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    METHODS AND SYSTEMS FOR DETERMINING A CHARACTERISTIC OF A WAFER
    4.
    发明申请
    METHODS AND SYSTEMS FOR DETERMINING A CHARACTERISTIC OF A WAFER 有权
    用于确定波形特性的方法和系统

    公开(公告)号：US20080013083A1

    公开(公告)日：2008-01-17

    申请号：US11673150

    申请日：2007-02-09

    申请人： Michael Kirk ,  Christopher Bevis ,  David Adler ,  Kris Bhaskar

    发明人： Michael Kirk ,  Christopher Bevis ,  David Adler ,  Kris Bhaskar

    IPC分类号： G01N21/956 ,  G06F17/10

    CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/55

    摘要： Methods and systems for determining a characteristic of a wafer are provided. One method includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The method also includes determining the characteristic of the wafer using the second output. One system includes an inspection subsystem configured to illuminate the wafer and to generate output responsive to light from the wafer. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The system also includes a processor configured to determine the characteristic of the wafer using the second output.

    摘要翻译： 提供了用于确定晶片特性的方法和系统。 一种方法包括使用检查系统响应来自晶片的光产生输出。 输出包括对应于晶片上的缺陷的第一输出和不对应于缺陷的第二输出。 该方法还包括使用第二输出确定晶片的特性。 一个系统包括检查子系统，该检查子系统配置成照亮晶片并产生响应于来自晶片的光的输出。 输出包括对应于晶片上的缺陷的第一输出和不对应于缺陷的第二输出。 该系统还包括配置成使用第二输出来确定晶片的特性的处理器。

    Methods and systems for controlling variation in dimensions of patterned features across a wafer
    5.
    发明申请
    Methods and systems for controlling variation in dimensions of patterned features across a wafer 审中-公开
    用于控制晶片上图案化特征的尺寸变化的方法和系统

    公开(公告)号：US20060141376A1

    公开(公告)日：2006-06-29

    申请号：US11314638

    申请日：2005-12-20

    申请人： Ady Levy ,  Michael Hanna ,  Dan Wack ,  John Fielden ,  Christopher Bevis ,  Larry Wagner

    发明人： Ady Levy ,  Michael Hanna ,  Dan Wack ,  John Fielden ,  Christopher Bevis ,  Larry Wagner

    IPC分类号： G06F17/50 ,  H01L21/66 ,  G03C5/00 ,  G01C25/00

    CPC分类号： G03F7/70675 ,  G03F7/38 ,  G03F7/40 ,  G03F7/70425 ,  G03F7/70625

    摘要： Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer during a lithography process. The method also includes altering a parameter of the lithography process in response to the characteristic to reduce variation in dimensions of patterned features formed across the wafer by the lithography process. Altering the parameter compensates for non-time varying spatial variation in a temperature to which the wafer is exposed during a post exposure bake step of the lithography process and an additional variation in the post exposure bake step.

    摘要翻译： 提供了用于控制跨晶片的图案化特征的尺寸变化的方法和系统。 一种方法包括在光刻过程期间测量跨越晶片的多于一个位置处的抗蚀剂中形成的潜像的特性。 该方法还包括响应于特性来改变光刻工艺的参数，以减小通过光刻工艺在晶片上形成的图案化特征的尺寸变化。 改变参数补偿在光刻工艺的后曝光烘烤步骤期间晶片曝光的温度中的非时间变化的空间变化以及后曝光烘烤步骤的附加变化。

    Driven inspection or measurement
    6.
    发明申请
    Driven inspection or measurement 有权
    驱动检查或测量

    公开(公告)号：US20050160394A1

    公开(公告)日：2005-07-21

    申请号：US11078261

    申请日：2005-03-10

    申请人： Christopher Bevis

    发明人： Christopher Bevis

    IPC分类号： H01L21/66 ,  G03F7/20 ,  G06F17/50

    CPC分类号： G03F7/70533 ,  G03F7/70633

    摘要： Design driven inspection/metrology methods and apparatus are provided. A recipe is a set of instructions including wafer processing parameters, inspection parameters, or control parameters for telling an inspection/metrology system how to inspect/measure a wafer. Design data is imported into a recipe extraction system that recognizes instances of target structures and configures recipe parameters accordingly, thereby reducing manual instrument setup time, improving inspection/measurement accuracy, and improving fabrication efficiency.

