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公开(公告)号：US07733463B2
公开(公告)日：2010-06-08
申请号：US11418452
申请日：2006-05-05
CPC分类号： G03F7/707
摘要： A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced with a local friction limit at each local contact area, respectively.
摘要翻译： 公开了一种构造成支撑图案化物体的支撑件，所述图案形成物体能够将辐射束在其横截面中赋予图案以形成图案化的辐射束，其中所述支撑件包括多个具有多个局部 在使用中分别设置有图案形成对象的接触区域和被构造成将图案形成对象夹持到多个接触区域的夹具，其中每个结构被构造成使得每个局部接触区域的局部剪切刚度基本上 在每个局部接触区域分别与局部摩擦极限平衡。
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2.发明授权公开(公告)号：US07459701B2
公开(公告)日：2008-12-02
申请号：US11147465
申请日：2005-06-08
申请人： Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Jan Frederik Hoogkamp , Albert Johannes Maria Jansen , Jan-Jaap Kuit , Peter Schaap , Joep Janssen , Hubrecht Bastiaan Jasperse , Arjan Martin Van Der Wel
发明人： Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Jan Frederik Hoogkamp , Albert Johannes Maria Jansen , Jan-Jaap Kuit , Peter Schaap , Joep Janssen , Hubrecht Bastiaan Jasperse , Arjan Martin Van Der Wel
IPC分类号： A61N5/00
CPC分类号： G03F7/707
摘要： A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.
摘要翻译： 描述了用于移位具有基本平坦表面的物体的平台装置。 该装置包括用于支撑物体的物体台和用于沿着第一方向移动物体台的定位装置。 该装置还包括用于通过第一夹持力将物体夹持到物体台的夹紧装置，第一夹紧力由电子控制单元基于物体的状态控制。
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公开(公告)号：US07884919B2
公开(公告)日：2011-02-08
申请号：US11350278
申请日：2006-02-09
申请人： Peter Hempenius , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Youssef Karel Maria De Vos
发明人： Peter Hempenius , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Youssef Karel Maria De Vos
IPC分类号： G03B27/42
CPC分类号： G03F7/707
摘要： A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.
摘要翻译： 一种器件制造方法包括将图案从图案形成装置转移到衬底上。 该方法包括将图案形成装置和支撑件组合在一起，并且在图案形成装置和支撑件之间施加基本上静止的力以保持图案形成装置。 图案形成装置现在被基本上动态的力激发以使其能够滑动。 然后，图案形成装置对准，并且图案从图案形成装置转移到基板上。 图案形成装置可以用交替的加速度激发。 当图案形成装置被激发时，允许图案形成装置相对于支撑件沉降，从而改善它们之间的摩擦，以减少图案形成装置的滑动或局部滑动的风险。
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公开(公告)号：US07675607B2
公开(公告)日：2010-03-09
申请号：US11486379
申请日：2006-07-14
申请人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
发明人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.
摘要翻译： 公开了一种光刻设备，其具有构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，所述支撑件包括构造成夹紧 以及弯曲机构，其构造成将弯曲扭矩施加到夹持的图案形成装置上，所述弯曲机构包括力/转矩致动器，所述力/力矩致动器构造成作用在夹持的图案形成装置上，而基本上不会降低施加在图案形成装置上的夹紧力 由支撑夹。
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公开(公告)号：US20080013068A1
公开(公告)日：2008-01-17
申请号：US11486379
申请日：2006-07-14
申请人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
发明人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
IPC分类号： G03B27/62
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.
