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16 条记录 (耗时 0.019 秒)

    Display apparatus and controlling method thereof
    1.
    发明授权
    Display apparatus and controlling method thereof 有权
    显示装置及其控制方法

    公开(公告)号：US07116322B2

    公开(公告)日：2006-10-03

    申请号：US10162085

    申请日：2002-06-05

    申请人： Kyung-Pill Ko ,  Hyun-Joon Kim

    发明人： Kyung-Pill Ko ,  Hyun-Joon Kim

    IPC分类号： G09G5/00

    CPC分类号： G09G5/006 ,  G09G5/005 ,  G09G2330/021 ,  G09G2330/022 ,  G09G2340/0407

    摘要： A display apparatus comprises input parts through which analog and digital video signals outputted from a video card are inputted, and a plurality of driving components. The apparatus further comprises: an electric power supply part for supplying electric power; a scaler chip including an A/D converter and PLL and a TMDS part for processing an analog video signal and a digital video signal, respectively; and a controller for detecting horizontal and vertical synchronous signals decoded by the TMDS part of the scaler chip, and for lowering the number of driving clocks of the scaler chip and turning off the driving components according to determination of a power saving mode when at least one of the horizontal and vertical synchronous signals is not outputted. With this configuration, electric power consumption is effectively minimized in a power saving mode in a display apparatus having a unified scaler chip.

    摘要翻译： 显示装置包括输入从视频卡输出的模拟和数字视频信号的输入部分和多个驱动部件。 该装置还包括：用于提供电力的电力供应部件; 包括A / D转换器和PLL的定标器芯片和分别用于处理模拟视频信号和数字视频信号的TMDS部件; 以及控制器，用于检测由所述缩放器芯片的TMDS部分解码的水平和垂直同步信号，并且用于当至少一个所述定标器芯片的确定时，根据所述节电模式的确定来降低所述定标器芯片的驱动时钟的数量，并且关闭所述驱动部件 不输出水平和垂直同步信号。 利用这种配置，在具有统一的定标器芯片的显示装置中，在省电模式下有效地最小化了电力消耗。

    Process for preparing syndiotactic styrenic polymers by recycling the products
    2.
    发明授权
    Process for preparing syndiotactic styrenic polymers by recycling the products 失效
    通过回收产品制备间规苯乙烯聚合物的方法

    公开(公告)号：US06369173B1

    公开(公告)日：2002-04-09

    申请号：US09663444

    申请日：2000-09-15

    申请人： Hyun-Joon Kim ,  Jae-Gon Lim ,  Sung-Cheol Yoon

    发明人： Hyun-Joon Kim ,  Jae-Gon Lim ,  Sung-Cheol Yoon

    IPC分类号： C08F236

    CPC分类号： C08F257/02 ,  B01J19/006 ,  B01J19/1856 ,  B01J19/1862 ,  B01J19/1881 ,  B01J2219/00029 ,  B01J2219/00033 ,  B01J2219/00094 ,  B01J2219/00779 ,  C08F4/65912 ,  C08F4/65916 ,  C08F12/04 ,  C08F12/08 ,  C08F2/02 ,  C08F4/6592

    摘要： The present invention relates to a process of preparing syndiotactic styrenic polymers with a high conversion rate in the form of fine powder, which comprises (a) preparing styrenic polymers in a solid state by reacting a mixture consisting of styrenic monomers, a metallocene catalyst, a cocatalyst and inert organic solvent in a polymerization reactor, (b) separating a portion of the styrenic polymers from the reactor, (c) recycling the portion of the styrenic polymers in the reactor, and (d) reacting the recycled styrenic polymers with styrenic monomers. The styrenic monomers may include olefinic monomers. The monomers can be introduced to a single inlet or multiple inlets of the reactor. A single reactor or a plural number of reactors can be operated in the present invention. The plural numbers of reactors are arranged in series or in parallel. In the present invention, a self-cleaning mono- or twin-axis reactor can be employed to prevent the polymers from agglomerating on the inner wall or the axis. Alternatively, a cylindrical reactor can be employed, where the styrenic polymers are transported in a solid or powder state rotating in a certain direction at the range of Froude Number of from 0.1 to 10 and polymerization proceeds toward the exit of the reactor.

