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    Substrate treatment apparatus and substrate treatment method
    2.
    发明申请
    Substrate treatment apparatus and substrate treatment method 审中-公开
    基板处理装置及基板处理方法

    公开(公告)号：US20070111536A1

    公开(公告)日：2007-05-17

    申请号：US11599255

    申请日：2006-11-15

    申请人： Hiroyuki Shinozaki ,  Norihiro Yamaguchi ,  Katsuhide Watanabe

    发明人： Hiroyuki Shinozaki ,  Norihiro Yamaguchi ,  Katsuhide Watanabe

    IPC分类号： G03C5/00 ,  B05C13/00 ,  B05B5/025 ,  H01L21/31

    CPC分类号： H01L21/6831 ,  H01L21/67259

    摘要： A substrate treatment apparatus is disclosed. The substrate treatment apparatus has an electrostatic chuck mechanism, a grounding mechanism, and an electron beam radiating mechanism. The electrostatic chuck mechanism electrostatically sucks and holds a substrate under treatment. The grounding mechanism freely contacts a predetermined film of a plurality of films formed on a treatment surface of the substrate under treatment sucked and held by the electrostatic chuck mechanism. The electron beam radiating mechanism radiates a resist film formed on the treatment surface side of the substrate under treatment with an electron beam.

    摘要翻译： 公开了一种基板处理装置。 基板处理装置具有静电卡盘机构，接地机构和电子束照射机构。 静电吸盘机构静电吸附并保持处理的基板。 接地机构自由地接触由静电卡盘机构吸引并保持的处理的处理面上形成的多个膜的规定膜。 电子束照射机构利用电子束照射形成在基板的处理面侧的抗蚀剂膜。

    Substrate processing apparatus and substrate processing method
    4.
    发明申请
    Substrate processing apparatus and substrate processing method 审中-公开
    基板加工装置及基板处理方法

    公开(公告)号：US20060169208A1

    公开(公告)日：2006-08-03

    申请号：US11322270

    申请日：2006-01-03

    申请人： Hiroyuki Shinozaki ,  Yasushi Kojima ,  Shunichi Aiyoshizawa ,  Kiwamu Tsukamoto

    发明人： Hiroyuki Shinozaki ,  Yasushi Kojima ,  Shunichi Aiyoshizawa ,  Kiwamu Tsukamoto

    IPC分类号： C23C16/00 ,  H01L21/31 ,  H01L21/469

    CPC分类号： G03F7/7075 ,  G03F7/70808 ,  G03F7/70991 ,  G03F9/7003 ,  G03F9/7011 ,  H01L21/67017 ,  H01L21/67225 ,  H01L21/67248 ,  H01L21/67748 ,  H01L21/68 ,  H01L21/681

    摘要： A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment.

    摘要翻译： 处理基板的基板处理装置具有界面部，基板装载部，减压气体输送室，曝光处理室。 接口部分具有能够将处理中的基板自由地装载和卸载到设备中的输送机构，反之亦然。 处理后的基板可以通过界面部分的输送机构沿一个方向装载和卸载基板装载/卸载部分。 减压气氛输送室与基板装载/卸载部的方向相邻且垂直的方向配置，具有在减压气氛下处理基板的输送机构。 暴露处理室与减压气体输送室的方向相邻且平行地配置，对被处理基板进行曝光处理。

    Discharge-pumped excimer laser device
    5.
    发明授权
    Discharge-pumped excimer laser device 有权
    放电泵浦准分子激光装置

    公开(公告)号：US06539043B1

    公开(公告)日：2003-03-25

    申请号：US09856138

    申请日：2001-05-29

    申请人： Hiroyuki Shinozaki ,  Shinichi Sekiguchi ,  Toshimitsu Barada ,  Toshiharu Nakazawa

    发明人： Hiroyuki Shinozaki ,  Shinichi Sekiguchi ,  Toshimitsu Barada ,  Toshiharu Nakazawa

    IPC分类号： H01S322

    CPC分类号： F16C32/047 ,  H01S3/036 ,  H01S3/225

    摘要： The present invention provides a discharge-pumped excimer laser device which includes a laser chamber filled with a laser gas that is deteriorated to a small extent, magnetic bearings and a motor that are resistant to the entry of dust particles, and parts that are held in contact with the laser gas and suffer little damage, and has a long service life. The discharge-pumped excimer laser device according to the present invention has a laser chamber (1) filled with a laserigas and housing at least a pair of main discharge electrodes (2, 2) for producing an electric discharge to be able to oscillate a laser beam, housings (6, 7) joined to opposite sides of the laser chamber (1), a cross flow fan (3) having opposite ends rotatably supported by magnetic bearings (8, 9, 10, 11) accommodated in the housings (6, 7), for producing a high-speed laser gas flow between the main discharge electrodes (2, 2), a motor (12) accommodated in the housing (7) for rotating the cross flow fan (3), laser gas flow passages (61, 62) extending through gaps between rotor side and stator side of the magnetic bearings (8, 9, 10, 11) and the motor (12) over an axial entire length of the housings (6, 7), and communicating with an interior of the laser chamber (1), a laser gas introduction passage (60) extending from the interior of the laser chamber (1) and communicating with the laser gas flow passages (61, 62), and filters (20, 20) disposed in the laser gas introduction passage (60).

