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公开(公告)号：US20150090694A1
公开(公告)日：2015-04-02
申请号：US14383817
申请日：2012-09-07
IPC分类号： H01L21/67
CPC分类号： H01L21/6704 , H01L21/67051 , H01L21/67057 , H01L21/67751
摘要： A substrate processing apparatus and method includes, a plate that has a size equal to or larger than a principal face of the substrate, and has a horizontal and flat liquid holding face opposing the principal face of the substrate from below. A processing liquid supply unit supplies a processing liquid to the liquid holding face. A control unit controls the processing liquid supply unit and a movement unit to supply the processing liquid to the liquid holding face to form a processing liquid film, a contact step of bringing the principal face of the substrate and the liquid holding face close to each other to bring the principal face of the substrate into contact with the processing liquid film, and a liquid contact maintenance step of maintaining the processing liquid in contact with the principal face of the substrate.
摘要翻译： 基板处理装置和方法包括：具有等于或大于基板的主面的尺寸的板，并且具有从下方与基板的主面相对的水平和平坦的液体保持面。 处理液供给单元向液体保持面供给处理液。 控制单元控制处理液体供应单元和移动单元，以将处理液体供应到液体保持面以形成处理液膜;使基板的主面和液体保持面彼此靠近的接触步骤 以使基板的主面与处理液膜接触，以及液体接触维护步骤，其保持处理液体与基板的主面接触。
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公开(公告)号：US09601357B2
公开(公告)日：2017-03-21
申请号：US14383817
申请日：2012-09-07
IPC分类号： C03C15/00 , H01L21/67 , H01L21/677
CPC分类号： H01L21/6704 , H01L21/67051 , H01L21/67057 , H01L21/67751
摘要： A substrate processing apparatus and method includes, a plate that has a size equal to or larger than a principal face of the substrate, and has a horizontal and flat liquid holding face opposing the principal face of the substrate from below. A processing liquid supply unit supplies a processing liquid to the liquid holding face. A control unit controls the processing liquid supply unit and a movement unit to supply the processing liquid to the liquid holding face to form a processing liquid film, a contact step of bringing the principal face of the substrate and the liquid holding face close to each other to bring the principal face of the substrate into contact with the processing liquid film, and a liquid contact maintenance step of maintaining the processing liquid in contact with the principal face of the substrate.
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公开(公告)号：US09396974B2
公开(公告)日：2016-07-19
申请号：US13245375
申请日：2011-09-26
申请人： Hiroaki Takahashi , Toru Endo , Masahiro Miyagi , Koji Hashimoto
发明人： Hiroaki Takahashi , Toru Endo , Masahiro Miyagi , Koji Hashimoto
CPC分类号： H01L21/67051 , B05D1/005 , G11B5/8404 , G11B7/266 , H01L21/02052 , H01L21/68728
摘要： A substrate processing apparatus includes a substrate holding unit that horizontally holds a substrate in non-contact with a major surface of the substrate, a processing liquid supply unit that supplies a processing liquid to the major surface of the substrate held by the substrate holding unit, and a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate.
摘要翻译： 一种基板处理装置，包括：基板保持单元，其水平地保持与基板的主表面不接触的基板;处理液供给单元，其将处理液供给到由所述基板保持单元保持的基板的主表面; 以及亲水性表面放置单元，其沿着由基板保持单元保持的基板的主表面的周边部分设置环状亲水性表面，使得亲水表面与保持在主表面上的处理液体的液膜接触 的基底。
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公开(公告)号：US08883030B2
公开(公告)日：2014-11-11
申请号：US13596903
申请日：2012-08-28
申请人： Masahiro Miyagi , Koji Hashimoto , Toru Endo
发明人： Masahiro Miyagi , Koji Hashimoto , Toru Endo
CPC分类号： B05C11/08 , B05B1/00 , B05C5/0225 , B05C11/10 , B05C11/1036 , B05C11/1039 , B05C13/00 , B05D1/02 , H01L21/67051
摘要： A substrate processing apparatus comprising a substrate holding rotating mechanism, a process liquid supply mechanism having a nozzle for dispensing a process liquid toward a principal face of the substrate, a processing liquid reservoir for holding sufficient process liquid to form a liquid film covering the whole principal face of the substrate, a liquid film forming unit for forming the liquid film by supplying the process liquid onto the principal face of the substrate in a single burst, and a control unit for controlling the liquid film forming unit and the process liquid supply mechanism such that the process liquid is dispensed from the process liquid nozzle toward the principal face of the substrate after formation of the liquid film covering the whole area of the principal face of the substrate by the liquid film forming unit.
