公开(公告)号：US09695499B2

公开(公告)日：2017-07-04

申请号：US14444740

申请日：2014-07-28

Applicant: LG INNOTEK CO., LTD.

Inventor： Young Jae Lee ,  Kyoung Jong Yoo ,  Jun Lee ,  Jin Su Kim ,  Jae Wan Park

IPC: C23C14/00 ,  H01L29/06 ,  C30B11/12 ,  C30B29/60 ,  B22F9/16 ,  C04B35/622 ,  B82Y10/00 ,  B22F1/00 ,  C23C16/01 ,  B82Y30/00 ,  B82Y40/00 ,  H01L29/66 ,  H01L29/775

CPC classification number: C23C14/0005 ,  B22F1/0044 ,  B22F9/16 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C04B35/622 ,  C23C16/01 ,  C30B11/12 ,  C30B29/60 ,  H01L29/0673 ,  H01L29/66469 ,  H01L29/775 ,  Y10S977/888 ,  Y10S977/89 ,  Y10T428/24802 ,  Y10T428/298

Abstract: Provided is a nanowire manufacturing substrate, comprising a grid base layer on a substrate and a grid pattern formed by patterning the grid base layer, the grid pattern being disposed to produce a nanowire on a surface thereof. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.

公开(公告)号：US10055629B2

公开(公告)日：2018-08-21

申请号：US14814572

申请日：2015-07-31

Applicant: LG INNOTEK CO., LTD.

Inventor： Seung Jin Kim ,  Jae Wan Park ,  Hyun Soo Kim ,  Jung Hwan Bang ,  Dong Keun Lee ,  Sin Ae Jang ,  Jong Seon Jeong ,  Kyoung Jong Yoo

IPC: G06K9/00 ,  G06F3/041

CPC classification number: G06K9/0002 ,  G06F3/041 ,  G06K9/00053

Abstract: A fingerprint sensor includes a piezoelectric substrate, and an electrode on the piezoelectric substrate. The electrode includes a first electrode and a second electrode on at least one of one surface of the piezoelectric substrate and an opposite surface opposite to the one surface. The electrode includes a node area in which the first electrode crosses the second electrode, and the node area transmits and receives a signal by an object that makes contact with the node area or approaches the node area in a direction of the piezoelectric substrate. The fingerprint sensor includes a substrate including a first area to a fourth area. At least one of first and second electrodes is provided in the first area to the third area, and a chip connected with the first and second electrodes is provided in the fourth area.

公开(公告)号：US09681540B2

公开(公告)日：2017-06-13

申请号：US13890922

申请日：2013-05-09

Applicant: LG INNOTEK CO., LTD.

Inventor： Soo Jin Lee ,  Jae Wan Park ,  Sang Yu Lee ,  Jae Hong Lee ,  Yeong Soo Choi

IPC: H05K1/00 ,  G06F3/041 ,  G06F3/045 ,  H03K17/975 ,  H05K1/03 ,  G06F3/044

CPC classification number: H05K1/0306 ,  G06F3/044 ,  G06F2203/04112

Abstract: Disclosed is an electrode member. The electrode member includes a substrate, and an electrode provided in the shape of a mesh on the substrate.

公开(公告)号：US10008659B2

公开(公告)日：2018-06-26

申请号：US14814969

申请日：2015-07-31

Applicant: LG INNOTEK CO., LTD.

Inventor： Jae Wan Park ,  Jung Hwan Bang ,  Sin Ae Jang ,  Jong Seon Jeong ,  Dong Keun Lee ,  Kyoung Jong Yoo

IPC: H01L41/113 ,  G06K9/00 ,  H01L41/047

CPC classification number: H01L41/1132 ,  G06K9/00013 ,  G06K9/0002 ,  G06K9/0004 ,  H01L41/047 ,  H01L41/0477

Abstract: A fingerprint sensor includes a substrate, a first electrode on the substrate, a piezoelectric layer on the first electrode, and a second electrode on the piezoelectric layer.

公开(公告)号：US20140335328A1

公开(公告)日：2014-11-13

申请号：US14444740

申请日：2014-07-28

Applicant: LG INNOTEK CO., LTD.

Inventor： Young Jae Lee ,  Kyoung Jong Yoo ,  Jun Lee ,  Jin Su Kim ,  Jae Wan Park

IPC: C23C14/00 ,  B22F1/00 ,  C23C16/01

CPC classification number: C23C14/0005 ,  B22F1/0044 ,  B22F9/16 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C04B35/622 ,  C23C16/01 ,  C30B11/12 ,  C30B29/60 ,  H01L29/0673 ,  H01L29/66469 ,  H01L29/775 ,  Y10S977/888 ,  Y10S977/89 ,  Y10T428/24802 ,  Y10T428/298

Abstract: Provided is a nanowire manufacturing substrate, comprising a grid base layer on a substrate and a grid pattern formed by patterning the grid base layer, the grid pattern being disposed to produce a nanowire on a surface thereof. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.

Abstract translation: 提供了一种纳米线制造衬底，其包括在衬底上的栅格基层和通过图案化栅格基底层而形成的栅格图案，栅格图案被设置为在其表面上产生纳米线。 根据本发明，可以通过控制湿蚀刻工艺时间段来调节纳米线的宽度和高度，并且可以以低成本在室温下制造纳米线，可以大量制造纳米线，并且纳米线 即使在大规模生产的情况下也可以制造。