    摘要翻译： 本发明提供了一种排出泵浦的准分子激光装置，其包括填充有少量劣化的激光气体的激光室，磁性轴承和抵抗灰尘颗粒进入的电动机以及保持在 与激光气体接触，损伤小，使用寿命长。本发明的排出泵浦准分子激光装置具有填充有激光的激光室（1），并容纳至少一对主放电电极 （2,2），用于产生能够振荡激光束的放电，与激光室（1）的相对侧接合的壳体（6,7），具有相对端部的交叉流动风扇（3），其可旋转地支撑在 容纳在壳体（6,7）中的磁性轴承（8,9,10,11），用于在主放电电极（2,2）之间产生高速激光气流，容纳在壳体 （7），用于旋转横流风扇（3），激光气体 在所述壳体（6,7）的轴向整个长度上延伸穿过所述磁性轴承（8,9,10,11）和所述电动机（12）的转子侧和定子侧之间的间隙的流动通道（61,62），以及 与所述激光室（1）的内部连通，从所述激光室（1）的内部延伸并与所述激光气体流路（61,62）连通的激光气体导入通路（60） 20）设置在激光气体导入通路（60）中。

    Substrate processing apparatus including a magnetically levitated and rotated substrate holder
    6.
    发明授权
    Substrate processing apparatus including a magnetically levitated and rotated substrate holder 失效
    衬底处理设备，包括磁悬浮和旋转的衬底保持器

    公开(公告)号：US06464825B1

    公开(公告)日：2002-10-15

    申请号：US09593709

    申请日：2000-06-15

    申请人： Hiroyuki Shinozaki

    发明人： Hiroyuki Shinozaki

    IPC分类号： H01L2100

    CPC分类号： H01L21/67063 ,  C23C16/4584

    摘要： A substrate processing apparatus includes a substrate processing chamber; a mechanism for long and unloading a substrate into and out of the chamber; a substrate heating source provided in the chamber; and a raw material supply source for supplying a raw material toward the substrate for processing. During processing of the substrate, the raw material for processing is supplied from a surface facing a surface of the substrate to be processed. When the substrate and a holder on which the substrate is placed are moved to a predetermined position for processing in the substrate processing chamber, a space in the substrate processing chamber is divided by the substrate into an upper space serving as a reaction space for processing and a lower space where the substrate heating source, etc. are placed. The apparatus also includes a magnetic force source for holding the holder at the predetermined position in a levitational manner by a magnetic force during processing of the substrate.

    摘要翻译： 一种基板处理装置，包括：基板处理室; 用于将衬底长时间地放入和移出腔室的机构; 设置在所述室中的基板加热源; 以及用于向原材料供给原料以供处理的原料供给源。 在处理基板期间，用于处理的原料从面向被处理基板的表面的表面供给。 当基板和其上放置基板的保持器移动到用于在基板处理室中进行处理的预定位置时，基板处理室中的空间被基板分隔成用作处理反应空间的上部空间， 放置基板加热源等的较低空间。 该装置还包括一个磁力源，用于在衬底的处理期间通过磁力将保持器以悬浮方式保持在预定位置。

    Substrate rotating apparatus
    7.
    发明授权
    Substrate rotating apparatus 失效
    基板旋转装置

    公开(公告)号：US06373159B1

    公开(公告)日：2002-04-16

    申请号：US09617779

    申请日：2000-07-17

    申请人： Hiroyuki Shinozaki

    发明人： Hiroyuki Shinozaki

    IPC分类号： H01L2102

    CPC分类号： H01L21/68792 ,  F16C32/047 ,  F16C2300/42 ,  F16C2300/62

    摘要： A rotor is placed in a space communicating with a processing chamber. Stator-side constituent members of magnetic bearings and a stator-side constituent member of a motor are placed in a space defined outside the space communicating with the processing chamber by a partition provided between the rotor and the stator-side constituent members. Further, a material electromagnetically equivalent to yokes of electromagnets as stator-side constituent members of the magnetic bearings is fitted in portions of the partition where the yokes are located. The partition constitutes a stator housing as a whole. The magnetic bearings include an axial magnetic bearing and a radial magnetic bearing. The axial magnetic bearing is divided into three or more magnetic bearings, which are positioned so that imaginary lines connecting points where the divided axial magnetic bearings are disposed form an approximately regular triangle or polygon.