摘要翻译： 公开了一种光刻设备，其具有构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，所述支撑件包括构造成夹紧 以及弯曲机构，其构造成将弯曲扭矩施加到夹持的图案形成装置上，所述弯曲机构包括力/转矩致动器，所述力/力矩致动器构造成作用在夹持的图案形成装置上，而基本上不会降低施加在图案形成装置上的夹紧力 由支撑夹。
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6.发明授权Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device 有权用于补偿衬底不平坦度的光刻设备和方法，确定图案形成装置不平坦度的影响，以及确定热负荷对图案形成装置的影响公开(公告)号：US08345265B2
公开(公告)日：2013-01-01
申请号：US12616185
申请日：2009-11-11
申请人： Dirk-Jan Bijvoet
发明人： Dirk-Jan Bijvoet
IPC分类号： G01B11/24
CPC分类号： G03F7/70875 , G03F7/707 , G03F7/70783 , G03F9/7003 , G03F9/7034
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor configured to measure a height level, curvature and/or angle of a surface of a patterning device supported on the support.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到基板的目标部分上;以及传感器，被配置为测量支撑在支撑体上的图案形成装置的表面的高度水平，曲率和/或角度。
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7.发明授权Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device 有权装置制造方法，用于保持图案形成装置的方法和包括用于将分子施加到图案形成装置的夹持区域上的涂敷器的光刻装置公开(公告)号：US07933000B2
公开(公告)日：2011-04-26
申请号：US11600325
申请日：2006-11-16
申请人： Johannes Onvlee , Dirk-Jan Bijvoet
发明人： Johannes Onvlee , Dirk-Jan Bijvoet
IPC分类号： G03B27/62
CPC分类号： G03F7/707
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An applicator, such as a humidifier is provided to provide molecules, such as water molecules, to a clamp area of the patterning device.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 提供了诸如加湿器的施加器，以将诸如水分子的分子提供到图案形成装置的夹持区域。
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8.发明申请LITHOGRAPHIC APPARATUS AND METHODS FOR COMPENSATING SUBSTRATE UNFLATNESS, DETERMINING THE EFFECT OF PATTERNING DEVICE UNFLATNESS, AND DETERMINING THE EFFECT OF THERMAL LOADS ON A PATTERNING DEVICE 有权用于补偿基板不透光性，确定图案装置不透光性的影响的光刻装置和方法，以及确定热载荷对图案装置的影响公开(公告)号：US20100129741A1
公开(公告)日：2010-05-27
申请号：US12616185
申请日：2009-11-11
申请人： Dirk-Jan Bijvoet
发明人： Dirk-Jan Bijvoet
CPC分类号： G03F7/70875 , G03F7/707 , G03F7/70783 , G03F9/7003 , G03F9/7034
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor configured to measure a height level, curvature and/or angle of a surface of a patterning device supported on the support.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到基板的目标部分上;以及传感器，被配置为测量支撑在支撑体上的图案形成装置的表面的高度水平，曲率和/或角度。
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9.发明申请LITHOGRAPHIC APPARATUS HAVING A CHUCK WITH A VISCO-ELASTIC DAMPING LAYER 有权具有VISCO-ELASTIC DAMPING LAYER的卡盘的平面设备公开(公告)号：US20090231567A1
公开(公告)日：2009-09-17
申请号：US12370741
申请日：2009-02-13
CPC分类号： G03F7/7095 , G03F7/707 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持基板的工作台，被配置为将图案化的辐射束投影到基板的目标部分上的投影系统，配置成将物体（例如，图案形成装置）保持和定位到支撑件或基板上的基板上的卡盘 桌子，卡盘包括基座和约束层。 包括粘弹性材料的阻尼层设置在基部和约束层之间。
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10.发明授权System and method for an improved illumination system in a lithographic apparatus 有权用于光刻设备中改进的照明系统的系统和方法公开(公告)号：US07355677B2
公开(公告)日：2008-04-08
申请号：US11007588
申请日：2004-12-09
申请人： Dirk-Jan Bijvoet
发明人： Dirk-Jan Bijvoet
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G03F7/70291
摘要： An array of individually controllable elements for use in lithography in which each of the individually controllable elements is comprised of a planar reflector mounted on supports on a substrate by way of elongate hinges.
摘要翻译： 用于光刻的单独可控元件的阵列，其中每个可独立控制的元件由通过细长铰链安装在基板上的支撑件上的平面反射器构成。
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