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1.发明授权Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权可自成像的成膜聚合物，其组合物和由其制成的器件和结构公开(公告)号：US08753790B2
公开(公告)日：2014-06-17
申请号：US12803602
申请日：2010-06-30
申请人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
CPC分类号： C08G61/08 , C08G2261/3324 , C08G2261/418 , C08L65/00 , G03F7/0233 , G03F7/0382
摘要： Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone imaging or negative tone. The films formed thereby are useful in the forming of microelectronic and optoelectronics devices.
摘要翻译： 根据本发明的实施方案包括包含降冰片烯型聚合物并且可以配制为正色调成像或负色调的自成像成膜组合物。 由此形成的膜可用于形成微电子和光电子器件。
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2.发明申请Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权可自成像的成膜聚合物，其组合物和由其制成的装置和结构公开(公告)号：US20110104614A1
公开(公告)日：2011-05-05
申请号：US12803602
申请日：2010-06-30
申请人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
CPC分类号： C08G61/08 , C08G2261/3324 , C08G2261/418 , C08L65/00 , G03F7/0233 , G03F7/0382
摘要： Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone imaging or negative tone. The films formed thereby are useful in the forming of microelectronic and optoelectronics devices.
摘要翻译： 根据本发明的实施方案包括包含降冰片烯型聚合物并且可以配制为正色调成像或负色调的自成像成膜组合物。 由此形成的膜可用于形成微电子和光电子器件。
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公开(公告)号：US09175123B2
公开(公告)日：2015-11-03
申请号：US13223884
申请日：2011-09-01
申请人： David Christoph Mueller , Toby Cull , Pawel Miskiewicz , Miguel Carrasco-Orozco , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
发明人： David Christoph Mueller , Toby Cull , Pawel Miskiewicz , Miguel Carrasco-Orozco , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
IPC分类号： B32B27/32 , C08F132/08 , C08F232/00 , H01L51/05
CPC分类号： H01L51/052 , C08F32/04 , C08F232/00 , C08L45/00 , H01L51/0035 , H01L51/004 , H01L51/0043 , H01L51/0537 , H01L51/0541 , H01L51/0545 , H01L51/107
摘要： Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.
摘要翻译： 根据本发明的实施方案提供了聚环烯烃在电子器件中的用途，更具体地说，涉及使用这种聚环烯烃作为用于制造电子器件的栅极绝缘体层，包括这种聚环烯烃栅极绝缘体的电子器件以及用于制备 这种多环烯烃栅极绝缘体层和包含这些层的电子器件。
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公开(公告)号：US20120056249A1
公开(公告)日：2012-03-08
申请号：US13223784
申请日：2011-09-01
申请人： David Christoph Mueller , Pawel Miskiewicz , Toby Cull , Piotr Wierzchowiec , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
发明人： David Christoph Mueller , Pawel Miskiewicz , Toby Cull , Piotr Wierzchowiec , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
IPC分类号： B32B27/32 , C08F136/20 , H01L21/336 , C08F232/08 , H01L29/78 , C08F236/20 , C08F132/08
CPC分类号： H01L51/0043 , C08F232/00 , C08L65/00 , C08L2203/20 , H01L51/0035 , H01L51/0529 , H01L51/0541 , H01L51/0545 , Y10T428/31938
摘要： Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.
摘要翻译： 根据本发明的实施方案提供了聚环烯烃在电子器件中的用途，更具体地说，涉及使用这种聚环烯烃作为中间层，其用于制备电子器件的氟聚合物层，包含这种聚环烯夹层的电子器件和 制备这种聚环烯夹层和电子器件。
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公开(公告)号：US09583713B2
公开(公告)日：2017-02-28
申请号：US13223784
申请日：2011-09-01
申请人： David Christoph Mueller , Pawel Miskiewicz , Toby Cull , Piotr Wierzchowiec , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
发明人： David Christoph Mueller , Pawel Miskiewicz , Toby Cull , Piotr Wierzchowiec , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
IPC分类号： B32B27/32 , C08F132/08 , H01L51/00 , C08L65/00 , C08F232/00 , H01L51/05
CPC分类号： H01L51/0043 , C08F232/00 , C08L65/00 , C08L2203/20 , H01L51/0035 , H01L51/0529 , H01L51/0541 , H01L51/0545 , Y10T428/31938
摘要： Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.
摘要翻译： 根据本发明的实施方案提供了聚环烯烃在电子器件中的用途，更具体地说，涉及使用这种聚环烯烃作为中间层，其用于制备电子器件的氟聚合物层，包含这种聚环烯夹层的电子器件和 制备这种聚环烯夹层和电子器件。
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公开(公告)号：US20120056183A1
公开(公告)日：2012-03-08
申请号：US13223884
申请日：2011-09-01
申请人： David Christoph Mueller , Toby Cull , Pawel Miskiewicz , Miguel Carrasco-Orozco , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
发明人： David Christoph Mueller , Toby Cull , Pawel Miskiewicz , Miguel Carrasco-Orozco , Andrew Bell , Edmund Elce , Larry F. Rhodes , Kazuyoshi Fujita , Hendra Ng , Pramod Kandanarachchi , Steven Smith
IPC分类号： H01L29/786 , H01L21/336 , H01L29/04
CPC分类号： H01L51/052 , C08F32/04 , C08F232/00 , C08L45/00 , H01L51/0035 , H01L51/004 , H01L51/0043 , H01L51/0537 , H01L51/0541 , H01L51/0545 , H01L51/107
摘要： Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.
