1

公开(公告)日：2006-07-20

申请号：US11312654

申请日：2005-12-21

申请人： Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

发明人： Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

公开(公告)号：US20070139855A1

公开(公告)日：2007-06-21

申请号：US11312651

申请日：2005-12-21

申请人： Hubert Van Mierlo ,  Erik Ham ,  Hendricus Meijer ,  Hendrik Neerhof ,  Joost Ottens ,  Johannes Leijtens ,  Marco Kluse ,  Jan Hopman ,  Johannes Moors

发明人： Hubert Van Mierlo ,  Erik Ham ,  Hendricus Meijer ,  Hendrik Neerhof ,  Joost Ottens ,  Johannes Leijtens ,  Marco Kluse ,  Jan Hopman ,  Johannes Moors

IPC分类号： H01B13/00 ,  H01L21/683 ,  G03C5/00 ,  G21G5/00

CPC分类号： H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

摘要翻译： 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

公开(公告)号：US20060097201A1

公开(公告)日：2006-05-11

申请号：US10970733

申请日：2004-10-22

申请人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

发明人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

IPC分类号： G01J3/10

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

摘要翻译： 公开了一种光刻设备。 该装置包括布置成提供辐射束的照明系统，被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具，其构造成提供用于将物品夹持在物品支撑件 以及用于偏置多极夹具的至少一个电极的偏置电压电路，使得可能避免由于在制品上的静电产生而出现的脊的发生。

公开(公告)号：US20060292457A1

公开(公告)日：2006-12-28

申请号：US11167560

申请日：2005-06-28

申请人： Hendricus Johannes Meijer ,  Uwe Mickan ,  Marco Kluse

发明人： Hendricus Johannes Meijer ,  Uwe Mickan ,  Marco Kluse

IPC分类号： A47G1/12 ,  G03B27/62 ,  B05B5/053 ,  G03F1/14 ,  G21K5/00 ,  G03F1/00

CPC分类号： G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/38 ,  G03F1/40 ,  G03F7/707 ,  G03F7/70708 ,  G21K2201/06

摘要： A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.