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    Field emission electron gun and method of operating the same
    2.
    发明申请
    Field emission electron gun and method of operating the same 审中-公开
    场发射电子枪及其操作方法

    公开(公告)号：US20080169743A1

    公开(公告)日：2008-07-17

    申请号：US11882498

    申请日：2007-08-02

    申请人： Tadashi Fujieda ,  Kishio Hidaka ,  Mitsuo Hayashibara ,  Shun-ichi Watanabe

    发明人： Tadashi Fujieda ,  Kishio Hidaka ,  Mitsuo Hayashibara ,  Shun-ichi Watanabe

    IPC分类号： H01J61/52 ,  H01J1/02

    CPC分类号： H01J37/073 ,  H01J37/265 ,  H01J2237/06316 ,  H01J2237/24535 ,  H01J2237/28

    摘要： The present invention provides a field emission electron gun and its operating method. The field emission electron gun includes: an electron source including a fibrous carbon substance and a conductive base material for supporting the substance; a drawer device for causing electrons to be emitted by field emission; an accelerator for accelerating the electrons; and a means for heating the electron source. In the electron gun, the electron source is heated and held at the heating temperature before field emission, and thereafter the lowest heating temperature causing a range of fluctuation in the field emission current to fall within a predetermined value is adjusted when needed. By employing the electron gun and its operating method of the present invention, provided are various electron beam applied apparatuses each capable of continuously operating for a long time while being low in noise and high in resolution.

    摘要翻译： 本发明提供一种场致发射电子枪及其操作方法。 场发射电子枪包括：包含纤维状碳物质的电子源和用于支撑物质的导电性基材; 用于通过场致发射电子的抽屉装置; 用于加速电子的加速器; 和用于加热电子源的装置。 在电子枪中，电子源被加热并保持在场发射之前的加热温度，然后当需要时调整导致场发射电流的波动范围落在预定值内的最低加热温度。 通过采用本发明的电子枪及其操作方法，提供了各种电子束施加装置，它们能够在噪声低和分辨率高的情况下长时间连续运行。

    Electron gun and charged particle beam device having an aperture with flare-suppressing coating
    6.
    发明授权
    Electron gun and charged particle beam device having an aperture with flare-suppressing coating 有权
    具有带阻燃涂层的孔的电子枪和带电粒子束装置

    公开(公告)号：US09293293B2

    公开(公告)日：2016-03-22

    申请号：US14240333

    申请日：2012-05-22

    申请人： Shun-ichi Watanabe ,  Takashi Onishi ,  Yoichi Ose ,  Kuniyasu Nakamura ,  Masaru Moriyama ,  Tomonori Suzuki

    发明人： Shun-ichi Watanabe ,  Takashi Onishi ,  Yoichi Ose ,  Kuniyasu Nakamura ,  Masaru Moriyama ,  Tomonori Suzuki

    IPC分类号： A61N5/00 ,  H01J37/065

    CPC分类号： H01J37/065 ,  H01J2237/0206 ,  H01J2237/0213 ,  H01J2237/026 ,  H01J2237/045 ,  H01J2237/06316

    摘要： The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.

    摘要翻译： 本申请的目的是抑制耀斑的发生和减少在设置到电子枪的引出电极的孔处产生的二次电子的量。 通过在电子枪中最接近电子源的引出电极的孔径上涂布碳二次电子发射率低的薄膜，可以减少二次电子的产生量。 在引出电极处产生的二次电子减少，结果是减少了耀斑。 通过在引出电极上并入两个孔，并且向两个孔施加与引出电极等电位的电位，可以消除从下面到引出电极渗出的电场。 当电子束撞击引出电极时产生的二次电子停止从引出电极通过的方向上产生力，因此发光减少。

    ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE
    7.
    发明申请
    ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE 有权
    电子枪和充电颗粒光束装置

    公开(公告)号：US20140197336A1

    公开(公告)日：2014-07-17

    申请号：US14240333

    申请日：2012-05-22

    申请人： Shun-ichi Watanabe ,  Takashi Onishi ,  Yoichi Ose ,  Kuniyasu Nakamura ,  Masaru Moriyama ,  Tomonori Suzuki

    发明人： Shun-ichi Watanabe ,  Takashi Onishi ,  Yoichi Ose ,  Kuniyasu Nakamura ,  Masaru Moriyama ,  Tomonori Suzuki

    IPC分类号： H01J37/065

    CPC分类号： H01J37/065 ,  H01J2237/0206 ,  H01J2237/0213 ,  H01J2237/026 ,  H01J2237/045 ,  H01J2237/06316

    摘要： The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.

    摘要翻译： 本申请的目的是抑制耀斑的发生和减少在设置到电子枪的引出电极的孔处产生的二次电子的量。 通过在电子枪中最接近电子源的引出电极的孔径上涂布碳二次电子发射率低的薄膜，可以减少二次电子的产生量。 在引出电极处产生的二次电子减少，结果是减少了耀斑。 通过在引出电极上并入两个孔，并且向两个孔施加与引出电极等电位的电位，可以消除从下面到引出电极渗出的电场。 当电子束撞击引出电极时产生的二次电子停止从引出电极通过的方向上产生力，因此发光减少。