    摘要翻译： 本发明涉及以细粉末形式制备具有高转化率的间同立构苯乙烯聚合物的方法，该方法包括：（a）通过使由苯乙烯单体，茂金属催化剂， 助催化剂和惰性有机溶剂，（b）从反应器中分离一部分苯乙烯聚合物，（c）将该部分苯乙烯聚合物再循环到反应器中，和（d）使回收的苯乙烯类聚合物与苯乙烯类单体反应 。 苯乙烯类单体可以包括烯烃单体。 可以将单体引入反应器的单个入口或多个入口。 在本发明中可以操作单个反应器或多个反应器。 多个反应器串联或并联排列。 在本发明中，可以使用自清洁单轴或双轴反应器来防止聚合物在内壁或轴上附聚。 或者，可以使用圆柱形反应器，其中苯乙烯聚合物以固体或粉末状态在一定方向上转动，弗劳德数为0.1至10，聚合朝向反应器的出口进行。

    Module for transferring a substrate
    4.
    发明授权
    Module for transferring a substrate 失效
    用于转移衬底的模块

    公开(公告)号：US07065898B2

    公开(公告)日：2006-06-27

    申请号：US10763203

    申请日：2004-01-26

    申请人： Hyun-Joon Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

    发明人： Hyun-Joon Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

    IPC分类号： F26B21/06

    CPC分类号： H01L21/67017 ,  H01L21/67772

    摘要： A module for transferring a substrate includes a load port for supporting a container to receive a plurality of substrates, a substrate transfer chamber disposed between the load port and a substrate process module, a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrates between the container and the substrate process module, a gas supply unit connected to the substrate transfer chamber for supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, and a contamination control unit connected to the substrate transfer chamber for circulating the purge gas supplied into the substrate transfer chamber, resupplying the circulated purge gas into the substrate transfer chamber and removing particles and airborne molecular contaminants from the purge gas being circulated. Contamination of a substrate may be prevented and a necessary amount of purge gas may be reduced.

    摘要翻译： 用于转印衬底的模块包括用于支撑容器以容纳多个衬底的负载端口，设置在负载端口和衬底处理模块之间的衬底传送室，设置在衬底传送室中用于传送衬底的衬底传送机器人 在所述容器和所述基板处理模块之间，连接到所述基板传送室的气体供应单元，用于将净化气体供应到所述基板传送室中以净化所述基板传送室的内部;以及污染控制单元，连接到所述基板传送室 用于循环供给到基板传送室中的吹扫气体，将循环的净化气体再供给到基板传送室中，并从正在循环的吹扫气体中除去颗粒和空气传播的分子污染物。 可以防止基材的污染，并且可以减少必需量的吹扫气体。

    Communication control system and method using communication network
    5.
    发明授权
    Communication control system and method using communication network 失效
    通信控制系统及其使用方法

    公开(公告)号：US06975432B2

    公开(公告)日：2005-12-13

    申请号：US09872443

    申请日：2001-05-31

    申请人： Hyun-Joon Kim

    发明人： Hyun-Joon Kim

    IPC分类号： H04L29/06 ,  H04L29/08 ,  H04D1/00

    CPC分类号： H04L29/06 ,  H04L67/14 ,  H04L67/325 ,  H04L69/24 ,  H04L69/329

    摘要： A communication control system and method provides communication over the Internet between a first user having a first communication device, such as IP phone or computer, and a second user having a second communication device. The communication control system provides a plurality of user selectable communication options, such as voice communication, chatting, e-mail and fax. The communication control system interfacing with the second communication device to determine whether the second communication device is available to communicate using a first communication option, such as voice communication. The communication control system checking transmission delay of the communication network to determine whether an optimum communication may be achieved using the first communication option. If the first communication option is not feasible due to the transmission anomaly, a second communication option, such as chatting is selected.

