Virtual mask digital electron beam lithography
    4.
    发明授权
    Virtual mask digital electron beam lithography 失效
    虚拟掩模数字电子束光刻

    公开(公告)号:US5892231A

    公开(公告)日:1999-04-06

    申请号:US795003

    申请日:1997-02-05

    摘要: Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.

    摘要翻译: 描述了用于直接数字全息术的系统和方法。 一种装置包括一激光器; 与激光光学耦合的分束器; 光束耦合到分束器的参考光束镜; 光学耦合到分束器的物体,光学耦合到参考光束镜和物体的聚焦透镜; 以及光学耦合到聚焦透镜的数字记录器。 参考光束以非正常角度入射到参考光束镜上,并且参考光束和物体光束被聚焦透镜聚焦在数字记录器的焦平面处以形成图像。 该系统和方法提供了可以进行计算机辅助全息测量的优点。