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公开(公告)号：US08770965B2
公开(公告)日：2014-07-08
申请号：US13370413
申请日：2012-02-10
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B29C33/3878 , B82Y10/00 , B82Y40/00
摘要： A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.
摘要翻译： 微结构转印装置的特征在于，该装置包括由用第一波长的光固化的第一光固化树脂组合物制成的压模和发射长于第一波长的第二波长的光的光源。 将微结构转移到提供有第二光固化树脂组合物的印模受体中，该第二光固化树脂组合物可用由光源发出的第二波长的光固化。
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2.发明授权Fine metal structure, process for producing the same, fine metal mold and device 失效精细金属结构，制造方法，精细金属模具及装置公开(公告)号：US08741380B2
公开(公告)日：2014-06-03
申请号：US12859802
申请日：2010-08-20
CPC分类号： B29C33/3842 , B29C33/424 , B81B2203/0361 , B81C1/00111 , B81C1/00206 , B81C99/0085 , B81C99/009 , B81C2201/034 , B82Y10/00 , B82Y40/00 , C23C18/1608 , C23C18/1651 , C23C18/1653 , C23C18/1657 , C23C18/1689 , C23C18/208 , C23C18/42 , G03F7/0002 , H01J1/304 , H01J9/025 , Y10T428/12389 , Y10T428/12993
摘要： A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.
摘要翻译： 精细的金属结构，其表面具有高强度，高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。 提供了具有微喷射体的表面的细金属结构，其特征在于，微喷射体具有10纳米至10微米的最小厚度或最小直径，并且微喷射体的最小厚度或最小直径（D）与高度 的微喷射体（H）H / D大于1.还提供了一种制造精细金属结构的方法，其特征在于，在其表面上提供具有细凹凸图案的基板，将分子无电镀催化剂 然后进行无电解电镀，从而形成具有凹凸图案的金属层，并将金属层与基板分离，从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。
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3.发明授权公开(公告)号：US08690559B2
公开(公告)日：2014-04-08
申请号：US13193666
申请日：2011-07-29
IPC分类号： B29C43/56
CPC分类号： B29C33/3857 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/038 , G03F7/0757
摘要： The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.
摘要翻译： 本发明提供了一种纳米压印树脂压模，其包括在透射支撑基底材料上的微结构层，该微结构层由含有倍半硅氧烷衍生物作为主要成分的树脂组合物的聚合物形成，该主体组分具有多个聚合性官能团 基团，具有多个可聚合官能团且不同于倍半硅氧烷衍生物的可聚合树脂组分和可光聚合引发剂，其中可光聚合引发剂的含量百分比等于或大于0.3质量％且等于或小于3 相对于倍半硅氧烷衍生物和可聚合树脂组分的总质量的质量％，并且微结构层允许等于或大于80％的光在365nm的波长下通过。
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公开(公告)号：US08632714B2
公开(公告)日：2014-01-21
申请号：US13526708
申请日：2012-06-19
CPC分类号： B81C1/0046
摘要： A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.
摘要翻译： 用于纳米印刷技术的模具和图案转印方法。 模具可以准确而容易地从基材上脱模。 使用压制机在基板上形成精细图案的模具包括释放机构。
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5.发明授权公开(公告)号：US08603380B2
公开(公告)日：2013-12-10
申请号：US13603455
申请日：2012-09-05
IPC分类号： B29C35/00
CPC分类号： B29C59/022 , B29C35/02 , B29C35/0888 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.
摘要翻译： 本发明的目的是提供一种用于转印精细图案的压模和用于制造压模的方法，压模具有精细的结构层，以提高树脂压模的连续转印性能，并允许精确和连续的转印。 为了实现上述目的，本发明提供了一种用于转印精细图案的压模，包括：支撑基板上的精细结构层，其中精细结构层是主成分为倍半硅氧烷衍生物的树脂化合物的聚合物， 多个聚合性官能团。
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6.发明申请MICROFINE STRUCTURE, METHOD FOR PRODUCING MICROFINE STRUCTURE, AND POLYMERIZABLE RESIN COMPOSITION FOR PRODUCING THE SAME 审中-公开微晶结构，微晶纤维结构体的制造方法及其制造方法的聚合性树脂组合物公开(公告)号：US20130011632A1
公开(公告)日：2013-01-10
申请号：US13519589
申请日：2010-12-22
申请人： Masahiko Ogino , Susumu Komoriya , Akihiro Miyauchi , Ryuta Washiya , Kyoichi Mori , Noritake Shizawa
发明人： Masahiko Ogino , Susumu Komoriya , Akihiro Miyauchi , Ryuta Washiya , Kyoichi Mori , Noritake Shizawa
CPC分类号： C08F283/02 , B82Y10/00 , B82Y40/00 , C09D4/06 , G03F7/0002 , G03F7/027 , G03F7/038 , G03F7/0388 , Y10T428/24802 , C08F220/30 , C08F220/40 , C08F222/1006
摘要： Provided is a method for producing a microfine structure comprising the steps of: forming a resin film by applying a liquid polymerizable resin composition containing a high molecular weight component, a low molecular weight component and a reactive dilution component to an adhesion promoting layer formed on a substrate; imprinting a mold with an extremely fine convex concave pattern onto the resin film; and transferring the convex concave pattern to the resin film. Herein, components of the adhesion promoting layer, the high molecular weight component, the low molecular weight component and the reactive dilution component respectively have cross-linking reactive functional groups which react with each other.
