摘要:
Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(═O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.
摘要:
An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
摘要翻译:螺环结构的酸不稳定酯单体具有式(1)其中Z是具有可聚合双键的一价基团,X是形成环戊烷,环己烷或降冰片烷环的二价基团,R 2是H或一价烃,R 3和 R 4为H或一价烃,或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团,n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应,聚合物可用于配制具有高分辨率的抗蚀剂组合物。
摘要:
An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
摘要翻译:螺环结构的酸不稳定酯单体具有式(1)其中Z是具有可聚合双键的一价基团,X是形成环戊烷,环己烷或降冰片烷环的二价基团,R 2是H或一价烃,R 3和 R 4为H或一价烃,或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团,n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应,聚合物可用于配制具有高分辨率的抗蚀剂组合物。
摘要:
A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or alkyl, or R1 and R2, and R3 and R4 taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
摘要:
A resist composition contains as a base resin a polymer represented by the following formula and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is alkyl, R3 is H, methyl or CH2CO2R2, at least one of R4 to R7 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are independently H or alkyl, at least one of R8 to R11 is a monovalent hydrocarbon group of 2 to 15 carbon atoms containing a —CO2— partial structure, and the reminders are independently H or alkyl, R12 is a polycyclic hydrocarbon group or an alkyl group containing such a polycyclic hydrocarbon group, R13 is an acid labile group, Z is a divalent group of atoms to construct a 5- or 6-membered ring which contains a carboxylate, carbonate or acid anhydride therein, k is 0 or 1, x is a number from more than 0 to 1, “a” to “d” are from 0 to less than 1, x+a+b+c+d=1. The resist composition has significantly improved resolution, substrate adhesiveness, and etching resistance and is very useful in precise microfabrication.
摘要翻译:抗蚀剂组合物包含作为基础树脂的由下式表示的聚合物,其Mw为1,000-500,000.R 1是H,甲基或CO 2 R 2,R 2是烷基,R 3是 H,甲基或CH 2 CO 2 R 2,R 4至R 7中的至少一个是含羧基或羟基的一价烃基,并且提醒独立地为H或烷基,R 8, R 11是含有-CO 2 - 部分结构的2至15个碳原子的一价烃基,并且提醒独立地是H或烷基,R 12是多环烃基或含有这种多环的烷基 烃基,R 13是酸不稳定基团,Z是构成其中含有羧酸酯,碳酸酯或酸酐的5-或6-元环的二价原子基团,k是0或1,x是 数字从0到1,“a”到“d”从0到小于1,x + a + b + c + d = 1。 抗蚀剂组合物具有显着提高的分辨率,基底粘附性和耐蚀刻性,并且在精确微细加工中非常有用。
摘要:
Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(═O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.
摘要:
A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
摘要:
A polymer having a rate of dissolution in an alkaline developer that increases under the action of acid is provided. The polymer is prepared by reacting a hydrogenated ROMP polymer with an O-alkylating agent in the presence of a base.
摘要:
A polymer having a rate of dissolution in an alkaline developer that increases under the action of acid is provided. The polymer is prepared by reacting a hydrogenated ROMP polymer with an O-alkylating agent in the presence of a base.
摘要:
Novel polymerizable ester compounds having formulae (1) to (4) undergo no acid-induced decomposition by β-elimination wherein A1 is a polymerizable functional group having a carbon-carbon double bond, R1 is H or —C—(R5)3, R2 and R3 are alkyl, R4 is H or alkyl, R5 is a monovalent hydrocarbon group, X is alkylene, Y is methylene, ethylene or isopropylidene, Z is alkylene, and n=1 or 2. Resist compositions comprising polymers derived from the ester compounds have excellent sensitivity and resolution and lend themselves to micropatterning lithography.