Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces
    1.
    发明授权
    Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces 有权
    加工工具,加工工具的组件以及制造和使用它们用于微电子工件的电化学处理的方法

    公开(公告)号:US06921467B2

    公开(公告)日:2005-07-26

    申请号:US09882293

    申请日:2001-06-15

    IPC分类号: C25D17/00 C25D17/28

    摘要: Processing tools, components of tools, and methods of making and using such devices for electrochemical processing of microelectronic workpieces. One aspect of the invention is directed toward reaction vessels for electrochemical processing of microelectronic workpieces, processing stations including such reaction vessels, and methods for using these devices. For example, one embodiment of a reaction vessel includes an outer container having an outer wall, a first outlet configured to introduce a primary fluid flow into the outer container, and at least one second outlet configured to introduce a secondary fluid flow into the outer container separate from the primary fluid flow. The reaction vessel can also include at least one electrode, and it can also have a field shaping unit. The field shaping unit, for example, can be a dielectric assembly coupled to the second outlet to receive the secondary flow and configured to contain the secondary flow separate from the primary flow through at least a portion of the outer container. The field shaping unit can also have at least one electrode compartment through which the secondary flow can pass separately from the primary flow. The electrode is positioned in the electrode compartment.

    摘要翻译: 加工工具,工具部件,以及制造和使用这些装置用于微电子工件的电化学处理的方法。 本发明的一个方面涉及用于微电子工件的电化学处理的反应容器,包括这种反应容器的处理站,以及使用这些装置的方法。 例如,反应容器的一个实施例包括具有外壁的外容器,构造成将主流体流引入外容器中的第一出口,以及至少一个第二出口,该第二出口构造成将次流体流引入外容器 与主流体流分离。 反应容器还可以包括至少一个电极,并且还可以具有场成形单元。 场整形单元例如可以是耦合到第二出口的电介质组件,用于接收二次流,并且被构造成容纳从初级流分离通过外部容器的至少一部分的二次流。 场成形单元还可以具有至少一个电极室,二次流可以通过该电极室与主流分开地通过。 电极位于电极室中。

    Method and apparatus for accessing microelectronic workpiece containers
    2.
    发明授权
    Method and apparatus for accessing microelectronic workpiece containers 失效
    用于访问微电子工件容器的方法和装置

    公开(公告)号:US06878955B2

    公开(公告)日:2005-04-12

    申请号:US10756049

    申请日:2004-01-12

    IPC分类号: B65G49/07 H01L21/677

    摘要: An apparatus and method for handling microelectronic workpieces initially positioned in a container. The container can be changeable from a first configuration where the microelectronic workpiece is generally inaccessible within the container to a second configuration where the microelectronic workpiece is accessible for removal from the container. The apparatus can include a container access device positionable proximate to an aperture of an enclosure that at least partially encloses a region for handling a microelectronic workpiece. The container access device can be movably positioned proximate to the aperture to change the configuration of the container from the first configuration to the second configuration. A container support can be positioned proximate to the aperture and can be configured to move the container to a fixed, stationary position relative to the aperture when the container is in the second configuration. Accordingly, the microelectronic workpieces within the container can be less likely to be damaged by movement of the container. Instead, a workpiece transfer device can be configured to have a range of travel that allows it to access each of the microelectronic workpieces within the container without requiring that the container itself be moved. A workpiece detector coupled to the container access device can move generally parallel to the microelectronic workpieces to detect a presence, absence, and/or position of the microelectronic workpieces, without moving laterally toward and away from the microelectronic workpieces.

