-
Patent Agency Ranking
公开(公告)号：US20180033586A1
公开(公告)日：2018-02-01
申请号：US15222708
申请日：2016-07-28
Applicant: Mapper Lithography IP B.V.
IPC: H01J37/04 , H01J37/147 , H01J37/20
CPC classification number: H01J37/045 , H01J37/147 , H01J37/20 , H01J2237/2002 , H01J2237/2602 , H01J2237/3175
Abstract: The invention relates to an apparatus and method for exposing a sample. The apparatus comprises a source for electromagnetic radiation or particles having energy, an exposing unit for exposing said sample to said electromagnetic radiation or particles, and a substrate holding device for holding said sample at least during said exposing.The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement which is arranged for substantially maintaining the component at a predetermined first temperature.The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature, which is at or near the first temperature.
-
公开(公告)号：US20140197330A1
公开(公告)日：2014-07-17
申请号：US14241109
申请日：2012-09-10
Applicant: MAPPER LITHOGRAPHY IP B.V.
IPC: H01J37/20 , H01J37/317 , F16F15/04
CPC classification number: H01J37/20 , B82Y10/00 , B82Y40/00 , F16F15/04 , F16F15/085 , G03F7/70833 , G03F7/709 , H01J37/02 , H01J37/3177 , H01J2237/0216
Abstract: The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.
Abstract translation: 本发明涉及一种用于光刻设备或检查设备的隔振模块（101）。 模块包括用于容纳光刻设备的支撑框架（102），中间体（103）和支撑体（104）。 中间体通过至少一个弹簧元件连接到支撑框架，使得中间体是悬挂体。 支撑体通过至少一个摆杆（108）连接到中间体，使得支撑体是悬挂体。 本发明还涉及包括这种隔振模块的基板处理系统。
-
公开(公告)号：US10324385B2
公开(公告)日：2019-06-18
申请号：US15642359
申请日：2017-07-06
Applicant: MAPPER LITHOGRAPHY IP B.V.
IPC: G03F7/20 , H01J37/02 , H01J37/317 , B82Y10/00 , B82Y40/00
Abstract: Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: a support body for supporting the radiation projection system; electrical wiring for supplying voltages to components within the radiation projection system and/or for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system; optical fibers, for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system, and a cooling arrangement comprising one or more fluid conduits for cooling the radiation projection system; the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.
-
公开(公告)号：US10048599B2
公开(公告)日：2018-08-14
申请号：US15396032
申请日：2016-12-30
Applicant: Mapper Lithography IP B.V.
Inventor： Jerry Johannes Martinus Peijster
CPC classification number: G03F7/70258 , G03F7/70833 , H01J37/3174
Abstract: The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.
-
公开(公告)号：US09829804B1
公开(公告)日：2017-11-28
申请号：US15222705
申请日：2016-07-28
Applicant: Mapper Lithography IP B.V.
IPC: G03B27/32 , G03B27/52 , G03B27/58 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/67109 , H01L21/6875 , H01L21/68785
Abstract: The invention relates to a substrate holding device comprising a holding plate, a base plate, an array of supports, and an array of droplets of a heat absorbing material. The holding plate comprises a first side for holding a substrate. The base plate is arranged at a distance from the holding plate and provides a gap between the base plate and the holding plate at a side of the holding plate opposite to the first side. The array of supports is arranged in between the holding plate and the base plate. The array of liquid and/or solid droplets is arranged in between the holding plate and the base plate, and the droplets are arranged to contact both the base plate and the holding plate. The droplets are arranged spaced apart from each other and from the supports, and are arranged adjacent to each other in a direction along the gap.
-
-
-
-
Search Results
5
records
(took 0.012 seconds)
