公开(公告)号：US10422929B2

公开(公告)日：2019-09-24

申请号：US15745934

申请日：2016-07-20

Applicant: LG INNOTEK CO., LTD.

Inventor： Na Young Kwon ,  Jin Mi Noh ,  Seok Bae ,  Young Jae Lee ,  Jong Hyuk Lee ,  Hyun Ji Lee ,  Hee Jung Lee

IPC: G02B1/18 ,  C08L101/02 ,  C09D5/00 ,  C09D201/10 ,  C09D7/65 ,  G02B27/00 ,  C08K3/02 ,  G02B7/02

Abstract: A lens according to an embodiment of the present invention comprises: a substrate; and a hydrophilic coating layer formed on the substrate and containing a polymer having a hydrophilic functional group. Accordingly, a lens having ultra-hydro-philicity and excellent abrasion resistance, and a lens assembly and a camera module including the same can be obtained.

公开(公告)号：US09695499B2

公开(公告)日：2017-07-04

申请号：US14444740

申请日：2014-07-28

Applicant: LG INNOTEK CO., LTD.

Inventor： Young Jae Lee ,  Kyoung Jong Yoo ,  Jun Lee ,  Jin Su Kim ,  Jae Wan Park

IPC: C23C14/00 ,  H01L29/06 ,  C30B11/12 ,  C30B29/60 ,  B22F9/16 ,  C04B35/622 ,  B82Y10/00 ,  B22F1/00 ,  C23C16/01 ,  B82Y30/00 ,  B82Y40/00 ,  H01L29/66 ,  H01L29/775

CPC classification number: C23C14/0005 ,  B22F1/0044 ,  B22F9/16 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C04B35/622 ,  C23C16/01 ,  C30B11/12 ,  C30B29/60 ,  H01L29/0673 ,  H01L29/66469 ,  H01L29/775 ,  Y10S977/888 ,  Y10S977/89 ,  Y10T428/24802 ,  Y10T428/298

Abstract: Provided is a nanowire manufacturing substrate, comprising a grid base layer on a substrate and a grid pattern formed by patterning the grid base layer, the grid pattern being disposed to produce a nanowire on a surface thereof. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.

公开(公告)号：US11462959B2

公开(公告)日：2022-10-04

申请号：US16492985

申请日：2018-04-11

Applicant: LG INNOTEK CO., LTD.

Inventor： Jong Soo Han ,  Seok Bae ,  Young Jae Lee ,  Dong Hyeok Choi ,  Jung Eun Lee

IPC: H02K1/27 ,  H01F1/055 ,  H01F41/02 ,  H01F1/153

Abstract: A permanent magnet of an embodiment comprises: a base magnet represented by a-b-c (a includes a rare earth-based element, b includes a transition element, and c includes boron (B)); and a coating layer coated on a surface of the base magnet, wherein the coating layer comprises a compound containing a metal having magnetism, the compound including: a phosphor (P); and a metal belonging to the fourth period in the periodic table.

公开(公告)号：US10437362B2

公开(公告)日：2019-10-08

申请号：US15025255

申请日：2014-08-21

Applicant: LG INNOTEK CO., LTD.

Inventor： Joon Rak Choi ,  Hyung Min Sohn ,  Sun Young Lee ,  Young Jae Lee ,  Soo Kwang Yoon ,  Hyun Seok Lim ,  Gwang Hei Choi

IPC: G06F3/041

Abstract: A touch window according to one embodiment comprises: a substrate having an effective area and an ineffective area; a sensing electrode arranged in the effective area and sensing a position; and a wiring arranged in the effective area and the ineffective area and electrically connecting to the sensing electrode, wherein the wiring comprises a first wiring and a second wiring such that the first wiring and the second wiring are vertically arranged.

公开(公告)号：US20140272316A1

公开(公告)日：2014-09-18

申请号：US14358701

申请日：2012-12-11

Applicant: LG INNOTEK CO., LTD.

Inventor： Jun Lee ,  Kyoung Jong Yoo ,  Young Jae Lee ,  Jin Su Kim

IPC: H01L23/498 ,  H05K1/03

CPC classification number: H01L23/49894 ,  B82Y30/00 ,  G03F7/002 ,  G06F3/041 ,  G06F2203/04103 ,  H01L2924/0002 ,  H05K1/036 ,  Y10T428/24612 ,  H01L2924/00

Abstract: Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.

Abstract translation: 提供一种具有纳米图案的透明基板及其制造方法，其能够容易地在透明基板上形成纳米图案，并且通过形成由透明的树脂层形成的具有适合于大尺寸基板的纳米图案 材料在透明基板上; 形成由形成有多个格栅图案的第一图案区域和第二图案区域构成的至少一个以上的单位图案部分，以及形成在第一图案区域和第二图案区域之间的突起图案，树脂层 ; 并在突起图案上形成纳米尺度的金属层。

公开(公告)号：US10175800B2

公开(公告)日：2019-01-08

申请号：US15504099

申请日：2015-10-01

Applicant: LG INNOTEK CO., LTD.

Inventor： Young Jae Lee ,  Hyun Seok Lim ,  Soo Kwang Yoon

IPC: G06F3/041 ,  G06F3/044 ,  G02F1/1333 ,  G02F1/1343 ,  H01L27/32

Abstract: An electrode member according to an embodiment includes a first resin layer; and an electrode layer on the first resin layer, wherein the first resin layer has a thickness in the range of 1 μm to 25 μm.