摘要翻译： 提供一种微细结构体的制造方法，其特征在于，包括以下工序：通过将含有高分子量成分，低分子量成分和反应性稀释成分的液体聚合性树脂组合物涂布在形成于 基质; 将具有非常细的凸凹图案的模具印刷到树脂膜上; 并将凸凹图案转印到树脂膜上。 这里，粘合促进层，高分子量组分，低分子量组分和反应性稀释组分的组分分别具有彼此反应的交联反应性官能团。
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公开(公告)号：US20120195993A1
公开(公告)日：2012-08-02
申请号：US13366792
申请日：2012-02-06
IPC分类号： B29C59/16
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译： 为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模和 检测被转移对象的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。
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公开(公告)号：US08133418B2
公开(公告)日：2012-03-13
申请号：US11833284
申请日：2007-08-03
IPC分类号： B29C45/76
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译： 为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模和 检测被转移对象的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。
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9.发明申请NANO-IMPRINTING RESIN STAMPER AND NANO-IMPRINTING APPARATUS USING THE SAME 失效NANO印花树脂印刷机和使用其的纳米印刷装置公开(公告)号：US20120027884A1
公开(公告)日：2012-02-02
申请号：US13193666
申请日：2011-07-29
CPC分类号： B29C33/3857 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/038 , G03F7/0757
摘要： The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.
摘要翻译： 本发明提供了一种纳米压印树脂压模，其包括在透射支撑基底材料上的微结构层，该微结构层由含有倍半硅氧烷衍生物作为主要成分的树脂组合物的聚合物形成，该主体组分具有多个聚合性官能团 基团，具有多个可聚合官能团且不同于倍半硅氧烷衍生物的可聚合树脂组分和可光聚合引发剂，其中可光聚合引发剂的含量百分比等于或大于0.3质量％且等于或小于3 相对于倍半硅氧烷衍生物和可聚合树脂组分的总质量的质量％，并且微结构层允许等于或大于80％的光在365nm的波长下通过。
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10.发明授权Method of transcribing fine pattern and fine structure pattern transcription apparatus 失效转录精细图案和精细结构图案转录装置的方法公开(公告)号：US08047835B2
公开(公告)日：2011-11-01
申请号：US11736016
申请日：2007-04-17
申请人： Mitsuru Hasegawa , Masahiko Ogino , Takashi Ando , Hideaki Kataho
发明人： Mitsuru Hasegawa , Masahiko Ogino , Takashi Ando , Hideaki Kataho
CPC分类号： B29C43/021 , B29C33/08 , B29C35/0888 , B29C43/003 , B29C43/10 , B29C59/022 , B29C2035/0827 , B29C2043/025 , B29C2043/3238 , B29C2059/023
摘要： A method of transcribing a shape of a surface of a stamper on a transcription surface of a transcription object by pressing the stamper on the transcription object, which comprises steps of: having one of the stamper and the transcription object positioned opposite a plate surface and the other of the stamper and the transcription object placed on one surface of a pressure plate; and having the one of the stamper and the transcription object pressed onto the plate surface by applying a fluid on the other surface of the pressure plate, wherein an area of the one surface of the pressure plate is larger than a contact area in which the other of the stamper and the transcription object is in contact with the pressure plate.
摘要翻译： 一种通过将转印体上的压模按压在转录物上的转印体转录面上的压模表面的形状的方法，该方法包括以下步骤：将压模和转录体中的一个定位在与板表面相对的位置， 放置在压板的一个表面上的压模和转录对象中的另一个; 并且通过在所述压力板的另一个表面上施加流体而将所述压模和转印体中的一个压在所述板表面上，其中所述压板的所述一个表面的面积大于所述压板的所述另一表面的面积 的压模和转录物体与压力板接触。
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