公开(公告)号：US09393666B2

公开(公告)日：2016-07-19

申请号：US14137049

申请日：2013-12-20

Applicant: Lam Research Corporation

Inventor： Catherine Zhou ,  Duane Outka ,  Cliff LaCroix ,  Hong Shih

IPC: B24B41/06 ,  H01J37/32

CPC classification number: B24B41/06 ,  H01J37/3288

Abstract: An adapter plate configured to be attachable to a universal platen of a cleaning unit for cleaning upper electrodes from a plasma processing chamber is disclosed, the adapter plate includes a support surface and a mounting surface configured to be fastened to the universal platen of the cleaning unit. The support surface is configured to support an inner electrode or an outer electrode of a showerhead electrode assembly for cleaning upper or lower surfaces thereof. The support surface having a first set of holes configured to receive pins engaged in an upper surface of the inner electrode, a second set of holes configured to receive pins surrounding an outer periphery of the inner electrode, a third set of holes configured to receive pins engaged in an upper surface of the outer electrode, and a fourth set of holes configured to receive pins surrounding an outer periphery of the outer electrode.

Abstract translation: 公开了一种适配器板，其构造成可附接到用于从等离子体处理室清洁上部电极的清洁单元的通用压板上，所述适配器板包括支撑表面和安装表面，所述安装表面被构造成紧固到所述清洁单元的通用压板 。 支撑表面被配置为支撑用于清洁其上表面或下表面的喷头电极组件的内电极或外电极。 所述支撑表面具有第一组孔，所述第一组孔用于接纳接合在所述内部电极的上表面中的销;第二组孔，被配置为接纳围绕所述内部电极的外周的引脚;第三组孔， 接合外电极的上表面，以及第四组孔，其构造成接收围绕外电极的外周的引脚。

公开(公告)号：US09120201B2

公开(公告)日：2015-09-01

申请号：US14021300

申请日：2013-09-09

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Duane Outka ,  Catherine Zhou ,  Hong Shih

IPC: B24B41/06 ,  B08B3/08 ,  B08B3/12 ,  C11D7/08 ,  C11D7/26 ,  C11D11/00

CPC classification number: B24B41/06 ,  B08B3/08 ,  B08B3/12 ,  C11D7/08 ,  C11D7/261 ,  C11D7/265 ,  C11D11/0047

Abstract: A process is provided for polishing a silicon electrode utilizing a polishing turntable and a dual function electrode platen secured to the polishing, which can comprise a plurality of electrode mounts arranged to project from an electrode engaging face of the dual function electrode platen. The electrode mounts and mount receptacles can be configured to permit non-destructive engagement and disengagement of the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode. The silicon electrode can be polished by (i) engaging the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode via the electrode mounts and mount receptacles, (ii) utilizing the polishing turntable to impart rotary, and (iii) contacting an exposed face of the silicon electrode with a polishing surface as the silicon electrode. Additional embodiments are contemplated, disclosed and claimed.

Abstract translation: 提供了一种利用抛光转盘和固定到抛光的双功能电极压板来抛光硅电极的工艺，其可以包括布置成从双功能电极压板的电极接合面突出的多个电极安装件。 电极安装座和安装座可构造为允许电极台板的电极接合面和硅电极的台板接合面的非破坏性接合和分离。 可以通过（i）通过电极座和安装座接合电极台板的电极接合面和硅电极的台板接合面，（ii）利用抛光转台来旋转，并（iii） ）使硅电极的暴露面与作为硅电极的抛光表面接触。 预期，公开和要求保护附加实施例。

公开(公告)号：US20150179416A1

公开(公告)日：2015-06-25

申请号：US14137049

申请日：2013-12-20

Applicant: Lam Research Corporation

Inventor： Catherine Zhou ,  Duane Outka ,  Cliff LaCroix ,  Hong Shih

IPC: H01J37/32 ,  B24B41/06

CPC classification number: B24B41/06 ,  H01J37/3288

Abstract: An adapter plate configured to be attachable to a universal platen of a cleaning unit for cleaning upper electrodes from a plasma processing chamber is disclosed, the adapter plate includes a support surface and a mounting surface configured to be fastened to the universal platen of the cleaning unit. The support surface is configured to support an inner electrode or an outer electrode of a showerhead electrode assembly for cleaning upper or lower surfaces thereof. The support surface having a first set of holes configured to receive pins engaged in an upper surface of the inner electrode, a second set of holes configured to receive pins surrounding an outer periphery of the inner electrode, a third set of holes configured to receive pins engaged in an upper surface of the outer electrode, and a fourth set of holes configured to receive pins surrounding an outer periphery of the outer electrode.

