公开(公告)号：US20090095058A1

公开(公告)日：2009-04-16

申请号：US12244494

申请日：2008-10-02

申请人： Kyoichi MORI ,  Fujio Yamasaki

发明人： Kyoichi MORI ,  Fujio Yamasaki

IPC分类号： G01B7/34

CPC分类号： G11B5/84

摘要： In the present invention, through a provision of a relay stand including a first relaying point, a second relaying point and a plurality of work mounting bases, a discharge/feed process of works between the relay stand and the work feed container and the work accommodation container is performed at the first relaying point and a load/unload process of works between the relay stand and the plurality of work inspection machines is performed at the second relaying point.

摘要翻译： 在本发明中，通过设置包括第一中继点，第二中继点和多个工件安装基座的继电器支架，在继电器支架和作业进给容器之间的工作的放电/进给处理以及工作容纳 在第一中继点执行容器，并且在第二中继点执行继电器支架和多个工件检查机器之间的工作的装载/卸载处理。

公开(公告)号：US20130001835A1

公开(公告)日：2013-01-03

申请号：US13603455

申请日：2012-09-05

申请人： Satoshi ISHII ,  Masahiko OGINO ,  Noritake SHIZAWA ,  Kyoichi MORI ,  Akihiro MIYAUCHI

发明人： Satoshi ISHII ,  Masahiko OGINO ,  Noritake SHIZAWA ,  Kyoichi MORI ,  Akihiro MIYAUCHI

IPC分类号： B29C43/32

CPC分类号： B29C59/022 ,  B29C35/02 ,  B29C35/0888 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.

摘要翻译： 本发明的目的是提供一种用于转印精细图案的压模和用于制造压模的方法，压模具有精细的结构层，以提高树脂压模的连续转印性能，并允许精确和连续的转印。 为了实现上述目的，本发明提供了一种用于转印精细图案的压模，包括：支撑基板上的精细结构层，其中精细结构层是主成分为倍半硅氧烷衍生物的树脂化合物的聚合物， 多个聚合性官能团。

公开(公告)号：US20100219548A1

公开(公告)日：2010-09-02

申请号：US12711377

申请日：2010-02-24

申请人： Kyoichi MORI ,  Naoaki YAMASHITA ,  Noritake SHIZAWA ,  Koji TSUSHIMA

发明人： Kyoichi MORI ,  Naoaki YAMASHITA ,  Noritake SHIZAWA ,  Koji TSUSHIMA

IPC分类号： C23C16/02 ,  B29C35/08

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

摘要： A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element. Also disclosed is a fine-structure transfer apparatus having at least a stamper and a stage on which to place a transfer element having a coating of a resist, further having a device for heating the resist coating to be vaporized or a device for supplying the vapor of the resist into the space between the stamper and the transfer element.

摘要翻译： 精细结构转印方法，其中形成在压模的两个表面中的一个上的精细图案被压在转印元件的两个表面之一上的抗蚀剂涂层上，以便转印精细图案 到抗蚀剂涂层，其中压模和转印元件之间的空间中的气氛被压模抵抗转印元件之前的抗蚀剂的蒸汽所代替。 还公开了一种精细结构转印装置，其至少具有压模和阶段，在其上放置具有抗蚀剂涂层的转印元件，还具有用于加热待蒸发的抗蚀剂涂层的装置或用于供应蒸气的装置 抗蚀剂进入压模和转印元件之间的空间。

公开(公告)号：US20110195183A1

公开(公告)日：2011-08-11

申请号：US13021858

申请日：2011-02-07

申请人： Naoaki YAMASHITA ,  Kyoichi MORI ,  Takayuki ISHIGURO ,  Noritake SHIZAWA ,  Shinjiro ISHII ,  Masashi AOKI

发明人： Naoaki YAMASHITA ,  Kyoichi MORI ,  Takayuki ISHIGURO ,  Noritake SHIZAWA ,  Shinjiro ISHII ,  Masashi AOKI

IPC分类号： B05D1/40 ,  B05C5/00

CPC分类号： B05D1/002 ,  B05C11/08 ,  B05D1/26 ,  B05D7/52 ,  H01L21/6715

摘要： There is provided a method for spin coating, by which a resist is coated on a surface of a circular disc with a hole formed in its center. A method for spin coating coats a film-forming material discharged from a nozzle to an upper surface of a circular disc substrate with a through hole formed in a center while rotating the substrate. At an initial discharging stage where a discharge amount fluctuates, an inner diameter center of the nozzle is located at an initial discharge radius position apart from a position corresponding to a coat boundary of the disc substrate at an outer radial side. At a subsequent stage of stabilized discharging amount, the inner diameter center of the nozzle is moved from the initial discharge radius position to a stabilized discharge radius position around the coat boundary to further discharge the film-forming material.