    摘要翻译： 提供设计驱动的检测/计量方法和仪器。 配方是一组说明，包括晶片处理参数，检查参数或用于告知检查/计量系统如何检查/测量晶片的控制参数。 将设计数据导入到识别目标结构实例并配置配方参数的配方提取系统，从而减少手动仪器设置时间，提高检测/测量精度，提高制造效率。

    Motion picture output from electron microscope
    7.
    发明授权
    Motion picture output from electron microscope 有权
    电子显微镜的电影输出

    公开(公告)号：US06770879B1

    公开(公告)日：2004-08-03

    申请号：US10386815

    申请日：2003-03-12

    申请人： Amir Azordegan ,  Christopher Bevis ,  Bharat Marathe ,  David R. Bakker

    发明人： Amir Azordegan ,  Christopher Bevis ,  Bharat Marathe ,  David R. Bakker

    IPC分类号： H01J37256

    CPC分类号： H01J37/28 ,  H01J37/22

    摘要： An apparatus for recording a series of images of a sample over a period of time while varying at least one image parameter. An electron microscope captures images of the sample and also varies the at least one image parameter. A controller triggers the electron microscope to sense multiple images of the sample and also controls the electron microscope to vary the at least one image parameter. An image recorder receives the sensed multiple images and also stores the sensed multiple images as the series of images. A display unit displays the series of images.

    摘要翻译： 一种用于在一段时间内记录一系列图像的装置，同时改变至少一个图像参数。 电子显微镜捕获样品的图像并且还改变至少一个图像参数。 控制器触发电子显微镜以感测样品的多个图像，并且还控制电子显微镜来改变至少一个图像参数。 图像记录器接收感测的多个图像，并且还将所感测的多个图像存储为一系列图像。 显示单元显示一系列图像。

    System and method for conducting adaptive fourier filtering to detect defects in dense logic areas of an inspection surface
    9.
    发明申请
    System and method for conducting adaptive fourier filtering to detect defects in dense logic areas of an inspection surface 有权
    用于进行自适应傅立叶滤波以检测检查表面的密集逻辑区域中的缺陷的系统和方法

    公开(公告)号：US20070081154A1

    公开(公告)日：2007-04-12

    申请号：US11314779

    申请日：2005-12-20

    申请人： Evan Mapoles ,  Grace Chen ,  Christopher Bevis ,  David Shortt

    发明人： Evan Mapoles ,  Grace Chen ,  Christopher Bevis ,  David Shortt

    IPC分类号： G01N21/88

    CPC分类号： G01N21/95607 ,  G01N21/47 ,  G01N21/95623 ,  G01N2021/8822

    摘要： A dark field surface inspection tool and system are disclosed herein. The tool includes an illumination source capable of scanning a light beam onto an inspection surface. Light scattered by each inspection point is captured as image data by a photo detector array arranged at a fourier plane. The images captured are adaptively filtered to remove a portion of the bright pixels from the images to generate filtered images. The filtered images are then analyzed to detect defects in the inspection surface. Methods of the invention include using die-to-die comparison to identify bright portions of scattering patterns and generate unique image filters associated with those patterns. The associated images are then filtered to generate filtered images which are then used to detect defects. Also, data models of light scattering behavior can be used to generate filters.

    摘要翻译： 本文公开了一种暗场表面检查工具和系统。 该工具包括能够将光束扫描到检查表面上的照明源。 由每个检查点散射的光通过布置在傅立叶平面上的光检测器阵列捕获为图像数据。 捕获的图像被自适应地滤波以从图像中去除一部分亮像素以产生滤波图像。 然后分析滤波图像以检测检查表面中的缺陷。 本发明的方法包括使用管芯到管芯的比较来识别散射图案的亮部分并且生成与这些图案相关联的独特的图像滤波器。 然后将相关联的图像过滤以产生滤波图像，然后将其用于检测缺陷。 此外，可以使用光散射行为的数据模型来生成滤波器。