摘要翻译： 一种基板处理装置，包括基板保持旋转机构，具有用于向基板的主面分配处理液的喷嘴的处理液供给机构，用于保持足够的处理液以形成覆盖整个主体的液膜的处理液储存器 基板的表面，用于通过将处理液体单次供给到基板的主面上来形成液膜的液膜形成单元，以及用于控制液膜形成单元和处理液供给机构的控制单元， 在通过液膜形成单元形成覆盖基板的主面的整个区域的液膜之后，处理液体从处理液喷嘴分配到基板的主面。
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公开(公告)号：US09141941B2
公开(公告)日：2015-09-22
申请号：US13565182
申请日：2012-08-02
申请人： Koji Hashimoto , Takayoshi Kurita , Koji Kikuchi , Tsuguto Chiba , Takeshi Gomi
发明人： Koji Hashimoto , Takayoshi Kurita , Koji Kikuchi , Tsuguto Chiba , Takeshi Gomi
CPC分类号： G06Q10/107 , G06F21/606 , G06F2221/2115 , G06F2221/2141 , G06Q10/10
摘要： A computer determines whether destination information is included in permission target information. The destination information indicates a destination to which a file stored in a storage device is transferred. The permission target information includes information indicating a target permitted to access the file. The computer prompts before the file is transferred, upon determining that the destination information is not included in the permission target information, a user to input whether to permit the transfer. The computer adds the destination information to the permission target information upon receiving, via an input device, a permission input for permitting the transfer. The computer transfers the file upon receiving the permission input.
摘要翻译： 计算机确定目的地信息是否包括在许可目标信息中。 目的地信息表示存储在存储装置中的文件被传送到的目的地。 许可目标信息包括指示允许访问文件的目标的信息。 在确定目的地信息不包括在许可目标信息中之后，计算机在传送文件之前提示输入是否允许传送。 当通过输入装置接收允许传送的许可输入时，计算机将目的地信息添加到许可目标信息。 计算机在收到许可输入后传输文件。
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公开(公告)号：US08705261B2
公开(公告)日：2014-04-22
申请号：US13560137
申请日：2012-07-27
申请人： Eiji Ito , Hideyuki Kinoshita , Tetsuya Kamigaki , Koji Hashimoto
发明人： Eiji Ito , Hideyuki Kinoshita , Tetsuya Kamigaki , Koji Hashimoto
IPC分类号： G11C5/06
CPC分类号： G03F7/0035 , H01L2924/0002 , H01L2924/00
摘要： A method of manufacturing a semiconductor device includes forming a plurality of dummy line patterns arranged at a first pitch on an underlying region, forming first mask patterns having predetermined mask portions formed on long sides of the dummy line patterns, each of the first mask patterns having a closed-loop shape and surrounding each of the dummy line patterns, removing the dummy line patterns, forming a second mask pattern having a first pattern portion which covers end portions of the first mask patterns and inter-end portions each located between adjacent ones of the end portions, etching the underlying region using the first mask patterns and the second mask pattern as a mask to form trenches each located between adjacent ones of the predetermined mask portions, and filling the trenches with a predetermined material.
摘要翻译： 一种制造半导体器件的方法包括在下面的区域上形成以第一间距布置的多个虚拟线图案，形成具有形成在虚拟线图案的长边上的预定掩模部分的第一掩模图案，每个第一掩模图案具有 闭环形状并且围绕每个虚拟线图案，去除虚拟线图案，形成具有第一图案部分的第二掩模图案，该第一图案部分覆盖第一掩模图案的端部和位于相邻的第一掩模图案的端部之间的端部部分 端部，使用第一掩模图案和第二掩模图案作为掩模蚀刻下面的区域，以形成各自位于相邻的预定掩模部分之间的沟槽，并且用预定的材料填充沟槽。
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公开(公告)号：US08588647B2
公开(公告)日：2013-11-19
申请号：US13438078
申请日：2012-04-03
申请人： Kazuo Chadani , Tomonori Mori , Koji Hashimoto
发明人： Kazuo Chadani , Tomonori Mori , Koji Hashimoto
CPC分类号： G03G21/1821 , G03G21/1609 , G03G21/1839 , G03G21/186 , G03G2221/1657 , G03G2221/1853 , G03G2221/1884
摘要： A process cartridge comprises a photosensitive drum and a developing roller. A coupling member is provided adjacent to one axial end of the developing roller. The coupling member includes a driven portion, and an intermediary portion configured and positioned to engage with the driven portion. The intermediary portion is also configured to be movable relative to the driven portion in a direction crossing the axis of the developing roller while maintaining engagement with the driven portion. The coupling member further includes a driving portion configured and positioned to receive a driving force for rotating the developing roller. The driving portion is also configured to engage with the intermediary portion, and to be movable relative to the intermediary portion in a direction crossing the axis of the developing roller while maintaining engagement with the intermediary portion.