    摘要翻译: 用于处理最初位于容器中的微电子工件的装置和方法。 容器可以从第一种构型改变,其中微电子工件在容器内通常是不可接近的,其中微电子工件能够从容器移除。 该装置可以包括可靠近壳体的孔定位的容器进入装置,其至少部分地包围用于处理微电子工件的区域。 容器进入装置可以可移动地定位在孔附近,以将容器的构型从第一构型改变到第二构型。 容器支撑件可以靠近孔定位,并且可以构造成当容器处于第二构造时相对于孔将容器移动到固定的静止位置。 因此,容器内的微电子工件不太可能被容器的移动所损坏。 相反,工件传送装置可以被配置成具有允许其访问容器内的每个微电子工件的行程范围,而不要求容器本身移动。 耦合到容器进入装置的工件检测器可以大致平行于微电子工件移动,以检测微电子工件的存在,不存在和/或位置,而不向横向和远离微电子工件横向移动。

    Method and apparatus for accessing microelectronic workpiece containers
    3.
    发明授权
    Method and apparatus for accessing microelectronic workpiece containers 有权
    用于访问微电子工件容器的方法和装置

    公开(公告)号:US06717171B2

    公开(公告)日:2004-04-06

    申请号:US09875439

    申请日:2001-06-05

    IPC分类号: B65G4907

    摘要: An apparatus and method for handling microelectronic workpieces initially positioned in a container. The container can be changeable from a first configuration where the microelectronic workpiece is generally inaccessible within the container to a second configuration where the microelectronic workpiece is accessible for removal from the container. The apparatus can include a container access device positionable proximate to an aperture of an enclosure that at least partially encloses a region for handling a microelectronic workpiece. The container access device can be movably positioned proximate to the aperture to change the configuration of the container from the first configuration to the second configuration. A container support can be positioned proximate to the aperture and can be configured to move the container to a fixed, stationary position relative to the aperture when the container is in the second configuration. Accordingly, the microelectronic workpieces within the container can be less likely to be damaged by movement of the container. Instead, a workpiece transfer device can be configured to have a range of travel that allows it to access each of the microelectronic workpieces within the container without requiring that the container itself be moved. A workpiece detector coupled to the container access device can move generally parallel to the microelectronic workpieces to detect a presence, absence, and/or position of the microelectronic workpieces, without moving laterally toward and away from the microelectronic workpieces.

    摘要翻译: 用于处理最初位于容器中的微电子工件的装置和方法。 容器可以从第一种构型改变,其中微电子工件在容器内通常是不可接近的,其中微电子工件能够从容器移除。 该装置可以包括可靠近壳体的孔定位的容器进入装置,其至少部分地包围用于处理微电子工件的区域。 容器进入装置可以可移动地定位在孔附近,以将容器的构型从第一构型改变到第二构型。 容器支撑件可以靠近孔定位,并且可以构造成当容器处于第二构造时相对于孔将容器移动到固定的静止位置。 因此,容器内的微电子工件不太可能被容器的移动所损坏。 相反,工件传送装置可以被配置成具有允许其访问容器内的每个微电子工件的行程范围,而不要求容器本身移动。 耦合到容器进入装置的工件检测器可以大致平行于微电子工件移动,以检测微电子工件的存在,不存在和/或位置,而不向横向和远离微电子工件横向移动。

    Automated semiconductor processing system
    4.
    发明授权
    Automated semiconductor processing system 失效
    自动半导体处理系统

    公开(公告)号:US06942738B1

    公开(公告)日:2005-09-13

    申请号:US09612009

    申请日:2000-07-07

    摘要: An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.

    摘要翻译: 自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。 索引器托架中的索引器为进行中的半导体晶片提供放样或存储。 过程室位于过程托架中。 过程机器人在分度器托架和过程间隔之间移动,以将半导体晶片运送到处理室和从处理室运送。 过程机器人具有可沿着升降轨道垂直移动的机器人手臂。 半导体晶片从机器人手臂偏移,以更好地避免污染。 自动化系统紧凑,需要较少的洁净室空间。

    Wafer container cleaning system
    5.
    发明授权
    Wafer container cleaning system 失效
    晶圆容器清洗系统

    公开(公告)号:US06322633B1

    公开(公告)日:2001-11-27

    申请号:US09362157

    申请日:1999-07-28

    IPC分类号: B08B102

    摘要: A cleaning system for cleaning carriers or containers used to carry semiconductor wafers has a door cleaner adjacent to a centrifugal box cleaner. Box holder assemblies are attached to a rotor within the box cleaner. Upper and lower hooks on the box holder assemblies hold boxes as the rotor spins. The door cleaner has a base which holds doors in a vertical and upright position. An elevator lowers the base into an ultrasonic cleaning tank. The tank lid seals the tank during use. Ultrasonic cleaning fluid is filtered and cycled into and out of the tank. Boxes and their doors, such as front opening unified pods (FOUP) are both efficiently cleaned and handled.

