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1.发明申请Norbornene-type polymers, compositions thereof and lithographic processes using such compositions 审中-公开降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法公开(公告)号：US20060235174A1
公开(公告)日：2006-10-19
申请号：US11358903
申请日：2006-02-21
申请人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
IPC分类号： C08F4/80 , C08F36/00 , C08F10/00 , C08F132/08 , C08F236/00 , C08F136/00 , C08F232/08 , C08F32/08
CPC分类号： G03F7/11 , C08F232/08 , C08G61/06 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译： 本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。 更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。
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2.发明申请Norbornene-type polymers, compositions thereof and lithographic process using such compositions 有权降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法公开(公告)号：US20060234164A1
公开(公告)日：2006-10-19
申请号：US11359880
申请日：2006-02-22
申请人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
IPC分类号： G03C5/00
CPC分类号： G03F7/0395 , C08F232/08 , G03F7/0046 , G03F7/11 , G03F7/2041 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译： 本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。 更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。
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公开(公告)号：US08715900B2
公开(公告)日：2014-05-06
申请号：US13550586
申请日：2012-07-16
CPC分类号： G03F7/0233 , C08F32/08 , C08F222/06 , C08F232/08 , C09D135/00 , G03F7/022 , G03F7/0226 , G03F7/027 , G03F7/038 , G03F7/0384
摘要： Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
摘要翻译： 公开了可用于形成包含这种共聚物的自显影膜的共聚物及其组合物。 这种共聚物包括降冰片烯型重复单元和马来酸酐型重复单元，其中至少一些这样的马来酸酐型重复单元已经开环。 由这种共聚物组合物形成的膜提供用于微电子和光电子器件的自成像，低k热稳定层。
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公开(公告)号：US20130017488A1
公开(公告)日：2013-01-17
申请号：US13550586
申请日：2012-07-16
CPC分类号： G03F7/0233 , C08F32/08 , C08F222/06 , C08F232/08 , C09D135/00 , G03F7/022 , G03F7/0226 , G03F7/027 , G03F7/038 , G03F7/0384
摘要： Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
摘要翻译： 公开了可用于形成包含这种共聚物的自显影膜的共聚物及其组合物。 这种共聚物包括降冰片烯型重复单元和马来酸酐型重复单元，其中至少一些这样的马来酸酐型重复单元已经开环。 由这种共聚物组合物形成的膜提供用于微电子和光电子器件的自成像，低k热稳定层。
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5.发明授权Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权可自成像的成膜聚合物，其组合物和由其制成的器件和结构公开(公告)号：US08753790B2
公开(公告)日：2014-06-17
申请号：US12803602
申请日：2010-06-30
申请人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
CPC分类号： C08G61/08 , C08G2261/3324 , C08G2261/418 , C08L65/00 , G03F7/0233 , G03F7/0382
摘要： Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone imaging or negative tone. The films formed thereby are useful in the forming of microelectronic and optoelectronics devices.
摘要翻译： 根据本发明的实施方案包括包含降冰片烯型聚合物并且可以配制为正色调成像或负色调的自成像成膜组合物。 由此形成的膜可用于形成微电子和光电子器件。
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6.发明申请Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权可自成像的成膜聚合物，其组合物和由其制成的装置和结构公开(公告)号：US20110104614A1
公开(公告)日：2011-05-05
申请号：US12803602
申请日：2010-06-30
申请人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
CPC分类号： C08G61/08 , C08G2261/3324 , C08G2261/418 , C08L65/00 , G03F7/0233 , G03F7/0382
摘要： Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone imaging or negative tone. The films formed thereby are useful in the forming of microelectronic and optoelectronics devices.
