POLYAMIDE RESIN, AND POLYMER FILM, RESIN LAMINATE USING THE SAME

    公开(公告)号:US20220033653A1

    公开(公告)日:2022-02-03

    申请号:US16972485

    申请日:2019-11-01

    Applicant: LG CHEM, LTD.

    Abstract: The present invention relates to a polyamide resin in which an average particle size of individual crystals measured by a small-angle X-ray scattering apparatus is 8.0 nm or less, and a UV-cut slope (dT/dλ) measured for a specimen having a thickness of 45 μm or more and 55 μm or less according to ASTM E424 is 0.25 or more in the range of 10% to 80% transmittance, and a polymer film and resin laminate using the same. In addition, the present invention relates to a polyamide resin with characteristic profile in which a small-angle X-ray scattering function obtained by irradiating the polyamide resin with X-rays having an energy of 10 KeV to 20 KeV using a small-angle X-ray scattering apparatus satisfies Equation 1 and Equation 2, and a polymer film and resin laminate using the same.

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