摘要:
Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.
摘要:
Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.
摘要:
Silyl substituted polymers of polycycloolefins are provided as well as catalyst systems for their preparation. The polymers of the invention include polycyclic repeat units that contain pendant silyl functional groups represented by the following formulae: ##STR1## wherein A is a divalent radical selected from the following structures: ##STR2## R.sup.9 independently represents hydrogen, methyl, or ethyl; R.sup.10, R.sup.11, and R.sup.12 independently represent halogen, linear or branched (C.sub.1 to C.sub.20) alkyl, linear or branched (C.sub.1 to C.sub.20) alkoxy, linear or branched (C.sub.1 to C.sub.20) alkyl carbonyloxy, (C.sub.1 to C.sub.20) alkyl peroxy, and substituted or unsubstituted (C.sub.6 to C.sub.20) aryloxy; R.sup.10, R.sup.11, and R.sup.12 together with the silicon atom to which they are attached form the group: ##STR3## n is a number from 0 to 5; and n' is 0 or 1; and n" is a number from 0 to 10.
摘要翻译:提供聚环烯烃的甲硅烷基取代聚合物以及用于其制备的催化剂体系。 本发明的聚合物包括含有由下式表示的侧链甲硅烷基官能团的多环重复单元:其中A是选自以下结构的二价基团:R9独立地表示氢,甲基或乙基; R10,R11和R12独立地表示直链或支链(C1至C20)烷基,直链或支链(C1至C20)烷氧基,直链或支链(C1至C20)烷基羰基氧基,(C1至C20)烷基过氧基),和 取代或未取代的(C6〜C20)芳氧基; R 10,R 11和R 12与它们所连接的硅原子一起形成基团:n为0至5的数; 并且n'为0或1; n“是从0到10的数字。
摘要:
Silyl substituted polymers of polycycloolefins are provided as well as catalyst systems for their preparation. The polymers of the invention include polycyclic repeat units that contain pendant silyl functional groups represented by the following formulae: ##STR1## wherein A is a divalent radical selected from the following structures: ##STR2## R.sup.9 independently represents hydrogen, methyl, or ethyl; R.sup.10, R.sup.11, and R.sup.12 independently represent halogen, linear or branched (C.sub.1 to C.sub.20) alkyl, linear or branched (C.sub.1 to C.sub.20) alkoxy, linear or branched (C.sub.1 to C.sub.20) alkyl carbonyloxy, (C.sub.1 to C.sub.20) alkyl peroxy, and substituted or unsubstituted (C.sub.6 to C.sub.20) aryloxy; R.sup.10, R.sup.11, and R.sup.12 together with the silicon atom to which they are attached form the group: ##STR3## n is a number from 0 to 5; and n' is 0 or 1; and n" is a number from 0 to 10.
摘要:
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source. The polymer repeating units are polymerized from polycyclic monomers in the presence of single or multicomponent catalyst systems containing a Group VIII metal
摘要:
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
摘要:
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
摘要:
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
摘要:
A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.
摘要:
The present invention relates to a photodefinable dielectric composition comprising a photoinitiator and a polycyclic addition polymer comprising polycyclic repeating units that contain pendant silyl functionalities containing hydrolyzable substituents. Upon exposure to a radiation source the photoinitiator catalyzes the hydrolysis of the hydrolyzable groups to effect the cure of the polymer and adhesion of the polymer to desired substrates.