    摘要翻译: 用于清洁用于携带半导体晶片的载体或容器的清洁系统具有邻近离心箱清洁器的门清洁器。 箱体组件连接到箱式清洁器内的转子上。 当转子旋转时,箱体支架组件上的上下钩固定箱体。 门清洁器具有将门以垂直和直立位置保持的基座。 电梯将基座降低到超声波清洗槽。 罐盖在使用期间密封罐。 超声波清洗液被过滤并循环进出罐体。 箱子和门,如前开口统一荚(FOUP)都有效地清理和处理。

    Gas intake assembly for a wafer processing system
    6.
    发明授权
    Gas intake assembly for a wafer processing system 失效
    用于晶圆处理系统的进气组件

    公开(公告)号:US6105592A

    公开(公告)日:2000-08-22

    申请号:US897913

    申请日:1997-07-21

    IPC分类号: H01L21/00 B08B15/02

    CPC分类号: H01L21/67034 Y10S134/902

    摘要: An apparatus for processing a semiconductor wafer is set forth. The apparatus comprises a processing bowl that defines a processing chamber. The bowl has an opening through which wafers may be placed in the apparatus. A wafer support structure adapted to support at least one wafer is mounted for rotation within the processing chamber. A motor drive assembly is connected to rotate the wafer support structure. At least one fluid nozzle accepts processing fluid and sprays the processing fluid on the one or more wafers carried by the wafer support structure. A door is used to seal the opening of the processing bowl. The door has an opening that is open to ambient atmosphere to facilitate passage of ambient gas into the processing chamber. An ambient gas intake assembly is disposed in the door. The ambient gas intake assembly comprises a high efficiency filter, preferably, and ULPA filter, disposed to filter ambient gas passing from the opening of the door to the processing chamber and a heater disposed to heat the filtered gas prior to entering the processing chamber.

    摘要翻译: 阐述了一种用于处理半导体晶片的设备。 该装置包括限定处理室的处理碗。 碗具有开口,晶片可以通过该开口放置在装置中。 适于支撑至少一个晶片的晶片支撑结构被安装用于在处理室内旋转。 电动机驱动组件被连接以旋转晶片支撑结构。 至少一个流体喷嘴接受处理流体并将处理流体喷射在由晶片支撑结构承载的一个或多个晶片上。 门用于密封加工碗的开口。 门具有通向大气环境的开口,以便于环境气体进入处理室。 环境气体进入组件设置在门中。 环境气体进入组件包括优选的高效过滤器和ULPA过滤器,其设置成过滤从门的开口到处理室的环境气体,以及设置成在进入处理室之前加热经过滤的气体的加热器。

    Windshield wiper arm assembly with fluid tube
    7.
    发明授权
    Windshield wiper arm assembly with fluid tube 失效
    挡风玻璃刮水器组件带流体管

    公开(公告)号:US5724699A

    公开(公告)日:1998-03-10

    申请号:US637007

    申请日:1996-04-22

    申请人: Daniel P. Bexten

    发明人: Daniel P. Bexten

    IPC分类号: B60S1/32 B60S1/52 B60S1/46

    CPC分类号: B60S1/32 B60S1/522

    摘要: A wiper arm (30) for a vehicle windshield wiper assembly (14) has at least a section along its longitudinal extent formed of a longitudinally extending base portion (80) and two spaced side walls (82,84) extending outwardly along opposite sides of the base portion (80) to form an open channel (85). A spray nozzle (70i is disposed in the outboard portion of the wiper arm (30) and a fluid delivery tube (60) extends longitudinally along the wiper arm (30) to deliver wash fluid from a supply to the spray nozzle (70). The outboard edges (86,88) of the outwardly sidewalls (82,84) are folded inwardly towards each other to partially close the open face (87) of the channel (85), thereby retaining the fluid delivery tube (60), which is freely disposed, within the channel.

