Abstract:
Provided is a nanowire manufacturing substrate, comprising a grid base layer on a substrate and a grid pattern formed by patterning the grid base layer, the grid pattern being disposed to produce a nanowire on a surface thereof. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.
Abstract:
A light emitting device according to the embodiment includes touch window including: a substrate; and an electrode part on the substrate, wherein the electrode part includes: a first sub-pattern; an electrode layer on the first sub-pattern; and a second sub-pattern close to the first sub-pattern, and wherein a boundary area between the electrode layer and the first sub-pattern is larger than a boundary area between the substrate and the first sub-pattern. A light emitting device package according to the embodiment includes a touch window including: a substrate; and an electrode part on the substrate; wherein the electrode part includes: a first sub-pattern; an electrode layer on the first sub-pattern; and a second sub-pattern close to the first sub-pattern, and wherein a line width of the first sub-pattern is changed according to a height of the first sub-pattern.
Abstract:
A touch window may include a substrate, and an electrode part on the substrate to detect a position. The electrode part includes a first sub-pattern, a second sub-pattern adjacent to the first sub-pattern, a first electrode layer on the first sub-pattern, and a second electrode layer on the second sub-pattern. Another touch window includes a substrate, and an electrode part on the substrate to detect a position, the electrode part includes a first sub-pattern, a second sub-pattern adjacent to the first sub-pattern, an electrode layer on the first sub-pattern, a first anti-reflective layer on the first sub-pattern, and a second anti-reflective layer on the second sub-pattern.
Abstract:
Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.
Abstract:
Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.
Abstract:
Provided is a method of manufacturing a nanowire, including: forming a plurality of grid patterns on a grid base layer; forming a sacrificial layer on the grid base layer on which the grid patterns are formed; producing a nanowire grid structure by forming a nanowire base layer on the sacrificial layer; forming a nanowire by wet etching the nanowire base layer; and separating the grid patterns from the nanowire by etching the sacrificial layer.
Abstract:
Disclosed is a touch window. The touch window includes: a substrate; a sensing electrode on the substrate; and a reflection protective layer on the sensing electrode, wherein a reflectance of the reflection protective layer is higher than 0% and equal to or less than 20%.
Abstract:
Provided is a method of manufacturing a nanowire, including: forming a plurality of grid patterns on a grid base layer; forming a sacrificial layer on the grid base layer on which the grid patterns are formed; producing a nanowire grid structure by forming a nanowire base layer on the sacrificial layer; forming a nanowire by wet etching the nanowire base layer; and separating the grid patterns from the nanowire by etching the sacrificial layer. Thus, the method can be provided with the following advantages; Because a wet etching time is adjusted, a width and a height of the nanowire to be produced can be adjusted; the nanowire can be produced at room temperature with a low cost; the nanowire can be produced in large quantities; and in spite of the mass production, the nanowire having high uniformity can be produced.
Abstract:
Disclosed is a touch panel. The touch panel includes a substrate, and an electrode part formed in a mesh shape on the substrate. The electrode part includes a resin layer comprising first and second sub-patterns, and a transparent electrode on the first sub-pattern. A ratio of a width of the first sub-pattern to a width of the second sub-pattern is in a range of 1:0.01 to 1:0.5.
Abstract:
Disclosed is a touch panel. The touch panel includes a substrate, and an electrode part formed in a mesh shape on the substrate. The electrode part includes a resin layer comprising first and second sub-patterns, and a transparent electrode on the first sub-pattern. A ratio of a width of the first sub-pattern to a width of the second sub-pattern is in a range of 1:0.01 to 1:0.5.