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公开(公告)号：US12064795B2
公开(公告)日：2024-08-20
申请号：US17211518
申请日：2021-03-24
Applicant: Lam Research Corporation
Inventor： Amir A. Yasseri , Hong Shih , John Daugherty , Duane Outka , Lin Xu , Armen Avoyan , Cliff La Croix , Girish Hundi
Abstract: A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.
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公开(公告)号：US09406534B2
公开(公告)日：2016-08-02
申请号：US14525118
申请日：2014-10-27
Applicant: Lam Research Corporation
Inventor： Armen Avoyan , Kennet Baylon
IPC: H01L21/302 , H01L21/67 , H01L21/02 , B08B3/08
CPC classification number: H01L21/67017 , B08B3/08 , C23C16/4407 , H01J37/32862 , H01L21/02052 , H01L21/02054
Abstract: A system and method of cleaning a plasma processing chamber component includes removing the component from the plasma processing chamber, the removed component including a material deposited on the surface of the component. A heated oxidizing solution is applied to the material deposited on the component to oxidize a first portion deposited material. A stripping solution is applied to the component to remove the oxidized first portion of the deposited material. An etching solution is applied to remove a second portion of the deposited material and the cleaned component can be rinsed and dried.
Abstract translation: 清洁等离子体处理室部件的系统和方法包括从等离子体处理室移除部件，所移除的部件包括沉积在部件表面上的材料。 将加热的氧化溶液施加到沉积在部件上的材料以氧化第一部分沉积材料。 将剥离溶液施加到组分以除去沉积材料的氧化的第一部分。 施加蚀刻溶液以去除沉积材料的第二部分，并且可以清洗和干燥清洁的部件。
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公开(公告)号：US20160141153A1
公开(公告)日：2016-05-19
申请号：US15003485
申请日：2016-01-21
Applicant: Lam Research Corporation
Inventor： Armen Avoyan , Cliff la Croix , Hong Shih
CPC classification number: H01J37/32862 , B08B3/00 , B08B3/02 , H01J21/00 , H01J37/32532 , H01L21/00
Abstract: In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.
Abstract translation: 在一个实施例中，双相清洗室可以包括湍流混合室，流体扩散器，等静压压力室和破裂缓冲喷嘴。 湍流混合室可以与第一流体入口和第二流体入口流体连通。 流体扩散器可以与湍流混合室流体连通。 破裂缓冲喷嘴可以包括第一流体收集偏移，第二流体收集偏移和位移阻尼突起。 位移阻尼突起可以设置在第一和第二流体收集偏移之间，并且可以偏离第一流体收集偏移和第二流体收集偏移中的每一个并且朝向流体扩散器偏移。 从第一流体入口，第二流体入口或二者引入的加压清洁流体流过第一和第二流体收集偏移的出口通道。
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公开(公告)号：US20150000712A1
公开(公告)日：2015-01-01
申请号：US13929890
申请日：2013-06-28
Applicant: Lam Research Corporation
Inventor： Cliff LaCroix , Armen Avoyan
CPC classification number: H01J37/32862 , B08B3/10 , B08B3/12 , C11D11/0041 , C11D11/007
Abstract: A sonic cleaning tool having a component retaining fixture, a sonic bath, and a cleaning fluid circulating system. The sonic bath has a sound field transducer and is structurally configured to place the component retaining fixture in sonic communication with the sound field transducer within the sonic bath. The component retaining fixture comprises a first end plate, a second end plate, a first component securing member, a second component securing member, and a plurality of compression studs. The first component securing member projects from the first end plate and is structurally configured for repeatable transition between a retracted position and an extended position. The second component securing member projects from the second end plate. The compression studs of the component retaining fixture span from the first end plate to the second end plate and are spaced to form a plurality of sonic transmission windows between the compression studs. The sonic transmission windows collectively place a majority of a component disposed in the component retaining fixture in substantially unobstructed sonic communication with the sound field transducer of the sonic bath. The cleaning fluid circulating system has a cleaning fluid, a cleaning fluid supply reservoir, a deionized water supply, and a compressed dry air supply, which are fluidly connected to the component retaining fixture.
