公开(公告)号：US07826672B2

公开(公告)日：2010-11-02

申请号：US12554083

申请日：2009-09-04

申请人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

发明人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

IPC分类号： G06K9/46 ,  H04N1/32 ,  H03M7/00

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.

摘要翻译： 提供一种包括具有发射部分的设备，存储器和字典解压缩器的系统。 具有发射部分的装置被配置为产生图案化的束。 存储器被配置为存储要由图案化的波束在表面上形成的包括两组重复图案特征的所请求的剂量图案的压缩表示。 字典解压缩器至少部分地解压缩压缩表示。 字典解压缩器包括第一字典存储器，其被配置为存储对应于两组重复图案特征的第一组的图案数据，以及第二字典存储器，其被配置为存储对应于两组重复图案特征的第二组的图案数据。 第一组中的重复图案特征具有与第二组中的重复图案特征相比具有一个或多个不同的特征。 还提供了相关方法。

公开(公告)号：US07606430B2

公开(公告)日：2009-10-20

申请号：US11214055

申请日：2005-08-30

申请人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

发明人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

IPC分类号： G06K9/46 ,  H04N1/32 ,  H03M7/00

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompresses the compressed representation. The dictionary decompressor comprises an external dictionary memory, a first dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the external dictionary memory, portions of pattern data corresponding to references to the external dictionary memory contained in the compressed representation, and a second dictionary decoder having an internal dictionary memory, the second dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the internal dictionary memory, portions of pattern data corresponding to references to the internal dictionary memory contained in compressed representation.

摘要翻译： 光刻设备包括调制辐射束的单独可控元件的阵列，压缩图案存储器，其通过调制束存储要在衬底上形成的所请求的剂量图案的压缩表示;以及字典解压缩器，至少 部分解压缩压缩表示。 字典解压缩器包括外部字典存储器，第一字典解码器，其通过从外部字典存储器提取对应于对包含在所述外部字典存储器中的外部字典存储器的引用的图案数据的至少部分来解压缩压缩表示的至少一部分 压缩表示和具有内部字典存储器的第二字典解码器，所述第二字典解码器通过从内部字典存储器提取对应于对内部的引用的模式数据的部分来至少部分地解压缩压缩表示的至少一部分 包含在压缩表示中的字典存储器。

公开(公告)号：US20090324111A1

公开(公告)日：2009-12-31

申请号：US12554083

申请日：2009-09-04

申请人： Lambertus Gerardus Maria KESSELS ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

发明人： Lambertus Gerardus Maria KESSELS ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

IPC分类号： G06K9/36

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.

摘要翻译： 提供一种包括具有发射部分的设备，存储器和字典解压缩器的系统。 具有发射部分的装置被配置为产生图案化的束。 存储器被配置为存储要由图案化的波束在表面上形成的包括两组重复图案特征的所请求的剂量图案的压缩表示。 字典解压缩器至少部分地解压缩压缩表示。 字典解压缩器包括第一字典存储器，其被配置为存储对应于两组重复图案特征的第一组的图案数据，以及第二字典存储器，其被配置为存储对应于两组重复图案特征的第二组的图案数据。 第一组中的重复图案特征具有与第二组中的重复图案特征相比具有一个或多个不同的特征。 还提供了相关方法。

公开(公告)号：US07317510B2

公开(公告)日：2008-01-08

申请号：US11020643

申请日：2004-12-27

申请人： Marcel Bontekoe ,  Patricius Aloysius Jacobus Tinnemans ,  Lambertus Gerardus Maria Kessels ,  Marco Cornelis Jacobus Martinus Van Hassel ,  Wouter Frans Willem Mulckhuyse

发明人： Marcel Bontekoe ,  Patricius Aloysius Jacobus Tinnemans ,  Lambertus Gerardus Maria Kessels ,  Marco Cornelis Jacobus Martinus Van Hassel ,  Wouter Frans Willem Mulckhuyse

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70291 ,  G03F7/70283 ,  G03F7/70508

摘要： A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投影为辐射子束阵列和被配置成调制辐射子束的独立可控元件的阵列，以在衬底上形成所请求的剂量图案。 所要求的剂量模式随着时间的推移从局部暴露的阵列中建立起来，其中至少相邻的局部曝光在基本上不同的时间成像，并且其中每个局部曝光由辐射的子束之一产生。 光刻设备还包括光栅化器装置，其被设置为将定义所请求的剂量图案的数据转换成在图案内的相应的点序列处表示所请求的剂量的数据序列，以及数据操纵装置，被配置为接收数据序列， 构成适于控制单独可控元件阵列的控制信号。

公开(公告)号：US08508715B2

公开(公告)日：2013-08-13

申请号：US12915566

申请日：2010-10-29

申请人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

发明人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.