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公开(公告)号：US08480934B2
公开(公告)日：2013-07-09
申请号：US12958994
申请日：2010-12-02
申请人： Koji Hashimoto
发明人： Koji Hashimoto
CPC分类号： H01L27/24 , H01L27/222 , Y10T428/1393
摘要： According to one embodiment, a manufacturing method includes performing lithography processes for manufacturing a semiconductor device that includes a three-dimensional stacked device. The stacked device includes layers stacked above a substrate. Each of the layers includes a device circuit. The lithography processes include a lithography process for forming a lower layer of the layers by using a first original plate that has quality not less than a certain level. The first original plate is selected from original plates. Each of the original plates includes a pattern corresponding to the device circuit. The original plates are ranked according to quality based on defect. The lithography processes further include a lithography process for forming a higher layer of the layers by using a second original plate that has quality lower than the certain level. The second original plate is selected from the original plates.
摘要翻译： 根据一个实施例，一种制造方法包括执行用于制造包括三维堆叠装置的半导体器件的光刻工艺。 堆叠的器件包括堆叠在衬底上的层。 每个层包括器件电路。 光刻工艺包括通过使用质量不低于一定水平的第一原版形成下层层的光刻工艺。 第一个原版从原版中选出。 每个原始板包括与装置电路相对应的图案。 根据缺陷，原版按照质量进行排序。 光刻工艺还包括通过使用质量低于一定水平的第二原版来形成较高层的光刻工艺。 第二个原版从原版中选出。
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公开(公告)号：US20130139628A1
公开(公告)日：2013-06-06
申请号：US13643494
申请日：2011-08-04
CPC分类号： B23G1/48 , B21J5/12 , B21J13/025 , B21K3/00 , B23G1/32 , B23P15/003 , F16H25/2214 , F16H25/2223 , F16H25/24 , Y10T29/49689 , Y10T74/19767
摘要： A method forms ball recirculation and rolling grooves at an inner circumferential surface of a nut for ball screw use in a state free of deviation in axial, circumferential, and radial nut directions. A flange end face is formed with a concave part, then an inner circumferential surface of a blank and an end face and outer circumferential surface of the flange are continuously ground. Due to this, the coaxiality of the blank inner circumferential surface and the flange outer circumferential surface, and the perpendicularity of the flange end face to the blank inner circumferential surface, are made smaller. The blank is plastically worked to form the ball recirculation groove and is cut to form the ball rolling groove while using the concave part as a phase reference, the end face as an axial direction reference, and the outer circumferential surface as a radial direction reference.
摘要翻译： 一种方法在用于滚珠丝杠使用的螺母的内圆周表面上形成滚珠再循环和滚动槽，该轴向，圆周和径向螺母方向上没有偏差。 凸缘端面形成有凹部，然后坯料的内周面和凸缘的端面和外周面连续接地。 由此，使坯件内周面和凸缘外周面的同轴度以及凸缘端面与坯料内周面的垂直度变小。 在将凹部作为相位基准，将端面作为轴向参考，将外周面作为径向基准的情况下，对坯料进行塑性加工以形成球再循环槽并切割以形成滚珠滚动槽。
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公开(公告)号：US20130015047A1
公开(公告)日：2013-01-17
申请号：US13635794
申请日：2011-02-07
IPC分类号： H01H13/70
CPC分类号： H01H9/047 , H01H21/08 , H01H21/24 , H01H23/06 , H01H2021/225 , H01H2223/004 , H01H2300/01
摘要： A switch unit includes an upper case that has an operation portion attached therein; a circuit board that has a switch attached thereto that is able to switch contact points by operation of the operation portion; and a lower case that fits into the upper case such that the lower case is surrounded by the upper case, and that accommodates the circuit board between the upper case and the lower case. A draining portion is provided at a side surface of the upper case, and the draining portion is integrally formed with a sidewall forming the side surface and protrudes downward, and has a width that gradually narrows from the top to the bottom thereof.
摘要翻译： 一种开关单元包括：一个具有附接在其中的操作部分的上壳体; 电路板，其具有附接到其上的开关，其能够通过操作部的操作来切换接触点; 以及下壳体，其适合于上壳体，使得下壳体被上壳体包围，并且将电路板容纳在上壳体和下壳体之间。 排水部设置在上壳体的侧面，排水部与形成侧面的侧壁一体形成，向下方突出，宽度从顶部到底部逐渐变窄。
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