    摘要翻译： 将转子放置在与处理室连通的空间中。 电动轴承的定子侧构成构件和电动机的定子侧构成构件通过设置在转子和定子侧构成构件之间的隔板而配置在与处理室连通的空间的外侧。 此外，作为磁性轴承的定子侧构成部件的电磁铁的磁轭的电磁等效材料安装在磁轭所在的分隔部的部分。 隔板构成整体的定子外壳。 磁轴承包括轴向磁轴承和径向磁轴承。 轴向磁轴承分为三个或更多个磁性轴承，其被定位成使得分开的轴向磁轴承的假想线连接点形成近似规则的三角形或多边形。

    Thin-film vapor deposition apparatus
    8.
    发明授权
    Thin-film vapor deposition apparatus 失效
    薄膜蒸镀装置

    公开(公告)号：US6022413A

    公开(公告)日：2000-02-08

    申请号：US664544

    申请日：1996-06-17

    申请人： Hiroyuki Shinozaki ,  Yukio Fukunaga ,  Takeshi Murakami ,  Kiwamu Tsukamoto

    发明人： Hiroyuki Shinozaki ,  Yukio Fukunaga ,  Takeshi Murakami ,  Kiwamu Tsukamoto

    IPC分类号： C23C16/458 ,  C23C16/46 ,  C30B25/10 ,  C30B25/12 ,  C23C14/00 ,  C23C16/00

    CPC分类号： C30B25/10 ,  C23C16/4584 ,  C23C16/46 ,  C30B25/12

    摘要： A thin-film vapor deposition apparatus has a reaction chamber for holding therein a substrate in an atmosphere isolated from an ambient atmosphere. For depositing a thin film on the substrate, the temperature of an inner wall of the reaction chamber is adjusted to control the temperature of the atmosphere in the reaction chamber, and the temperature of the substrate is also adjusted independently of the temperature of the atmosphere in the reaction chamber, while the substrate is being rotated at a high speed in the reaction chamber. Reactant gases required to deposit a thin film on the substrate are ejected from a reactant gas elector head toward the substrate in the reaction chamber. Remaining and excessive gases are discharged out of the reaction chamber.

    摘要翻译： 薄膜蒸镀装置具有用于在与环境气氛隔离的气氛中保持基板的反应室。 为了在基板上沉积薄膜，调整反应室内壁的温度以控制反应室中的气氛的温度，并且基板的温度也独立于大气温度 反应室，同时基板在反应室中高速旋转。 在基板上沉积薄膜所需的反应物气体从反应气体选择器头向反应室内的基板喷出。 剩余的和过量的气体从反应室排出。

    Reactant gas ejector head
    9.
    发明授权
    Reactant gas ejector head 失效
    反应物气体喷射头

    公开(公告)号：US5950925A

    公开(公告)日：1999-09-14

    申请号：US948579

    申请日：1997-10-10

    申请人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Masao Saitoh

    发明人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Masao Saitoh

    IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/00

    CPC分类号： C23C16/45574 ,  C23C16/45512 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/45572

    摘要： A reactant gas ejector head enables a process gas mixture of a uniform concentration and composition to be delivered to the surface of a substrate in a stable and uniform thermodynamic state by preventing premature reactions to occur along the gas delivery route. The reactant gas ejector head comprises an ejection head body having a back plate and a nozzle plate for defining a gas mixing space therebetween. The nozzle plate has numerous gas ejection nozzles. A gas supply pipe is communicated with the ejection head body through a center region of the back plate so as to separately introduce at least two types of gaseous substances into the mixing space. Gas distribution passages are formed between the back plate and the nozzle plate in such a way as to guide the at least two types of gaseous substances from the gas supply pipe to be directed separately towards peripheral regions of the gas mixing space.

    摘要翻译： 反应物气体喷射头能够使均匀浓度和组成的工艺气体混合物通过防止沿气体输送路线发生过早反应而以稳定和均匀的热力学状态输送到基底表面。 反应物气体喷射头包括具有背板和用于限定其间的气体混合空间的喷嘴板的喷射头本体。 喷嘴板具有许多气体喷射喷嘴。 气体供给管通过背板的中心区域与喷射头本体连通，以将至少两种类型的气态物质分别引入混合空间。 在背板和喷嘴板之间形成气体分配通道，以将来自气体供给管的至少两种类型的气体物质引导到气体混合空间的周边区域。