    摘要翻译: 用于车辆挡风玻璃刮水器组件(14)的刮水器臂(30)至少具有沿其纵向延伸部分的纵向延伸的基部(80)和两个间隔开的侧壁(82,84) 所述基部(80)形成开放通道(85)。 喷嘴(70i)设置在刮水臂(30)的外侧部分中,并且流体输送管(60)沿着刮水臂(30)纵向延伸,以将清洗流体从供应源输送到喷嘴(70)。 向外侧壁(82,84)的外侧边缘(86,88)朝向彼此向内折叠以部分地关闭通道(85)的开放面(87),从而保持流体输送管(60),其中 在通道内自由布置。

    Method of making a belt tensioning system
    8.
    发明授权
    Method of making a belt tensioning system 失效
    制造皮带张紧系统的方法

    公开(公告)号:US5029387A

    公开(公告)日:1991-07-09

    申请号:US513717

    申请日:1990-04-24

    摘要: A method of making a belt tensioner system, in which the system comprises a support unit, an endless transmission belt construction carried by the support unit and arranged to move in an endless path, an arm pivotally mounted to the support unit, a pulley rotatably carried by the arm and being in engagement with the belt construction, and an actuator carried by the support unit and having opposed ends is provided. The actuator has a movable piston projecting out of one of the opposed ends thereof and being in engagement with the arm to pivot the arm in a direction to urge the pulley into the belt construction as the piston is extended outwardly from the one end of the actuator, the other of the opposed ends of the actuator being pivotally mounted to the support unit whereby the actuator pivots relative to the support unit as the piston thereof extends and retracts at the one end thereof.

    摘要翻译: 一种制造皮带张紧器系统的方法,其中所述系统包括支撑单元,由所述支撑单元承载并且布置成在环形路径中移动的环形传动带结构,枢转地安装到所述支撑单元的臂,可旋转地承载的滑轮 通过臂并与皮带结构接合,并且提供由支撑单元承载并具有相对端的致动器。 致动器具有从其相对的一端突出的可移动的活塞,并且与所述臂接合,以便当所述活塞从所述致动器的一端向外延伸时,所述臂沿着将所述滑轮推进所述带结构的方向枢转所述臂 致动器的相对端中的另一端可枢转地安装在支撑单元上,由此当致动器的活塞在其一端延伸和缩回时,致动器相对于支撑单元枢转。

    Offset rotor flat media processor
    10.
    发明授权
    Offset rotor flat media processor 失效
    偏移转子平面媒体处理器

    公开(公告)号:US6125863A

    公开(公告)日:2000-10-03

    申请号:US107878

    申请日:1998-06-30

    申请人: Daniel P. Bexten

    发明人: Daniel P. Bexten

    摘要: A centrifugal processor for flat media, such as a silicon wafer, has a rotor eccentrically positioned within a cylindrical chamber or bowl. Drainage openings or slots are located near the bottom of the bowl. The rotor is offset in a direction away from the drain openings. Fluids drain more quickly from the bowl, as the tendency of the spinning rotor to draw fluids up and around the bowl is reduced, due to the rotor offset and to the discrete drain openings, and the position and orientation of the drain openings.

    摘要翻译: 用于诸如硅晶片的平坦介质的离心处理器具有偏心地定位在圆柱形腔室或碗内的转子。 排水口或槽位于碗底部附近。 转子在远离排放口的方向偏移。 流体从碗中更快地排出,因为由于转子偏移和离散的排水开口以及排水口的位置和取向,旋转转子将液体向上和在碗周围吸引的倾向减小。