Abstract translation: 公开了一种适配器板，其构造成可附接到用于从等离子体处理室清洁上部电极的清洁单元的通用压板上，所述适配器板包括支撑表面和安装表面，所述安装表面被构造成紧固到所述清洁单元的通用压板 。 支撑表面被配置为支撑用于清洁其上表面或下表面的喷头电极组件的内电极或外电极。 所述支撑表面具有第一组孔，所述第一组孔用于接纳接合在所述内部电极的上表面中的销;第二组孔，被配置为接纳围绕所述内部电极的外周的引脚;第三组孔， 接合外电极的上表面，以及第四组孔，其构造成接收围绕外电极的外周的引脚。

公开(公告)号：US08945317B2

公开(公告)日：2015-02-03

申请号：US13650429

申请日：2012-10-12

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff La Croix ,  Hong Shih ,  Allan Ronne ,  John Daugherty ,  Catherine Zhou

IPC: B08B9/02

CPC classification number: B08B9/0328

Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.

Abstract translation: 具有同心双流引导器和分流喷射器座的喷射器清洁装置以及清洁喷射器的方法。 同心双流引导器具有配置成与气体注射器的中心通道和多个外围通道连通的同心清洁流体流动路径。 同心双流引导器和流量分散注射器座的输入侧注射器接合界面各自具有可压缩的密封部分，该密封部分具有足够的压缩性，足以产生由于通过喷射器清洁装置的清洁流体流动的起始和终止引起的流体清洁浪涌 其弹性足以防止气体注射器和输入侧注射器接合界面和输出侧注射器接合界面的刚性面对部分的邻接。

公开(公告)号：US20140030966A1

公开(公告)日：2014-01-30

申请号：US14021300

申请日：2013-09-09

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Duane Outka ,  Catherine Zhou ,  Hong Shih

IPC: B24B41/06

CPC classification number: B24B41/06 ,  B08B3/08 ,  B08B3/12 ,  C11D7/08 ,  C11D7/261 ,  C11D7/265 ,  C11D11/0047

Abstract: A process is provided for polishing a silicon electrode utilizing a polishing turntable and a dual function electrode platen secured to the polishing, which can comprise a plurality of electrode mounts arranged to project from an electrode engaging face of the dual function electrode platen. The electrode mounts and mount receptacles can be configured to permit non-destructive engagement and disengagement of the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode. The silicon electrode can be polished by (i) engaging the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode via the electrode mounts and mount receptacles, (ii) utilizing the polishing turntable to impart rotary, and (iii) contacting an exposed face of the silicon electrode with a polishing surface as the silicon electrode. Additional embodiments are contemplated, disclosed and claimed.

Abstract translation: 提供了一种利用抛光转盘和固定到抛光的双功能电极压板来抛光硅电极的工艺，其可以包括布置成从双功能电极压板的电极接合面突出的多个电极安装件。 电极安装座和安装座可构造为允许电极台板的电极接合面和硅电极的台板接合面的非破坏性接合和分离。 可以通过（i）通过电极座和安装座接合电极台板的电极接合面和硅电极的台板接合面，（ii）利用抛光转台来旋转，并（iii） ）使硅电极的暴露面与作为硅电极的抛光表面接触。 预期，公开和要求保护附加实施例。

公开(公告)号：US20130146095A1

公开(公告)日：2013-06-13

申请号：US13650429

申请日：2012-10-12

Applicant: LAM RESEARCH CORPORATION

Inventor： Armen Avoyan ,  Cliff La Croix ,  Hong Shih ,  Allan Ronne ,  John Daugherty ,  Catherine Zhou

IPC: B08B9/032 ,  B08B3/02

CPC classification number: B08B9/0328

Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.

Abstract translation: 具有同心双流引导器和分流喷射器座的喷射器清洁装置以及清洁喷射器的方法。 同心双流引导器具有配置成与气体注射器的中心通道和多个外围通道连通的同心清洁流体流动路径。 同心双流引导器和流量分散注射器座的输入侧注射器接合界面各自具有可压缩的密封部分，该密封部分具有足够的压缩性，足以产生由于通过喷射器清洁装置的清洁流体流动的起始和终止引起的流体清洁浪涌 其弹性足以防止气体注射器和输入侧注射器接合界面和输出侧注射器接合界面的刚性面对部分的邻接。