Abstract translation: 一种声音清洁工具，其具有部件固定夹具，声波槽和清洁液循环系统。 声音浴具有声场传感器，并且在结构上被配置为将部件保持夹具放置在声波槽内与声场传感器声音通信。 所述部件保持夹具包括第一端板，第二端板，第一部件固定部件，第二部件固定部件和多个压缩螺柱。 第一部件固定部件从第一端板突出并且在结构上构造成在缩回位置和伸出位置之间可重复地过渡。 第二部件固定部件从第二端板突出。 部件保持夹具的压缩螺柱从第一端板延伸到第二端板，并且间隔开以在压缩螺柱之间形成多个声音传输窗口。 声音传输窗口将设置在部件保持固定器中的部件的大部分集中地放置在与声波槽的声场传感器基本上无阻碍的声音通信中。 清洁液循环系统具有流体地连接到部件保持夹具的清洁流体，清洁流体供应储存器，去离子水供应源和压缩干燥空气源。
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公开(公告)号：US12072318B2
公开(公告)日：2024-08-27
申请号：US17612381
申请日：2020-05-19
Applicant: Lam Research Corporation
Inventor： Amir A. Yasseri , Duane Outka , Armen Avoyan , Kennet Cresencio Baylon , John Daugherty , Girish M. Hundi , Cliff La Croix
CPC classification number: G01N29/14 , B08B3/12 , G01N1/02 , G01N29/02 , H01J37/32788 , G01N2001/002 , G01N2001/4094
Abstract: An apparatus for measuring contaminants on a surface of a component is provided. An extraction vessel for holding a measurement fluid has an opening adapted to form a meniscus using the measurement fluid. An actuator moves at least one of the extraction vessel and the component to a position where the meniscus is in contact with the surface of the component. A transducer is positioned to provide acoustic energy to the measurement fluid.
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Patent Agency Ranking
公开(公告)号：US20160079096A1
公开(公告)日：2016-03-17
申请号：US14525118
申请日：2014-10-27
Applicant: LAM RESEARCH CORPORATION
Inventor： Armen Avoyan , Kennet Baylon
CPC classification number: H01L21/67017 , B08B3/08 , C23C16/4407 , H01J37/32862 , H01L21/02052 , H01L21/02054
Abstract: A system and method of cleaning a plasma processing chamber component includes removing the component from the plasma processing chamber, the removed component including a material deposited on the surface of the component. A heated oxidizing solution is applied to the material deposited on the component to oxidize a first portion deposited material. A stripping solution is applied to the component to remove the oxidized first portion of the deposited material. An etching solution is applied to remove a second portion of the deposited material and the cleaned component can be rinsed and dried.
Abstract translation: 清洁等离子体处理室部件的系统和方法包括从等离子体处理室移除部件，所移除的部件包括沉积在部件表面上的材料。 将加热的氧化溶液施加到沉积在部件上的材料以氧化第一部分沉积材料。 将剥离溶液施加到组分以除去沉积材料的氧化的第一部分。 施加蚀刻溶液以去除沉积材料的第二部分，并且可以清洗和干燥清洁的部件。
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7.发明授权公开(公告)号：US09120201B2
公开(公告)日：2015-09-01
申请号：US14021300
申请日：2013-09-09
Applicant: Lam Research Corporation
Inventor： Armen Avoyan , Duane Outka , Catherine Zhou , Hong Shih
CPC classification number: B24B41/06 , B08B3/08 , B08B3/12 , C11D7/08 , C11D7/261 , C11D7/265 , C11D11/0047
Abstract: A process is provided for polishing a silicon electrode utilizing a polishing turntable and a dual function electrode platen secured to the polishing, which can comprise a plurality of electrode mounts arranged to project from an electrode engaging face of the dual function electrode platen. The electrode mounts and mount receptacles can be configured to permit non-destructive engagement and disengagement of the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode. The silicon electrode can be polished by (i) engaging the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode via the electrode mounts and mount receptacles, (ii) utilizing the polishing turntable to impart rotary, and (iii) contacting an exposed face of the silicon electrode with a polishing surface as the silicon electrode. Additional embodiments are contemplated, disclosed and claimed.
Abstract translation: 提供了一种利用抛光转盘和固定到抛光的双功能电极压板来抛光硅电极的工艺，其可以包括布置成从双功能电极压板的电极接合面突出的多个电极安装件。 电极安装座和安装座可构造为允许电极台板的电极接合面和硅电极的台板接合面的非破坏性接合和分离。 可以通过（i）通过电极座和安装座接合电极台板的电极接合面和硅电极的台板接合面，（ii）利用抛光转台来旋转，并（iii） ）使硅电极的暴露面与作为硅电极的抛光表面接触。 预期，公开和要求保护附加实施例。
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公开(公告)号：US09390895B2
公开(公告)日：2016-07-12
申请号：US13929890
申请日：2013-06-28
Applicant: Lam Research Corporation
Inventor： Cliff LaCroix , Armen Avoyan
CPC classification number: H01J37/32862 , B08B3/10 , B08B3/12 , C11D11/0041 , C11D11/007
Abstract: A sonic cleaning tool having a component retaining fixture, a sonic bath, and a cleaning fluid circulating system. The sonic bath has a sound field transducer and is structurally configured to place the component retaining fixture in sonic communication with the sound field transducer within the sonic bath. The component retaining fixture comprises a first end plate, a second end plate, a first component securing member, a second component securing member, and a plurality of compression studs. The first component securing member projects from the first end plate and is structurally configured for repeatable transition between a retracted position and an extended position. The second component securing member projects from the second end plate. The compression studs of the component retaining fixture span from the first end plate to the second end plate and are spaced to form a plurality of sonic transmission windows between the compression studs. The sonic transmission windows collectively place a majority of a component disposed in the component retaining fixture in substantially unobstructed sonic communication with the sound field transducer of the sonic bath. The cleaning fluid circulating system has a cleaning fluid, a cleaning fluid supply reservoir, a deionized water supply, and a compressed dry air supply, which are fluidly connected to the component retaining fixture.
