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1.发明授权Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists 失效原料中的金属离子还原，并使用路易斯碱控制用于阳性光致抗蚀剂中的酚醛清漆树脂的分子量
公开(公告)号：US5476750A
公开(公告)日：1995-12-19
申请号：US999500
申请日：1992-12-29
CPC分类号： C08G8/08 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions and a substantially consistent molecular weight. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了生产具有非常低水平的金属离子和基本上一致的分子量的水不溶性的碱溶性酚醛清漆树脂的方法。 还提供了用于由这种酚醛清漆树脂制造光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
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2.发明授权
公开(公告)号：US5688893A
公开(公告)日：1997-11-18
申请号：US771715
申请日：1996-12-20
CPC分类号： C08G8/08 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了通过调节路易斯碱的浓度来制备具有精确和一致分子量的水不溶性水溶性酚醛清漆树脂的方法。 还提供了用于由这种酚醛清漆树脂制造光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
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公开(公告)号：US5614349A
公开(公告)日：1997-03-25
申请号：US997942
申请日：1992-12-29
CPC分类号： C08G8/08 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了通过调节路易斯碱的浓度来制备具有精确和一致分子量的水不溶性水溶性酚醛清漆树脂的方法。 还提供了用于由这种酚醛清漆树脂制造光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
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4.发明授权Antireflective coating compositions for photoresist compositions and use thereof 失效用于光致抗蚀剂组合物的抗反射涂料组合物及其用途
公开(公告)号：US5994430A
公开(公告)日：1999-11-30
申请号：US841750
申请日：1997-04-30
申请人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
发明人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
IPC分类号： G03F7/11 , C08F8/30 , C08F212/14 , C08L25/18 , C09B69/10 , G03F7/09 , H01L21/027 , C08K5/00
CPC分类号： C09B69/106 , G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含溶剂组合物中的新型聚合物。 本发明还包括在光刻中使用抗反射涂料组合物的方法。 抗反射涂料组合物包含新型聚合物和溶剂组合物，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香族官能团的单元。 溶剂可以是有机的，优选地是低毒性的溶剂，或者它可以是水，其可另外含有其它与水可混溶的有机溶剂。
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公开(公告)号：US5981145A
公开(公告)日：1999-11-09
申请号：US846986
申请日：1997-04-30
申请人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
发明人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
IPC分类号： G03F7/11 , C08F8/00 , C08F8/30 , G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , C08F8/00 , C08F8/30 , C08F12/24 , C08F212/14 , C08F2810/20
摘要： The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.
摘要翻译： 本发明涉及一种适合用作抗反射涂层的新型聚合物或作为用于吸收反射光的光刻胶中的添加剂。 该新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香官能团的单元。 聚合物可溶于有机溶剂中，优选低毒性溶剂，或者它可溶于水，其可另外含有其它与水可混溶的有机溶剂。
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6.发明授权Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom 失效酸性离子交换树脂作为催化剂合成酚醛清漆树脂及其光致抗蚀剂组合物
公开(公告)号：US5665517A
公开(公告)日：1997-09-09
申请号：US587874
申请日：1996-01-11
CPC分类号： C08G8/10 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and a very low level of metal ions, utilizing a solid acid condensation catalyst. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了利用固体酸缩合催化剂生产具有一致分子量和非常低水平的金属离子的水不溶性水溶性酚醛清漆树脂的方法。 还提供了一种用于生产具有来自这种酚醛清漆树脂的非常低水平的金属离子并且使用这种光致抗蚀剂组合物制造半导体器件的光致抗蚀剂组合物的方法。
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公开(公告)号：US07547501B2
公开(公告)日：2009-06-16
申请号：US11538841
申请日：2006-10-05
CPC分类号： C07F5/027 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The present application relates to photoactive materials having the formula wherein C1+ is a cation; each of R30, R31, R32, R33, R34, R35, R36, R37, R38, R39, R40, and R41 are selected from hydrogen, alkyl, alkyl chain optionally containing one or more O atoms, halide, aryl, aralkyl, alkoxyalkyl, cycloalkyl, hydroxyl, and alkoxy, the alkyl, alkyl chain optionally containing one or more O atoms, aryl, aralkyl, alkoxyalkyl, cycloalkyl, and alkoxy groups being unsubstituted or substituted.
