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1.发明授权Fluorinated monomer, fluorinated polymer, resist composition, and patterning process 有权氟化单体，氟化聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US08945809B2
公开(公告)日：2015-02-03
申请号：US12952304
申请日：2010-11-23
IPC分类号： G03F7/004 , G03F7/20 , G03F7/039 , C07C69/73 , C08F220/22 , C08F220/24 , C08F220/26 , C08F222/18 , C08F222/22 , C08L33/14 , C08K5/36 , C08L33/16
CPC分类号： C07C69/73 , C08F220/22 , C08F220/24 , C08F220/26 , C08F222/18 , C08F222/22 , C08K5/36 , C08L33/14 , C08L33/16 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08L2666/04
摘要： A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 is a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
摘要翻译： 氟化单体具有式（1）其中R1是H，F，甲基或三氟甲基，R2是可以具有卤素或氧的一价烃基，A是二价烃基，k1是0,1或2.聚合物 来自氟化单体的化合物可赋予适当的防水性，水滑性，酸性和水解性，并且可用作配制抗蚀剂组合物中的添加剂聚合物。
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2.发明申请FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权氟化单体，氟化聚合物，耐腐蚀组合物和方法公开(公告)号：US20110151381A1
公开(公告)日：2011-06-23
申请号：US12952304
申请日：2010-11-23
CPC分类号： C07C69/73 , C08F220/22 , C08F220/24 , C08F220/26 , C08F222/18 , C08F222/22 , C08K5/36 , C08L33/14 , C08L33/16 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08L2666/04
摘要： A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 is a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
摘要翻译： 氟化单体具有式（1）其中R1是H，F，甲基或三氟甲基，R2是可以具有卤素或氧的一价烃基，A是二价烃基，k1是0,1或2.聚合物 来自氟化单体的化合物可赋予适当的防水性，水滑性，酸性和水解性，并且可用作配制抗蚀剂组合物中的添加剂聚合物。
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公开(公告)号：US08916331B2
公开(公告)日：2014-12-23
申请号：US13324123
申请日：2011-12-13
申请人： Koji Hasegawa , Takeshi Sasami , Yuji Harada , Taku Morisawa
发明人： Koji Hasegawa , Takeshi Sasami , Yuji Harada , Taku Morisawa
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A polymer having a partial structure —C(CF3)2OH in recurring units is used as an additive to formulate a resist composition. A photoresist film formed from the resist composition has sufficient barrier performance against water to prevent any resist components from being leached in water and thus minimize any change of pattern profile.
摘要翻译： 使用重复单元中具有部分结构-C（CF 3）2 OH的聚合物作为配制抗蚀剂组合物的添加剂。 由抗蚀剂组合物形成的光致抗蚀剂膜对水具有足够的阻挡性能，以防止任何抗蚀剂组分在水中浸出，从而最小化图案轮廓的任何变化。
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公开(公告)号：US20120148945A1
公开(公告)日：2012-06-14
申请号：US13324123
申请日：2011-12-13
申请人： Koji Hasegawa , Takeshi Sasami , Yuji Harada , Taku Morisawa
发明人： Koji Hasegawa , Takeshi Sasami , Yuji Harada , Taku Morisawa
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A polymer having a partial structure —C(CF3)2OH in recurring units is used as an additive to formulate a resist composition. A photoresist film formed from the resist composition has sufficient barrier performance against water to prevent any resist components from being leached in water and thus minimize any change of pattern profile.
摘要翻译： 使用重复单元中具有部分结构-C（CF 3）2 OH的聚合物作为配制抗蚀剂组合物的添加剂。 由抗蚀剂组合物形成的光致抗蚀剂膜对水具有足够的阻挡性能，以防止任何抗蚀剂组分在水中浸出，从而最小化图案轮廓的任何变化。
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公开(公告)号：US20080118860A1
公开(公告)日：2008-05-22
申请号：US11905763
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
CPC分类号： G03F7/0397 , C08F24/00 , C08F220/32 , G03F7/0046 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
摘要翻译： 作为添加剂，作为抗蚀剂组合物，含有含有含氟酯的内酯单元的碱溶性聚合物。 抗蚀剂组合物形成显影后具有降低的接触角的抗蚀剂膜。 抗蚀剂膜防止浸渍光刻时的水渗透。
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公开(公告)号：US07537880B2
公开(公告)日：2009-05-26
申请号：US11905763
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
CPC分类号： G03F7/0397 , C08F24/00 , C08F220/32 , G03F7/0046 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
摘要翻译： 作为添加剂，作为抗蚀剂组合物，含有含有含氟酯的内酯单元的碱溶性聚合物。 抗蚀剂组合物形成显影后具有降低的接触角的抗蚀剂膜。 抗蚀剂膜防止浸渍光刻时的水渗透。
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公开(公告)号：US07514204B2
公开(公告)日：2009-04-07
申请号：US11976279
申请日：2007-10-23
申请人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
发明人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译： 抗蚀剂组合物包含在酸作为基础树脂的作用下增加其碱溶解性的聚合物，以及包含含有磺酸胺盐的重复单元和含有至少一个氟原子作为添加剂的重复单元的共聚物。 该组合物适用于浸没光刻。
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公开(公告)号：US20080096131A1
公开(公告)日：2008-04-24
申请号：US11976279
申请日：2007-10-23
申请人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
发明人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译： 抗蚀剂组合物包含在酸作为基础树脂的作用下增加其碱溶解性的聚合物，以及包含含有磺酸胺盐的重复单元和含有至少一个氟原子作为添加剂的重复单元的共聚物。 该组合物适用于浸没光刻。
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公开(公告)号：US07771914B2
公开(公告)日：2010-08-10
申请号：US11872952
申请日：2007-10-16
申请人： Jun Hatakeyama , Takao Yoshihara , Yuji Harada , Wataru Kusaki
发明人： Jun Hatakeyama , Takao Yoshihara , Yuji Harada , Wataru Kusaki
CPC分类号： G03F7/0397 , C08F220/10 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or alkylene, R10 and R11 are H, F, methyl or trifluoromethyl, R12 and R13 are a single bond, —O— or —CR18R19—, R9, R18, and R19 are H, F, methyl or trifluoromethyl, R17 is alkylene, X1, X2 and X3 are —C(═O)—O—, —O—, or —C(═O)—R20—C(═O)—O— wherein R20 is alkylene, 0≦(a-1)
摘要翻译： 抗蚀剂组合物包含含有式（1）的重复单元的聚合物，其中R 1，R 4，R 7和R 14为H或甲基，R 2，R 3，R 15和R 16为H，烷基或氟代烷基，R为F或H，R 5 是亚烷基，R6是氟化烷基，R8是单键或亚烷基，R10和R11是H，F，甲基或三氟甲基，R12和R13是单键，-O-或-CR18R19-，R9，R18和R19 是H，F，甲基或三氟甲基，R 17是亚烷基，X 1，X 2和X 3是-C（= O）-O-，-O-或-C（= O）-R 20 -C（= O）-O （a-1）+（a-2）+（a-1）+（a-2）+（a-2） （a-3）<1,0
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公开(公告)号：US08431323B2
公开(公告)日：2013-04-30
申请号：US12608556
申请日：2009-10-29
申请人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
发明人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
CPC分类号： G03F7/11 , C07D307/04 , C07D307/77 , C07D315/00 , C07D319/06 , C08F14/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F2/00
摘要： A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
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