公开(公告)号：US09536819B2

公开(公告)日：2017-01-03

申请号：US14358701

申请日：2012-12-11

Applicant: LG INNOTEK CO., LTD.

Inventor： Jun Lee ,  Kyoung Jong Yoo ,  Young Jae Lee ,  Jin Su Kim

IPC: H01L23/498 ,  H05K1/03 ,  G03F7/00 ,  B82Y30/00

CPC classification number: H01L23/49894 ,  B82Y30/00 ,  G03F7/002 ,  G06F3/041 ,  G06F2203/04103 ,  H01L2924/0002 ,  H05K1/036 ,  Y10T428/24612 ,  H01L2924/00

Abstract: Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.

Abstract translation: 提供一种具有纳米图案的透明基板及其制造方法，其能够容易地在透明基板上形成纳米图案，并且通过形成由透明的树脂层形成的具有适合于大尺寸基板的纳米图案 材料在透明基板上; 形成由形成有多个格栅图案的第一图案区域和第二图案区域构成的至少一个以上的单位图案部分，以及形成在第一图案区域和第二图案区域之间的突起图案，树脂层 ; 并在突起图案上形成纳米尺度的金属层。

公开(公告)号：US09496215B2

公开(公告)日：2016-11-15

申请号：US14358701

申请日：2012-12-11

Applicant: LG INNOTEK CO., LTD.

Inventor： Jun Lee ,  Kyoung Jong Yoo ,  Young Jae Lee ,  Jin Su Kim

IPC: H01L23/498 ,  H05K1/03 ,  G03F7/00 ,  B82Y30/00

Abstract: Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.

公开(公告)号：US09456501B2

公开(公告)日：2016-09-27

申请号：US14365506

申请日：2012-12-06

Applicant: LG INNOTEK CO., LTD.

Inventor： Young Jae Lee ,  Kyoung Jong Yoo ,  Jin Su Kim ,  Jun Lee

IPC: H05K1/09 ,  H05K3/46 ,  H05K3/16 ,  H05K3/00 ,  B81C99/00 ,  H01L29/06 ,  H05K1/02 ,  H05K3/06 ,  H05K3/10 ,  H05K3/14

CPC classification number: H05K3/007 ,  B81C99/008 ,  H01L29/0669 ,  H05K1/0274 ,  H05K1/0296 ,  H05K1/09 ,  H05K3/067 ,  H05K3/101 ,  H05K3/146 ,  H05K3/16 ,  H05K3/46 ,  H05K3/4685 ,  H05K2201/09227

Abstract: Provided is a method of manufacturing a nanowire, including: forming a plurality of grid patterns on a grid base layer; forming a sacrificial layer on the grid base layer on which the grid patterns are formed; producing a nanowire grid structure by forming a nanowire base layer on the sacrificial layer; forming a nanowire by wet etching the nanowire base layer; and separating the grid patterns from the nanowire by etching the sacrificial layer.

Abstract translation: 提供一种制造纳米线的方法，包括：在网格基底层上形成多个网格图案; 在其上形成网格图案的网格基底层上形成牺牲层; 通过在牺牲层上形成纳米线基底层来产生纳米线栅格结构; 通过湿法蚀刻纳米线基层形成纳米线; 并通过蚀刻牺牲层将网格图案与纳米线分离。

公开(公告)号：US20150000963A1

公开(公告)日：2015-01-01

申请号：US14365506

申请日：2012-12-06

Applicant: LG INNOTEK CO., LTD.

Inventor： Young Jae Lee ,  Kyoung Jong Yoo ,  Jin Su Kim ,  Jun Lee

IPC: H05K3/00 ,  H05K1/02 ,  H05K3/16 ,  H05K3/06 ,  H05K3/10 ,  H05K3/14 ,  H05K1/09 ,  H05K3/46

CPC classification number: H05K3/007 ,  B81C99/008 ,  H01L29/0669 ,  H05K1/0274 ,  H05K1/0296 ,  H05K1/09 ,  H05K3/067 ,  H05K3/101 ,  H05K3/146 ,  H05K3/16 ,  H05K3/46 ,  H05K3/4685 ,  H05K2201/09227

Abstract: Provided is a method of manufacturing a nanowire, including: forming a plurality of grid patterns on a grid base layer; forming a sacrificial layer on the grid base layer on which the grid patterns are formed; producing a nanowire grid structure by forming a nanowire base layer on the sacrificial layer; forming a nanowire by wet etching the nanowire base layer; and separating the grid patterns from the nanowire by etching the sacrificial layer. Thus, the method can be provided with the following advantages; Because a wet etching time is adjusted, a width and a height of the nanowire to be produced can be adjusted; the nanowire can be produced at room temperature with a low cost; the nanowire can be produced in large quantities; and in spite of the mass production, the nanowire having high uniformity can be produced.

Abstract translation: 提供一种制造纳米线的方法，包括：在网格基底层上形成多个网格图案; 在其上形成网格图案的网格基底层上形成牺牲层; 通过在牺牲层上形成纳米线基底层来产生纳米线栅格结构; 通过湿法蚀刻纳米线基层形成纳米线; 并通过蚀刻牺牲层将网格图案与纳米线分离。 因此，该方法可以具有以下优点： 由于调整了湿蚀刻时间，因此能够调整生成的纳米线的宽度和高度。 纳米线可以在室温下以低成本生产; 纳米线可以大量生产; 尽管大量生产，但是可以生产具有高均匀性的纳米线。