Abstract translation: 一种声音清洁工具，其具有部件固定夹具，声波槽和清洁液循环系统。 声音浴具有声场传感器，并且在结构上被配置为将部件保持夹具放置在声波槽内与声场传感器声音通信。 所述部件保持夹具包括第一端板，第二端板，第一部件固定部件，第二部件固定部件和多个压缩螺柱。 第一部件固定部件从第一端板突出并且在结构上构造成在缩回位置和伸出位置之间可重复地过渡。 第二部件固定部件从第二端板突出。 部件保持夹具的压缩螺柱从第一端板延伸到第二端板，并且间隔开以在压缩螺柱之间形成多个声音传输窗口。 声音传输窗口将设置在部件保持固定器中的部件的大部分集中地放置在与声波槽的声场传感器基本上无阻碍的声音通信中。 清洁液循环系统具有流体地连接到部件保持夹具的清洁流体，清洁流体供应储存器，去离子水供应源和压缩干燥空气源。
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公开(公告)号：US08945317B2
公开(公告)日：2015-02-03
申请号：US13650429
申请日：2012-10-12
Applicant: Lam Research Corporation
Inventor： Armen Avoyan , Cliff La Croix , Hong Shih , Allan Ronne , John Daugherty , Catherine Zhou
IPC: B08B9/02
CPC classification number: B08B9/0328
Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.
Abstract translation: 具有同心双流引导器和分流喷射器座的喷射器清洁装置以及清洁喷射器的方法。 同心双流引导器具有配置成与气体注射器的中心通道和多个外围通道连通的同心清洁流体流动路径。 同心双流引导器和流量分散注射器座的输入侧注射器接合界面各自具有可压缩的密封部分，该密封部分具有足够的压缩性，足以产生由于通过喷射器清洁装置的清洁流体流动的起始和终止引起的流体清洁浪涌 其弹性足以防止气体注射器和输入侧注射器接合界面和输出侧注射器接合界面的刚性面对部分的邻接。
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10.发明申请PORTABLE SONIC PARTICLE REMOVAL TOOL WITH A CHEMICALLY CONTROLLED WORKING FLUID 有权便携式SONIC颗粒拆卸工具与化学控制的工作流体公开(公告)号：US20140261575A1
公开(公告)日：2014-09-18
申请号：US13833487
申请日：2013-03-15
Applicant: LAM RESEARCH CORPORATION
Inventor： Armen Avoyan , Cliff LaCroix , Hong Shih , John Daugherty
IPC: B08B3/12
CPC classification number: B08B3/12 , C11D11/0041 , C11D11/0047 , C11D11/007 , H01L21/67017 , H01L21/67051
Abstract: A particle removal tool having a sound field transducer, a cleaning chamber, and an open sealing face. The cleaning chamber having a cleaning fluid guiding chamber extending from the sound field transducer to the open sealing face, a cleaning fluid delivery channel in fluid communication with the cleaning fluid guiding chamber, and a cleaning fluid return channel. The open sealing face has a cleaning portal disposed contiguous with a plane formed by the open sealing face and a chamber-to-surface interface seal which forms a fluid tight seal with a cleaning surface plane. The sound field transducer is disposed within a line-of-sight of the cleaning portal and generates acoustic waves with a frequency between approximately 20 kHz and approximately 2 MHz.
Abstract translation: 具有声场换能器，清洁室和开口密封面的颗粒去除工具。 清洁室具有从声场换能器延伸到打开的密封面的清洁流体引导室，与清洁流体引导室流体连通的清洁流体输送通道和清洁流体返回通道。 敞开的密封面具有与由开口密封面形成的平面邻接的清洁入口和与清洁表面平面形成流体密封的腔到表面的界面密封件。 声场传感器设置在清洁门口的视线内，并产生频率在大约20kHz到大约2MHz之间的声波。
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