摘要翻译： 提供了一种旋涂方法，通过该方法将抗蚀剂涂覆在其中心形成有孔的圆盘的表面上。 旋转涂布的方法是将从喷嘴排出的成膜材料涂覆到圆盘基板的上表面，同时在旋转基板的同时形成有中心的通孔。 在排出量波动的初始排出阶段，喷嘴的内径中心位于与在外径向侧的盘基板的涂层边界相对应的位置处的初始排出半径位置。 在稳定排放量的后续阶段，喷嘴的内径中心从初始排出半径位置移动到围绕涂层边界的稳定的排放半径位置，以进一步排出成膜材料。

公开(公告)号：US20110008535A1

公开(公告)日：2011-01-13

申请号：US12826723

申请日：2010-06-30

申请人： Kyoichi MORI ,  Noritake SHIZAWA ,  Takashi TARUMITSU ,  Shinjiro ISHII ,  Kentaro KOIKAWA

发明人： Kyoichi MORI ,  Noritake SHIZAWA ,  Takashi TARUMITSU ,  Shinjiro ISHII ,  Kentaro KOIKAWA

IPC分类号： B05D1/26 ,  B05C11/02

CPC分类号： G03F7/162 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： Spots of a resist are deposited in a concentric pattern on both sides of an annular disk. A motor which rotates the disk has a rotating shaft that can be inserted into or removed from a through-hole in the disk. Two ink-jet heads provided on the obverse and reverse sides, respectively, of the disk substrate are provided such that the heads are not in contact with the sides. A carriage for causing the two ink-jet heads to move radially inward or outward with respect to the disk substrate is also provided. The ink-jet heads are moved by the carriage while the disk is rotated by the motor to apply the spots of the resist.

摘要翻译： 抗蚀剂的斑点以同心图案沉积在环形盘的两侧。 旋转盘的马达具有可插入盘中的通孔或从盘中的通孔移除的旋转轴。 设置在盘基板的正面和反面上的两个喷墨头设置成使得头部不与侧面接触。 还提供了一种用于使两个喷墨头相对于盘基片径向向内或向外移动的托架。 喷墨头由托架移动，同时通过马达使盘旋转以施加抗蚀剂的斑点。

公开(公告)号：US20100289183A1

公开(公告)日：2010-11-18

申请号：US12775573

申请日：2010-05-07

申请人： Koji TSUSHIMA ,  Naoaki YAMASHITA ,  Noritake SHIZAWA ,  Kyoichi MORI

发明人： Koji TSUSHIMA ,  Naoaki YAMASHITA ,  Noritake SHIZAWA ,  Kyoichi MORI

IPC分类号： B28B11/08

CPC分类号： G11B5/855

摘要： The present invention includes the steps of: applying resist to a surface of a disk base material mounted on a base; mounting a stamper on the resist, wherein the stamper includes not only an area larger than the disk base material but also a concavo-convex region between chamfered sections for an inner-diameter section and an outer-diameter section of the disk base material; mounting an elastic plate on the stamper, wherein the elastic plate includes an inner-diameter section and an outer-diameter section smaller than chamfered sections of the inner-diameter section and the outer-diameter section of the disk base material and larger than the concavo-convex region of the stamper; mounting a pressing member on the elastic plate and pressing the elastic plate toward the disk base material; exposing the resist and etching the disk base material using the exposed resist as a mask; and removing the remaining resist from the disk base material.

摘要翻译： 本发明包括以下步骤：将抗蚀剂涂布在安装在基材上的盘基材的表面上; 在所述抗蚀剂上安装压模，其中，所述压模不仅包括比所述盘基材大的区域，还包括用于所述盘基材的内径部和外径部的​​倒角部之间的凹凸区域; 在压模上安装弹性板，其中弹性板包括内径部分和小于盘基材的内径部分和外径部分的倒角部分的外径部分，并且大于凹部 压模的凸面区域; 将按压构件安装在弹性板上并将弹性板朝向盘基材推压; 使用曝光的抗蚀剂作为掩模曝光抗蚀剂并蚀刻盘基材; 并从盘基材除去剩余的抗蚀剂。

