摘要:
In order to improve spectral measurement accuracy during high-speed wavelength shifting, the appropriate sensitivity of the detection system is maintained by, prior to measurement of a sample, measuring the voltage value, then storing this value into a table, and maintaining the voltage value to be applied to the photodetector, and during measurement of the sample, reading out the maintained voltage value and applying it to the photodetector.
摘要:
The invention intends to provide an atomic absorption spectrophotometer which can establish a uniform heat distribution during heating of a sample and can improve analysis accuracy and analyzing efficiency. For this purpose, a graphite tube type cuvette mounted in a graphite atomizer furnace for an atomic absorption spectrophotometer comprises a large-diameter portion for retaining a sample in place, a small-diameter portion connected to the large-diameter portion and having a smaller diameter than the large-diameter portion, and a step portion for demarcating between the large-diameter portion and the small-diameter portion. The graphite tube type cuvette is formed such that its cross-sectional area in a plane perpendicular to the direction of passage of an electric current supplied to the cuvette is the same in any of the large-diameter portion, the small-diameter portion and the step portion. The amount of resistance heat is thereby also the same in any portions.
摘要:
A spectrophotometer having functions of both of a double-monochromator and a single-monochromator including a light source, a first spectroscope having a first slit through which light from the light source passes and a first dispersion element for dispersing the light from the first slit, a second spectroscope having a second slit for receiving light dispersed from the first dispersion element for dispersing the light from the second slit, and a third slit for receiving the light dispersed from the second dispersion element. A sample compartment is provided for transmitting the light from the first dispersion element or from the third slit directly to a detector or through a sample to the detector. An optical unit is provided for changing transmitting light paths between a first light path for transmitting the light from the first dispersion element to the sample compartment through a fourth slit and a second light path for transmitting the light from the third slit to the sample compartment. A length of a light path from the first dispersion element to the second slit is equal to a length of a light path from the first dispersion element to the fourth slit.
摘要:
The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.
摘要:
A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.
摘要:
A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.
摘要:
In a spectrophotometer of the single-beam type, highly stable transmission and absorption spectra can be obtained with a high SNR while drifting is suppressed and for a long time even when the amount of light from the light source is varied over time. The spectrophotometer includes: a light source; a sample cell; a polychromator that generates a transmission spectrum of a sample in the sample cell by dispersing a portion of light from the light source that has passed through the sample into a plurality of spectral components; an image sensor that detects the transmission spectrum of the sample; a light source monitoring photodetector that detects a portion of the light from the light source that has not passed through the sample cell; and an operation unit that corrects the transmission spectrum of the sample by using an output signal from the light source monitoring photodetector.
摘要:
In an analysis device, an auxiliary gas supplied from a compressor 1 is introduced from an auxiliary gas inlet 3 via a pipe 2 to a burner through a pressure regulator 5, a pressur meter 6, a pressure switch 7 and a connecting joint 8. On the other hand, a combustible gas supplied from a gas bomb 9 is introduced from a combustible gas inlet 11 via a pipe 10 to the burner through a first electromagnetic valve 12, a pressure regulator 13, a pressure meter 14, a needle valve 15, a second electromagnetic valve 16 and a connecting joint 17 and further via a tube. An auxiliary gas use block 4, on which auxiliary gas flow controlling elements such as the pressure regulator 5, the pressure meter 6 and the pressure switch 7 are secured, is provided independent and separated from a combustible gas use block 18, on which combustible gas flow controlling elements such as the first electromagnetic valve 12, the pressure regulator 13, the pressure meter 14, the needle valve 15 and the second electromagnetic valve 16 are secured. Whereby the analysis device using chemical combustion flame having an element safety is provided in which possible danger caused by such as the gas leakage and the gas mixing between the combustible gas passage and the auxiliary gas passage is further reduced.
摘要:
A light beam emitted by a hollow cathode lamp is concentrated on a central portion of an electrothermal sample atomizing apparatus by a concave mirror. The light concentrated on the central portion of the electrothermal sample atomizing apparatus is further concentrated on a central portion of a flame produced in a burner type sample atomizing apparatus by a lens. The light traveled through the burner type sample atomizing apparatus is condensed by a concave mirror, reflected by a flat mirror, and concentrated on an entrance slit of a spectroscope. Light outgoing through an exit slit of the spectroscope is detected by a photodetector.