摘要翻译： 根据本发明的实施方案包括包含降冰片烯型聚合物并且可以配制为正色调成像或负色调的自成像成膜组合物。 由此形成的膜可用于形成微电子和光电子器件。
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公开(公告)号：US20050153240A1
公开(公告)日：2005-07-14
申请号：US11033010
申请日：2005-01-10
申请人： Xiaoming Wu , Larry Rhodes , Lawrence Seger
发明人： Xiaoming Wu , Larry Rhodes , Lawrence Seger
CPC分类号： G03F7/0395 , C08G61/06 , Y10S430/106 , Y10S430/111
摘要： The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
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8.发明申请Norbornene-type monomers and polymers containing pendent lactone or sultone groups 有权含降冰片烯型单体和含有内酯或磺内酯的聚合物公开(公告)号：US20050153233A1
公开(公告)日：2005-07-14
申请号：US10757119
申请日：2004-01-14
申请人： Xiaoming Wu , Larry Rhodes , Lawrence Seger
发明人： Xiaoming Wu , Larry Rhodes , Lawrence Seger
CPC分类号： G03F7/0395 , C08G61/06 , Y10S430/106 , Y10S430/111
摘要： The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
摘要翻译： 所公开的发明涉及含有侧链内酯或磺内酯基团的新型去偶型单体。 本发明还涉及含有侧链内酯或磺内酯基团的去偶型聚合物和共聚物。 这些聚合物和共聚物可用于制备可光成像材料。 光可塑材料特别适合用于193和157nm光刻中的光致抗蚀剂组合物。
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9.发明申请Vinyl addition polycylic olefin polymers prepared using non-olefinic chain transfer agents and uses thereof 有权使用非烯烃链转移剂制备的乙烯基加成聚烯烃聚合物及其用途公开(公告)号：US20070066775A1
公开(公告)日：2007-03-22
申请号：US11517538
申请日：2006-09-07
申请人： Larry Rhodes , Dennis Barnes , Andrew Bell , Brian Bennett , Chun Chang , John-Henry Lipian , Xiaoming Wu
发明人： Larry Rhodes , Dennis Barnes , Andrew Bell , Brian Bennett , Chun Chang , John-Henry Lipian , Xiaoming Wu
IPC分类号： C08F4/80
CPC分类号： C08F2/38 , C08F232/00 , C08F232/08 , Y10S526/905
摘要： A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
摘要翻译： 聚合聚（环状）烯烃单体的方法包括（a）将含有聚（环状）烯烃单体，非烯烃链转移剂和活化剂化合物的单体组合物混合以形成混合物; （b）加热混合物; 和（c）加入含有Ni和/或Pd的聚合催化剂。 非烯烃链转移剂包括一种或多种选自H 2，烷基硅烷，烷基烷氧基硅烷，烷基锗烷，烷基烷氧基锗烷，烷基锡烷和烷基烷氧基烷基的化合物。 活化剂的特征在于具有pKa至少为5的活性氢。所得聚（环状）烯烃聚合物可用于光致抗蚀剂组合物中。
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公开(公告)号：US20120064458A1
公开(公告)日：2012-03-15
申请号：US13206611
申请日：2011-08-10
申请人： Koji CHOKI , Tetsuya Mori , Ramakrishna Ravikiran , Makoto Fujiwara , Keizo Takahama , Kei Watanabe , Hirotaka Nonaka , Yumiko Otake , Andrew Bell , Larry Rhodes , Dino Amoroso , Mutsuhiro Matsuyama
发明人： Koji CHOKI , Tetsuya Mori , Ramakrishna Ravikiran , Makoto Fujiwara , Keizo Takahama , Kei Watanabe , Hirotaka Nonaka , Yumiko Otake , Andrew Bell , Larry Rhodes , Dino Amoroso , Mutsuhiro Matsuyama
IPC分类号： G03F7/004
CPC分类号： G02B6/1221 , C08F232/00 , G02B6/138 , Y10S430/106 , Y10S430/114
摘要： Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.
摘要翻译： 根据本发明的实施例提供了形成这样的结构的波导结构和方法，其中限定了芯和横向相邻的包层区。 本发明的一些实施例提供了波导结构，其中芯部区域被横向相邻的包层区域和包覆层共同包围，并且形成这种结构的方法。
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