公开(公告)号：US20080222597A1

公开(公告)日：2008-09-11

申请号：US12118578

申请日：2008-05-09

申请人： Koji Hashimoto ,  Tadashito Fujisawa ,  Yuko Kono ,  Takashi Obara

发明人： Koji Hashimoto ,  Tadashito Fujisawa ,  Yuko Kono ,  Takashi Obara

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。

公开(公告)号：US07794899B2

公开(公告)日：2010-09-14

申请号：US12118578

申请日：2008-05-09

申请人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

发明人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

IPC分类号： G03F1/00

CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。

公开(公告)号：US07384712B2

公开(公告)日：2008-06-10

申请号：US10832995

申请日：2004-04-28

申请人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

发明人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

IPC分类号： G03F1/00

CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。

公开(公告)号：US20050003305A1

公开(公告)日：2005-01-06

申请号：US10832995

申请日：2004-04-28

申请人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

发明人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

IPC分类号： G03C5/00 ,  G03F1/32 ,  G03F1/36 ,  G03F1/76 ,  G03F7/20 ,  G06F17/50 ,  H01L21/027

CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。

公开(公告)号：US07662523B2

公开(公告)日：2010-02-16

申请号：US12118510

申请日：2008-05-09

申请人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

发明人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

IPC分类号： G03F1/00 ,  G03F7/20

CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

公开(公告)号：US20080220377A1

公开(公告)日：2008-09-11

申请号：US12118510

申请日：2008-05-09

申请人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

发明人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

IPC分类号： G03F7/20

CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

公开(公告)号：US20140080146A1

公开(公告)日：2014-03-20

申请号：US14113385

申请日：2012-04-25

申请人： Takashi Obara ,  Eiji Inoue

发明人： Takashi Obara ,  Eiji Inoue

IPC分类号： G01N33/68

CPC分类号： G01N33/6896 ,  C12N9/12 ,  C12Y207/10001 ,  G01N2800/2814 ,  G01N2800/2821

摘要： A method for detecting a neurological disease associated with cognitive impairment, wherein the extracellular domain of EphA4 is measured from a biological sample taken from a subject.

摘要翻译： 一种用于检测与认知障碍相关的神经疾病的方法，其中从取自受试者的生物样品测量EphA4的细胞外结构域。

公开(公告)号：US20130126959A1

公开(公告)日：2013-05-23

申请号：US13613473

申请日：2012-09-13

申请人： Ryota Aburada ,  Takashi Obara ,  Toshiya Kotani

发明人： Ryota Aburada ,  Takashi Obara ,  Toshiya Kotani

IPC分类号： H01L27/088 ,  H01L21/302 ,  H01L21/336 ,  H01L29/02

CPC分类号： H01L21/0337 ,  H01L21/32139 ,  H01L27/11582

摘要： According to one embodiment, there are provided a first shaped pattern in which a plurality of first holes are arranged and of which a width is periodically changed along an arrangement direction of the first holes, a second shaped pattern in which a plurality of second holes are arranged and of which a width is periodically changed along an arrangement direction of the second holes, and slits which are formed along the arrangement direction of the first holes and separate the first shaped pattern and the second shaped pattern.

摘要翻译： 根据一个实施例，提供了一种第一成形图案，其中布置多个第一孔并且沿着第一孔的排列方向周期性地改变宽度，第二成形图案中多个第二孔是 沿着第二孔的排列方向周期性地改变宽度，沿着第一孔的排列方向形成并分离第一成形图案和第二成形图案的狭缝。

公开(公告)号：US08426142B2

公开(公告)日：2013-04-23

申请号：US12995489

申请日：2009-05-29

申请人： Takashi Obara ,  Sadaaki Mizoguchi

发明人： Takashi Obara ,  Sadaaki Mizoguchi

IPC分类号： G01N33/53

CPC分类号： G01N33/6854 ,  G01N33/6893 ,  G01N2800/347

摘要： There is provided a renal disease testing method comprising a complex detection step of detecting a complex of human uromodulin and human IgA in a sample derived from urine collected from a subject. It is preferred that the renal disease testing method of the invention further comprises a determination step of assessing the whether the renal disease is IgA nephropathy based on the ratio of the amount of the complex detected in the complex detection step to the amount of urinary proteins in the sample. The renal disease testing method of the invention has good detection sensitivity and specificity, and can conveniently and safely assess the existence of a renal disease (preferably, IgA nephropathy).

摘要翻译： 提供了一种肾脏疾病测试方法，其包括在从受试者收集的尿中得到的样品中检测人尿调制蛋白和人IgA的复合物的复合物检测步骤。 优选本发明的肾脏疾病检测方法还包括以下步骤：基于复合物检测步骤检测到的复合物的量与尿蛋白质量的比例来评估肾脏疾病是否为IgA肾病的判定步骤 例子。 本发明的肾病检测方法具有良好的检测灵敏度和特异性，可以方便，安全地评估肾病（优选IgA肾病）的存在。

公开(公告)号：US20110143382A1

公开(公告)日：2011-06-16

申请号：US12995507

申请日：2009-05-29

申请人： Takashi Obara ,  Sadaaki Mizoguchi ,  Osamu Hotta

发明人： Takashi Obara ,  Sadaaki Mizoguchi ,  Osamu Hotta

IPC分类号： G01N33/53

CPC分类号： G01N33/6854 ,  G01N2800/347

摘要： There is provided a renal disease testing method comprising a complex detection step of detecting a complex of an antigen derived from human renal mesangial cells and human IgA in a sample derived from urine collected from a subject. It is preferred that the renal disease testing method of the invention further comprises a determination step of assessing the whether the renal disease is IgA nephropathy based on the ratio of the amount of the complex detected in the complex detection step to the amount of urinary proteins in the sample. The renal disease testing method of the invention has good detection sensitivity and specificity, and can conveniently and safely assess the existence of a renal disease (preferably, IgA nephropathy).

摘要翻译： 提供了一种肾病检测方法，其包括检测来自受试者收集的尿液的样品中衍生自人肾小球系膜细胞和人IgA的抗原的复合物检测步骤。 优选本发明的肾脏疾病检测方法还包括以下步骤：基于复合物检测步骤检测到的复合物的量与尿蛋白质量的比例来评估肾脏疾病是否为IgA肾病的判定步骤 例子。 本发明的肾病检测方法具有良好的检测灵敏度和特异性，可以方便，安全地评估肾病（优选IgA肾病）的存在。