摘要翻译： 本申请涉及具有下式的光活性材料：其中C1 +是阳离子; R30，R31，R32，R33，R34，R35，R36，R37，R38，R39，R40和R41各自选自氢，烷基，任选含有一个或多个O原子的烷基链，卤素，芳基，芳烷基，烷氧基烷基 ，环烷基，羟基和烷氧基，烷基，任选地含有一个或多个O原子的烷基，芳基，芳烷基，烷氧基烷基，环烷基和烷氧基是未取代或取代的。
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公开(公告)号：US07537879B2
公开(公告)日：2009-05-26
申请号：US10994745
申请日：2004-11-22
申请人： Francis M. Houlihan , Ralph R. Dammel , Andrew R. Romano , Munirathna Padmanaban , M. Dalil Rahman
发明人： Francis M. Houlihan , Ralph R. Dammel , Andrew R. Romano , Munirathna Padmanaban , M. Dalil Rahman
CPC分类号： G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic moiety protected with acid labile group, and b) a compound capable of producing an acid upon irradiation. The invention also relates to a process of imaging the novel positive photoresist composition.
摘要翻译： 本发明涉及一种对300nm至100nm之间的波长敏感的新型化学放大光致抗蚀剂，并且包括a）一种新型聚合物，其包含不溶于碱性水溶液的聚合物主链的侧基的砜基， 用酸不稳定基团保护的至少一个酸性部分，和b）在照射时能够产生酸的化合物。 本发明还涉及对新型正性光致抗蚀剂组合物进行成像的方法。
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9.发明授权Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds 有权用于深紫外光刻的光致抗蚀剂组合物，其包含光活性化合物的混合物公开(公告)号：US06991888B2
公开(公告)日：2006-01-31
申请号：US10439472
申请日：2003-05-16
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/115
摘要： The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X− is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.
摘要翻译： 本发明涉及一种可用碱性水溶液显影的新型光刻胶组合物，能够在深紫外线的曝光波长下成像。 本发明还涉及用于对新型光致抗蚀剂以及新型光酸产生剂进行成像的方法。 新型光致抗蚀剂包含a）含有酸不稳定基团的聚合物，和b）光活性化合物的新混合物，其中该混合物包含选自结构1和2的较低吸收化合物和选自结构4和5的较高吸收化合物 ，其中R 1和R 2 R 5，R 6，R 7，或N R 8，R 9和R 9在本文中定义; m = 1-5; X - 是阴离子，Ar选自萘基，蒽基和结构3，其中R 30，R 31，R SUB > 32，R 33和R 34在本文中定义。
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公开(公告)号：US06447980B1
公开(公告)日：2002-09-10
申请号：US09619336
申请日：2000-07-19
IPC分类号： G03C1492
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0395 , Y10S430/115
摘要： The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labile group, b) a compound capable of producing an acid upon radiation. The present invention comprises a polymer that is made from a alicyclic hydrocarbon olefin, an acrylate with a pendant cyclic moeity, and a cyclic anhydride. The present invention also relates to a process for imaging such a photoresist.
摘要翻译： 本发明涉及一种化学放大系统，其对300nm至100nm之间的波长敏感，并且包括a）不溶于碱性水溶液并且包含至少一种酸不稳定基团的聚合物，b）具有能力的化合物 在辐射时产生酸。 本发明包括由脂环烃烯烃，具有侧链环状的丙烯酸酯和环状酸酐制成的聚合物。 本发明还涉及这种光致抗蚀剂的成像方法。
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