摘要:
The present invention relates to a photoelectrical feedback sensing system. A first light signal passes through the sensing apparatus. A second light signal corresponding to a characteristic of a sample within the sensing apparatus is outputted from the sensing apparatus. The first photo detector receives the first light signal and outputs a first electric signal corresponding to the intensity of the first light signal. The second photo detector outputs a second electric signal corresponding to the intensity of the second light signal. A driving signal is generated by the micro-processor to drive the light-emitting unit. The micro-processor receives the second electric signal and converts the second electric signal into a digital signal. The feedback circuit modulates the driving signal for maintaining the optical stability of the first light signal so that the sensing system is less affected by environmental temperature fluctuation and noise interferences.
摘要:
The present invention relates to a photoelectrical feedback sensing system. A first light signal passes through the sensing apparatus. A second light signal corresponding to a characteristic of a sample within the sensing apparatus is outputted from the sensing apparatus. The first photo detector receives the first light signal and outputs a first electric signal corresponding to the intensity of the first light signal. The second photo detector outputs a second electric signal corresponding to the intensity of the second light signal. A driving signal is generated by the micro-processor to drive the light-emitting unit. The micro-processor receives the second electric signal and converts the second electric signal into a digital signal. The feedback circuit modulates the driving signal for maintaining the optical stability of the first light signal so that the sensing system is less affected by environmental temperature fluctuation and noise interferences.
摘要:
An implanting method for forming a photodiode comprises providing a substrate with a first conductivity, growing an epitaxial layer on the substrate, implanting ions with a second conductivity in the epitaxial layer from a front side of the substrate and implanting ions with the first conductivity in the epitaxial layer from the front side of the substrate to form a photo active region adjacent to the front side and a photo inactive region underneath the photo active region. By employing the implanting method, an average doping density of the photo active region is approximately ten times more than an average doping density of the photo inactive region.
摘要:
The present invention discloses a LPR sensing device and a LPR sensing system comprising a LPR sensing device, a light source, a detecting unit and a processing unit. The LPR sensing device comprises a sensing substrate and a noble metal nanoparticle layer, and the noble metal nanoparticle layer is disposed on the sensing substrate and has noble metal nanoparticles with diameter of 2˜12 nm. An analyte adsorbed on the surface of the noble metal nanoparticle layer generates a dielectric environmental change, resulting in a change of the LPR band. Comparing noble metal nanoparticles with different particle diameters, small noble metal nanoparticles provide better sensing sensitivity to a compound with a small molecular weight.
摘要:
A backside illuminated CMOS image sensor comprises an extended photo active region formed over a substrate using a first high energy ion implantation process and an isolation region formed over the substrate using a second high energy ion implantation process. The extended photo active region is enclosed by the isolation region, which has a same depth as the extended photo active region. The extended photo active region helps to increase the number of photons converted into electrons so as to improve quantum efficiency.
摘要:
An implanting method for forming a photodiode comprises providing a substrate with a first conductivity, growing an epitaxial layer on the substrate, implanting ions with a second conductivity in the epitaxial layer from a front side of the substrate and implanting ions with the first conductivity in the epitaxial layer from the front side of the substrate to form a photo active region adjacent to the front side and a photo inactive region underneath the photo active region. By employing the implanting method, an average doping density of the photo active region is approximately ten times more than an average doping density of the photo inactive region.
摘要:
A backside illuminated CMOS image sensor comprises an extended photo active region formed over a substrate using a first high energy ion implantation process and an isolation region formed over the substrate using a second high energy ion implantation process. The extended photo active region is enclosed by the isolation region, which has a same depth as the extended photo active region. The extended photo active region helps to increase the number of photons converted into electrons so as to improve quantum efficiency.