公开(公告)号：US20130082029A1

公开(公告)日：2013-04-04

申请号：US13565279

申请日：2012-08-02

申请人： Tetsuhiro HATOGAI ,  Kyoichi MORI ,  Makoto MARUYAMA ,  Akihiro MIYAUCHI ,  Masahiko OGINO

发明人： Tetsuhiro HATOGAI ,  Kyoichi MORI ,  Makoto MARUYAMA ,  Akihiro MIYAUCHI ,  Masahiko OGINO

IPC分类号： B29C59/02

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24479

摘要： The object of the present invention is to provide a stamper or an imprint device which can reduce a variation of a base film thickness, a product processed and having a precise fine pattern, and a device for manufacturing a product processed or a method for manufacturing a product processed which can form a precise fine pattern. According to the present invention, in a stamper, an imprint device performing an imprint using the stamper, a device for manufacturing a product processed by the imprint device, a method for manufacturing a product processed by the imprint, and a product processed and manufactured, the stamper has a dummy pattern which is unnecessary for fulfilling a function of the product processed which is formed of a substrate for the product.

摘要翻译： 本发明的目的是提供一种压模或压印装置，其可以减小基膜厚度的变化，加工成具有精确精细图案的产品，以及用于制造加工的产品的制造装置或制造方法 可以形成精确图案的产品。 根据本发明，在压模中，使用压模执行压印的压印装置，由压印装置处理的产品的制造装置，通过压印处理的产品的制造方法以及加工和制造的产品， 压模具有为了实现由产品的基板形成的加工产品的功能而不必要的虚设图案。

公开(公告)号：US20120007280A1

公开(公告)日：2012-01-12

申请号：US13238735

申请日：2011-09-21

申请人： Kyoichi MORI ,  Naoaki YAMASHITA ,  Noritake SHIZAWA ,  Koji TSUSHIMA

发明人： Kyoichi MORI ,  Naoaki YAMASHITA ,  Noritake SHIZAWA ,  Koji TSUSHIMA

IPC分类号： B28B11/08

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

摘要： A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element.

摘要翻译： 精细结构转印方法，其中形成在压模的两个表面中的一个上的精细图案被压在转印元件的两个表面之一上的抗蚀剂涂层上，以便转印精细图案 到抗蚀剂涂层，其中压模和转印元件之间的空间中的气氛被压模抵抗转印元件之前的抗蚀剂的蒸汽所代替。

公开(公告)号：US20100034911A1

公开(公告)日：2010-02-11

申请号：US12534232

申请日：2009-08-03

申请人： Kyoichi MORI ,  Noritake SHIZAWA ,  Susumu KOMORIYA ,  Akihiro MIYAUCHI ,  Takashi ANDO ,  Tetsuhiro HATOGAI

发明人： Kyoichi MORI ,  Noritake SHIZAWA ,  Susumu KOMORIYA ,  Akihiro MIYAUCHI ,  Takashi ANDO ,  Tetsuhiro HATOGAI

IPC分类号： B28B7/36 ,  B29C35/08

CPC分类号： B29C35/0888 ,  B29C33/0088 ,  B29C33/20 ,  B29C33/30 ,  B29C33/305 ,  B29C43/003 ,  B29C43/021 ,  B29C43/10 ,  B29C43/36 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3634 ,  B29C2043/3652 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A nanoimprint stamper with a novel structure is provided that can simultaneously conform to two types of anomaly in the shape of a transfer substrate, i.e., a warpage and surface protrusions (including foreign objects) that differ greatly in the wavelength of variation, and which is capable of performing transfer with a smaller number of defects and in a uniform way.The nanoimprint stamper comprises a light-transmitting rigid substrate, a light-transmitting resilient plate, a light-transmitting and flexible rigid stamper base, a light-transmitting stamper buffer layer, and a light-transmitting patterned stamp layer, the stamper buffer layer having a lower Young's modulus than the patterned stamp layer.

摘要翻译： 提供具有新颖结构的纳米压印模具，其可以同时符合转印基板形状的两种异常，即在变化波长上差异很大的翘曲和表面突起（包括异物），并且其是 能够以较少数量的缺陷和均匀的方式执行转移。 纳米压印压模包括透光刚性基板，透光弹性板，透光和柔性刚性压模基座，透光压模缓冲层和透光图案化印模层，压模缓冲层具有 比图案化的印模层更低的杨氏模量。