摘要翻译： 使用装置和方法在基板上形成图案。 该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为子光束阵列。 图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。 数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 在各种示例中，也可以使用过滤器。

公开(公告)号：US08259285B2

公开(公告)日：2012-09-04

申请号：US11638675

申请日：2006-12-14

申请人： Kars Zeger Troost ,  Jason Douglas Hintersteiner ,  Patricius Aloysius Jacobus Tinnemans ,  Wenceslao A. Cebuhar ,  Ronald P. Albright ,  Bernardo Kastrup

发明人： Kars Zeger Troost ,  Jason Douglas Hintersteiner ,  Patricius Aloysius Jacobus Tinnemans ,  Wenceslao A. Cebuhar ,  Ronald P. Albright ,  Bernardo Kastrup

IPC分类号： G03B27/42

CPC分类号： G03F7/70791 ,  G03F1/36 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70558

摘要： An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.

摘要翻译： 因此，产生用于控制无掩模系统和系统中的单独可控元件的阵列的元件的致动的优化设定点数据的迭代方法。 优化是基于可以利用以下一个或多个因素的设备结构的估计：投影系统的低通特性，照明系统的配置以及处理窗口属性。

公开(公告)号：US20110231167A1

公开(公告)日：2011-09-22

申请号：US13047185

申请日：2011-03-14

申请人： Hugo Augustinus Joseph CRAMER ,  Patricius Aloysius Jacobus Tinnemans

发明人： Hugo Augustinus Joseph CRAMER ,  Patricius Aloysius Jacobus Tinnemans

IPC分类号： G06F17/10 ,  G03B27/54

CPC分类号： G03B27/52 ,  G03F7/70625 ,  G03F7/70641

摘要： A method, a lithographic apparatus, and a computer-readable medium provide a model of a metrology tool to determine a measurement error and/or covariance of particular parameters, such as the critical dimension and the sidewall angle, of a number of targets, such as gratings. The model can include at least one measurement error source. The method can include using a metrology tool to measure each target and using the model to determine the measurement error of the measured parameters of the particular target when measured by said metrology tool. The value of the measured parameter along with the corresponding measurement error is then determined in the metrology tool output for each particular target, and can be used in exposure focus and dose control in a lithographic process.

摘要翻译： 方法，光刻设备和计算机可读介质提供计量工具的模型，以确定多个目标的特定参数（例如临界尺寸和侧壁角）的测量误差和/或协方差，例如 作为光栅。 该模型可以包含至少一个测量误差源。 该方法可以包括使用计量工具来测量每个目标并且使用该模型来确定由所述计量工具测量时特定目标的测量参数的测量误差。 然后在每个特定目标的计量工具输出中确定测量参数的值以及相应的测量误差，并可用于光刻过程中的曝光聚焦和剂量控制。

公开(公告)号：US08009270B2

公开(公告)日：2011-08-30

申请号：US11689926

申请日：2007-03-22

申请人： Paul Antoon Cyriel Desmedt ,  Patricius Aloysius Jacobus Tinnemans ,  Minne Cuperus

发明人： Paul Antoon Cyriel Desmedt ,  Patricius Aloysius Jacobus Tinnemans ,  Minne Cuperus

IPC分类号： G03B27/42

CPC分类号： G03F7/70475 ,  G03F7/70283 ,  G03F7/70291

摘要： A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.

摘要翻译： 一种器件制造方法，包括将图案应用于独立可控元件的多个阵列，使得它们调制辐射束，并将经调制的辐射束投影到衬底上。 应用于独立可控元件的阵列的图案被布置成使得预定数量的背景辐射被包括在调制的辐射束中。 背景辐射的预定量对于阵列上的不同位置是不同的。

公开(公告)号：US20110157570A1

公开(公告)日：2011-06-30

申请号：US12850487

申请日：2010-08-04

申请人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

发明人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US07868998B2

公开(公告)日：2011-01-11

申请号：US12216126

申请日：2008-06-30

申请人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

发明人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。