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    Monolithic polarization controlled angle diffusers, associated methods and lithographic systems incorporating controlled angle diffusers
    1.
    发明申请
    Monolithic polarization controlled angle diffusers, associated methods and lithographic systems incorporating controlled angle diffusers 有权
    单片极化控制角扩散器，相关方法和并入受控角扩散器的光刻系统

    公开(公告)号：US20070211337A1

    公开(公告)日：2007-09-13

    申请号：US11711854

    申请日：2007-02-28

    申请人： Marc Himel ,  Alan Kathman

    发明人： Marc Himel ,  Alan Kathman

    IPC分类号： G02B27/28

    CPC分类号： G03F7/70075 ,  G02B5/0252 ,  G02B5/0263 ,  G02B5/0278 ,  G02B5/1809 ,  G02B27/281 ,  G02B27/286 ,  G03F7/70158 ,  G03F7/70566 ,  Y10T29/49

    摘要： A monolithic polarization controlled angle diffuser includes a system having a first surface and a second surface, a controlled angle diffuser pattern for providing an angular distribution at an illumination plane, the controlled angle diffuser pattern being on one of the first and second surfaces of the substrate, and a polarizing pattern on one of the first and second surfaces of the substrate. The controlled angle diffuser pattern includes at least two controlled angle diffuser elements. Each controlled angle diffuser element outputs different angular distributions. The polarizing pattern includes at least two polarizing elements. Each polarizing element corresponds to a respective controlled angle diffuser element. The at least two polarizing elements output polarizations are rotated with respect to one another.

    摘要翻译： 单片偏振控制角扩散器包括具有第一表面和第二表面的系统，用于在照明平面处提供角度分布的受控角漫射器图案，所述受控角漫射器图案位于所述基板的第一和第二表面中的一个上 ，以及在基板的第一和第二表面之一上的偏振图案。 受控角度扩散器图案包括至少两个受控角度扩散器元件。 每个受控角度扩散器元件输出不同的角度分布。 偏振图案包括至少两个偏振元件。 每个偏振元件对应于相应的受控角度扩散器元件。 输出极化的至少两个偏振元件相对于彼此旋转。

    Diffractive Optical Elements And Applications Thereof
    6.
    发明申请
    Diffractive Optical Elements And Applications Thereof 有权
    衍射光学元件及其应用

    公开(公告)号：US20110299165A1

    公开(公告)日：2011-12-08

    申请号：US13154034

    申请日：2011-06-06

    申请人： Alan Kathman ,  Robert Hutchins

    发明人： Alan Kathman ,  Robert Hutchins

    IPC分类号： G02B5/18

    CPC分类号： G02B5/1866

    摘要： A fanout diffractive optical element having a discrete periodic surface relief structure having a 2-dimensional (x,y) shape is described. The surface relief structure can include a first lobe and a second lobe separated by a waist region having a width less than the first lobe and the second lobe. The 2-dimensional (x,y) shape of surface relief structure can have an inversion center and can lack symmetry about any plane that is normal to the surface relief structure. Also described are apparatuses having a fanout diffractive optical element and methods of producing a plurality of light diffracting orders using a fanout diffractive optical element.

    摘要翻译： 描述了具有二维（x，y）形状的离散周期性表面浮雕结构的扇出衍射光学元件。 表面浮雕结构可以包括由具有小于第一凸角和第二凸角的宽度的​​腰部区域分开的第一凸角和第二凸角。 表面浮雕结构的二维（x，y）形状可以具有反转中心，并且可能缺乏与表面浮雕结构垂直的任何平面的对称性。 还描述了具有扇出衍射光学元件的装置和使用扇出衍射光学元件产生多个衍射光束的方法。

    Focus compensation for optical elements and applications thereof
    9.
    发明授权
    Focus compensation for optical elements and applications thereof 有权
    光学元件的聚焦补偿及其应用

    公开(公告)号：US08885257B2

    公开(公告)日：2014-11-11

    申请号：US12908747

    申请日：2010-10-20

    申请人： David Ovrutsky ,  Hagit Gershtenman-Avsian ,  Alan Kathman ,  Jennifer Plyler

    发明人： David Ovrutsky ,  Hagit Gershtenman-Avsian ,  Alan Kathman ,  Jennifer Plyler

    IPC分类号： G02B27/10 ,  G02B7/02 ,  G03B17/02 ,  H04N5/225

    CPC分类号： H04N5/2257 ,  G03B17/02

    摘要： Optical imaging apparatuses are provided having desired focal properties. An optical imaging apparatus can include at least one wafer level optical element, a spacer, a second wafer comprising a focus compensation standoff, and an electro-optical element. For some apparatuses, the focus compensation standoff may include an electro-optical element mounting surface having a roughness different from at least one other surface of the focus compensation standoff. Also described are methods of producing a plurality of optical imaging apparatuses. Some methods include providing an optical wafer having a first and second optical element, determining a first and second focal point of a first and second optical die; providing a second wafer having a first and second focus compensation standoff; and adjusting the heights of the first and second focus compensation standoffs to position a first and second electro-optical element at or near a first and second focal point, respectively.

    摘要翻译： 光学成像设备具有期望的焦点特性。 光学成像装置可以包括至少一个晶片级光学元件，间隔物，包括聚焦补偿支架的第二晶片和电光元件。 对于一些装置，聚焦补偿间隔可以包括具有与焦点补偿支架的至少一个其他表面不同的粗糙度的电光元件安装表面。 还描述了制造多个光学成像装置的方法。 一些方法包括提供具有第一和第二光学元件的光学晶片，确定第一和第二光学晶片的第一和第二焦点; 提供具有第一和第二焦点补偿支座的第二晶片; 以及调整所述第一和第二对焦补偿支座的高度以分别在第一和第二焦点处或附近定位第一和第二电光元件。

    Optical device and associated methods
    10.
    发明授权
    Optical device and associated methods 有权
    光学设备及相关方法

    公开(公告)号：US08411379B2

    公开(公告)日：2013-04-02

    申请号：US13290908

    申请日：2011-11-07

    申请人： Alan Kathman

    发明人： Alan Kathman

    IPC分类号： G02B11/00 ,  G02B1/00

    CPC分类号： H01L27/14625 ,  B29D11/00298 ,  G02B7/028 ,  G02B13/006 ,  G02B13/0085 ,  G02B27/0025 ,  H01L27/14618 ,  H01L2924/0002 ,  Y10T156/10 ,  H01L2924/00

    摘要： An optical device includes a transparent substrate, a first replicated refractive surface on a first surface of the substrate in a first material, and a second replicated refractive surface on a second surface, opposite the first surface, and made of a second material, different from the first material. The material and curvature of the first replicated surface and the material and curvature of the second replicated surface may be configured to substantially reduce the chromatic dispersion and/or the thermal sensitivity of the optical device.

    摘要翻译： 光学装置包括透明基板，在第一材料的基板的第一表面上的第一复制折射表面和与第一表面相对的第二表面上的第二复制折射表面，并且由与第二材料不同的第二材料制成 第一种材料。 第一复制表面的材料和曲率以及第二复制表面的材料和曲率可以被配置为基本上降低光学器件的色散和/或热敏感性。