摘要翻译： 根据本发明的实施方案提供了聚环烯烃在电子器件中的用途，更具体地说，涉及使用这种聚环烯烃作为用于制造电子器件的栅极绝缘体层，包括这种聚环烯烃栅极绝缘体的电子器件以及用于制备 这种多环烯烃栅极绝缘体层和包含这些层的电子器件。
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7.发明申请Aqueous Base-Developable Negative-Tone Films Based On Functionalized Norbornene Polymers 有权基于官能化降冰片烯聚合物的水性碱显影负性膜公开(公告)号：US20110070543A1
公开(公告)日：2011-03-24
申请号：US12563627
申请日：2009-09-21
申请人： Brian Knapp , Edmund Elce , Andrew Bell , Cheryl Burns , Sridevi Kaiti , Brian Kocher , Hendra Ng , Yogesh Patel , Masanobu Sakamoto , Xiaoming Wu , Linda Zhang
发明人： Brian Knapp , Edmund Elce , Andrew Bell , Cheryl Burns , Sridevi Kaiti , Brian Kocher , Hendra Ng , Yogesh Patel , Masanobu Sakamoto , Xiaoming Wu , Linda Zhang
CPC分类号： C08L45/00 , C08F232/08 , G03F7/0045 , G03F7/0382 , G03F7/0751 , G03F7/38 , G03F7/40 , Y10S430/106
摘要： Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
摘要翻译： 根据本发明的实施方案包括可用于形成可以被图案化以产生微电子器件，微电子封装，微机电系统，光电子器件和显示器的结构的膜的负性，水性碱显影性，可自我形成的聚合物组合物。
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8.发明授权Aqueous base-developable negative-tone films based on functionalized norbornene polymers 有权基于官能化降冰片烯聚合物的水性底物显影负性膜公开(公告)号：US08580477B2
公开(公告)日：2013-11-12
申请号：US12563627
申请日：2009-09-21
申请人： Brian Knapp , Edmund Elce , Andrew Bell , Cheryl Burns , Sridevi Kaiti , Brian Kocher , Hendra Ng , Yogesh Patel , Masanobu Sakamoto , Xiaoming Wu , Linda Zhang
发明人： Brian Knapp , Edmund Elce , Andrew Bell , Cheryl Burns , Sridevi Kaiti , Brian Kocher , Hendra Ng , Yogesh Patel , Masanobu Sakamoto , Xiaoming Wu , Linda Zhang
CPC分类号： C08L45/00 , C08F232/08 , G03F7/0045 , G03F7/0382 , G03F7/0751 , G03F7/38 , G03F7/40 , Y10S430/106
摘要： Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
摘要翻译： 根据本发明的实施方案包括可用于形成可以被图案化以产生微电子器件，微电子封装，微机电系统，光电子器件和显示器的结构的膜的负性，水性碱显影性，可自我形成的聚合物组合物。
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公开(公告)号：US20080194740A1
公开(公告)日：2008-08-14
申请号：US11949328
申请日：2007-12-03
申请人： Edmund Elce , Andrew Bell , Brian Knapp , Hendra Ng , Larry F. Rhodes , Robert Shick , Wei Zhang , William DiMenna , Saikumar Jayaraman , Jianyong Jin , Rajesh Raja Puthenkovilakom , Ramakrishna Ravikiran , Xiaoming Wu , Etsu Takeuchi
发明人： Edmund Elce , Andrew Bell , Brian Knapp , Hendra Ng , Larry F. Rhodes , Robert Shick , Wei Zhang , William DiMenna , Saikumar Jayaraman , Jianyong Jin , Rajesh Raja Puthenkovilakom , Ramakrishna Ravikiran , Xiaoming Wu , Etsu Takeuchi
IPC分类号： C08K5/45 , C08G73/00 , C08K5/1545
CPC分类号： C08G61/04 , C08F232/08 , G03F7/0388
摘要： A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
摘要翻译： 聚合物包括由式I表示的第一类型的重复单元：其中X选自-CH 2 - ， - CH 2 -CH 2 > - 或-O-; m是0至约5的整数; 并且对于第一类型的重复单元，R 1，R 2，R 3和R 4中的一个，R 4， >是含有马来酰亚胺的基团之一，对于第二类型的重复单元，R 1，R 2，R 3和R 3中的一个，R 3，R 3， 受阻芳族基团，C 8或更高级烷基，C 4或更大的卤代烃基或全卤代羰基，C 7个或更大的芳烷基，或杂原子烃基或卤代烃基。
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公开(公告)号：US08053515B2
公开(公告)日：2011-11-08
申请号：US11949328
申请日：2007-12-03
申请人： Edmund Elce , Andrew Bell , Brian Knapp , Hendra Ng , Larry F. Rhodes , Robert Shick , Wei Zhang , William DiMenna , Saikumar Jayaraman , Jianyong Jin , Rajesh Raja Puthenkovilakom , Ramakrishna Ravikiran , Xiaoming Wu , Etsu Takeuchi
发明人： Edmund Elce , Andrew Bell , Brian Knapp , Hendra Ng , Larry F. Rhodes , Robert Shick , Wei Zhang , William DiMenna , Saikumar Jayaraman , Jianyong Jin , Rajesh Raja Puthenkovilakom , Ramakrishna Ravikiran , Xiaoming Wu , Etsu Takeuchi
IPC分类号： C08G63/60
CPC分类号： C08G61/04 , C08F232/08 , G03F7/0388
摘要： A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
摘要翻译： 聚合物包括由式I表示的第一类型的重复单元：其中X选自-CH 2 - ， - CH 2 -CH 2 - 或-O-; m是0至约5的整数; 并且对于第一类型的重复单元，R 1，R 2，R 3和R 4中的一个是含马来酰亚胺基团之一，并且对于第二类型的重复单元，R 1，R 2，R 3和R 4中的一个是受阻芳族基团， C8或更大的烷基，C4或更大的卤代烃基或全卤代羰基，C7或更高的芳烷基或杂原子烃基或卤代烃基。
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