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1.发明申请公开(公告)号：US20080222597A1
公开(公告)日：2008-09-11
申请号：US12118578
申请日：2008-05-09
申请人： Koji Hashimoto , Tadashito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadashito Fujisawa , Yuko Kono , Takashi Obara
IPC分类号： G06F17/50
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。
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2.发明授权公开(公告)号：US07384712B2
公开(公告)日：2008-06-10
申请号：US10832995
申请日：2004-04-28
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
IPC分类号： G03F1/00
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。
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3.发明申请公开(公告)号：US20050003305A1
公开(公告)日：2005-01-06
申请号：US10832995
申请日：2004-04-28
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。
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公开(公告)号：US07662523B2
公开(公告)日：2010-02-16
申请号：US12118510
申请日：2008-05-09
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
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公开(公告)号：US20080220377A1
公开(公告)日：2008-09-11
申请号：US12118510
申请日：2008-05-09
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
IPC分类号： G03F7/20
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
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6.发明授权公开(公告)号：US07794899B2
公开(公告)日：2010-09-14
申请号：US12118578
申请日：2008-05-09
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
IPC分类号： G03F1/00
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。
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公开(公告)号：US09601357B2
公开(公告)日：2017-03-21
申请号：US14383817
申请日：2012-09-07
IPC分类号： C03C15/00 , H01L21/67 , H01L21/677
CPC分类号： H01L21/6704 , H01L21/67051 , H01L21/67057 , H01L21/67751
摘要： A substrate processing apparatus and method includes, a plate that has a size equal to or larger than a principal face of the substrate, and has a horizontal and flat liquid holding face opposing the principal face of the substrate from below. A processing liquid supply unit supplies a processing liquid to the liquid holding face. A control unit controls the processing liquid supply unit and a movement unit to supply the processing liquid to the liquid holding face to form a processing liquid film, a contact step of bringing the principal face of the substrate and the liquid holding face close to each other to bring the principal face of the substrate into contact with the processing liquid film, and a liquid contact maintenance step of maintaining the processing liquid in contact with the principal face of the substrate.
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公开(公告)号：US09101066B2
公开(公告)日：2015-08-04
申请号：US13788855
申请日：2013-03-07
申请人： Isao Azumi , Koji Hashimoto
发明人： Isao Azumi , Koji Hashimoto
CPC分类号： H05K5/069 , H05K5/0052 , H05K5/062 , Y10T29/49213
摘要： An outer circumferential groove filled with a seal material and an opposing surface portion are provided to a fit portion of a case. A tray portion opposing the opposing surface portion and an outer circumferential protruding portion entering the outer circumferential groove are provided to the fit portion of a cover. Master dimensions are set so that an outer clearance A0 between the outer circumferential groove and the outer circumferential protruding portion is always larger than an inner clearance C0 between the former and the latter when center positions of the cover and the case coincide with each other.
摘要翻译： 填充有密封材料的外周槽和相对的表面部分设置在壳体的配合部分。 在盖的配合部分设置有与相对表面部分相对的托盘部分和进入外周槽的外周突出部分。 设定主尺寸，使得当外壳和外周突出部之间的外部间隙A0总是大于前者与后者之间的内部间隙C0时，盖和壳体的中心位置彼此重合。
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公开(公告)号：US08994220B2
公开(公告)日：2015-03-31
申请号：US13343804
申请日：2012-01-05
CPC分类号： B60R16/00
摘要： In a vehicle-mounted electronic control device having a switching power supply in which a switching element is controlled to obtain a predetermined intermediate voltage Va stepped down from a vehicle-mounted battery, and to which a downstream side coil, a flywheel diode, and an output capacitor are connected to suppress a pulsating voltage, a circuit for suppressing reverse conduction for the switching element is provided in order to prevent that the switching element is reversely conducted and thus a charging voltage of the output capacitor is abnormally lowered when a power supply voltage Vb of the vehicle-mounted battery is abnormally lowered.
摘要翻译： 在具有开关电源的车载电子控制装置中，其中开关元件被控制以获得从车载电池下降的预定中间电压Va，并且下游侧线圈，续流二极管和 连接输出电容器以抑制脉动电压，为了防止开关元件反向导通，设置用于抑制反向导通的电路，因此当电源电压为0V时，输出电容器的充电电压异常降低 车载电池的Vb异常地下降。
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公开(公告)号：US08963031B2
公开(公告)日：2015-02-24
申请号：US13635794
申请日：2011-02-07
CPC分类号： H01H9/047 , H01H21/08 , H01H21/24 , H01H23/06 , H01H2021/225 , H01H2223/004 , H01H2300/01
摘要： A switch unit includes an upper case that has an operation portion attached therein; a circuit board that has a switch attached thereto that is able to switch contact points by operation of the operation portion; and a lower case that fits into the upper case such that the lower case is surrounded by the upper case, and that accommodates the circuit board between the upper case and the lower case. A draining portion is provided at a side surface of the upper case, and the draining portion is integrally formed with a sidewall forming the side surface and protrudes downward, and has a width that gradually narrows from the top to the bottom thereof.
摘要翻译： 一种开关单元包括：一个具有附接在其中的操作部分的上壳体; 电路板，其具有附接到其上的开关，其能够通过操作部的操作来切换接触点; 以及下壳体，其适合于上壳体，使得下壳体被上壳体包围，并且将电路板容纳在上壳体和下壳体之间。 排水部设置在上壳体的侧面，排水部与形成侧面的侧壁一体形成，向下方突出，宽度从顶部到底部逐渐变窄。
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