    摘要翻译： 通信控制系统和方法通过因特网在具有诸如IP电话或计算机的第一通信设备的第一用户和具有第二通信设备的第二用户之间提供通信。 通信控制系统提供多种用户可选择的通信选项，例如语音通信，聊天，电子邮件和传真。 所述通信控制系统与所述第二通信设备接口，以确定所述第二通信设备是否可用于使用诸如语音通信的第一通信选项进行通信。 通信控制系统检查通信网络的传输延迟，以确定是否可以使用第一通信选项来实现最佳通信。 如果由于传输异常而第一通信选项不可行，则选择诸如聊天之类的第二通信选项。

    Air shower head of photolithography equipment for directing air towards a wafer stage
    9.
    发明授权
    Air shower head of photolithography equipment for directing air towards a wafer stage 失效
    用于将空气引向晶片台的光刻设备的空气喷头

    公开(公告)号：US06522385B2

    公开(公告)日：2003-02-18

    申请号：US09848284

    申请日：2001-05-04

    申请人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

    发明人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

    IPC分类号： G03B2752

    CPC分类号： G03F7/70908 ,  G03F7/70866 ,  G03F7/70933

    摘要： An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.

    摘要翻译： 光刻设备的曝光装置的空气喷头不含化学物质，否则会污染半导体晶片上的光致抗蚀剂层并降低光致抗蚀剂图案的轮廓。 空气喷头插入在曝光装置的透镜系统和晶片台之间，并且在其中间具有曝光光可以通过其到支撑在平台上的晶片的孔。 空气喷头包括限定在其底部开口的空腔的上框架和覆盖上框架的底部的多孔底部构件。 多孔构件机械地固定到上框架的内侧壁和外侧壁的底端，即不使用化学粘合剂，以降低空气淋浴头作为污染源的能力。

    Dry cleaner for wafer carriers
    10.
    发明授权
    Dry cleaner for wafer carriers 失效
    晶圆载体干洗机

    公开(公告)号：US5896674A

    公开(公告)日：1999-04-27

    申请号：US774400

    申请日：1996-12-30

    申请人： Hyun-Joon Kim ,  Yun-Soo Han ,  Jai-Kang Jeon ,  Sang-Young Mun

    发明人： Hyun-Joon Kim ,  Yun-Soo Han ,  Jai-Kang Jeon ,  Sang-Young Mun

    IPC分类号： H01L21/673 ,  H01L21/00 ,  H01L21/304 ,  F26B3/00

    CPC分类号： H01L21/67028

    摘要： A dry cleaner easily and rapidly eliminates particles and dirt adhered to interior surfaces of the wafer carrier. The dry cleaner has a housing with a table mounted thereon, and an assembly for cleaning the wafer carriers disposed on the table. The cleaning assembly sprays a cleaning gas simultaneously into the carrier box and the cover of the wafer carrier. Dirt and particles separated from the carrier box and the cover are collected, by vacuum pressure through openings in the table, into a dirt-collector disposed in the housing, and then discharged through an exhaust tube. A controller controls a quantity of cleaning gas supplied and a time of cleaning by the cleaning assembly.

    摘要翻译： 干燥剂容易且快速地消除粘附在晶片载体的内表面上的颗粒和污垢。 干式清洁器具有安装在其上的工作台的壳体，以及用于清洁设置在工作台上的晶片载体的组件。 清洁组件将清洁气体同时喷射到载体盒和晶片载体的盖子中。 从载体盒和盖子分离的污垢和颗粒通过真空压力通过工作台中的开口收集到设置在壳体中的集尘器中，然后通过排气管排出。 控制器控制供应的清洁气体的量和清洁组件的清洁时间。