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公开(公告)号：US07239370B2
公开(公告)日：2007-07-03
申请号：US10738992
申请日：2003-12-19
申请人： Albert Johannes Maria Jansen , Marcel Koenraad Marie Baggen , Johannes Christiaan Maria Jasper , Raymond Laurentius Johannes Schrijver , Richard Joseph Bruls , Johannes Jacobus Matheus Baselmans , Willem Richard Pongers , Tammo Uitterdijk
发明人： Albert Johannes Maria Jansen , Marcel Koenraad Marie Baggen , Johannes Christiaan Maria Jasper , Raymond Laurentius Johannes Schrijver , Richard Joseph Bruls , Johannes Jacobus Matheus Baselmans , Willem Richard Pongers , Tammo Uitterdijk
CPC分类号： G03F7/70308 , G03F7/70716 , G03F7/70983
摘要： In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.
摘要翻译： 在投影系统中，将光罩上的图案平面照亮以将投影图像聚焦在图像平面上。 光路中的防护薄膜组件的存在导致图案平面在掩模版上的位置的虚拟移位。 根据防护薄膜的存在或不存在，投影图像的图像平面需要适应适当的聚焦。 补偿器通过移动图形平面的位置来抵消由于防护薄膜组成的图案平面的虚拟移位。
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公开(公告)号：US20110149258A1
公开(公告)日：2011-06-23
申请号：US12969656
申请日：2010-12-16
申请人： Jeroen Gerard Gosen , Albert Johannes Maria Jansen , Nicolaas Ten Kate , Marco Koert Stavenga , Koen Steffens , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns , Koen Cuypers
发明人： Jeroen Gerard Gosen , Albert Johannes Maria Jansen , Nicolaas Ten Kate , Marco Koert Stavenga , Koen Steffens , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns , Koen Cuypers
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/7085
摘要： An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
摘要翻译： 公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，所述传感器和/或目标具有与浸没液体疏液的第一区域和亲液的第二区域 液体置换装置，其构造成将传感器和/或目标物上的液体置换，所述液体置换装置包括气体出口开口，所述气体出口开口构造成将气流引向所述第一和第二区域，其中， 被引导到第一区域的气流不同于指向第二区域的一部分气流的特性。
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3.发明申请公开(公告)号：US20080137049A1
公开(公告)日：2008-06-12
申请号：US12068287
申请日：2008-02-05
申请人： Johannes Christiaan Maria Jasper , Marcel Koenraad Marie Baggen , Richard Joseph Bruls , Orlando Serapio Cicilia , Hendrikus Alphonsus Ludovicus Van Dijck , Gerardus Carolus Johannus Hofmans , Albert Johannes Maria Jansen , Carlo Cornelis Maria Luijten , Willem Richard Pongers , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Marie Demarteau
发明人： Johannes Christiaan Maria Jasper , Marcel Koenraad Marie Baggen , Richard Joseph Bruls , Orlando Serapio Cicilia , Hendrikus Alphonsus Ludovicus Van Dijck , Gerardus Carolus Johannus Hofmans , Albert Johannes Maria Jansen , Carlo Cornelis Maria Luijten , Willem Richard Pongers , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Marie Demarteau
CPC分类号： G03F7/70258 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70308 , G03F7/70983
摘要： A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
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公开(公告)号：US08755026B2
公开(公告)日：2014-06-17
申请号：US12969656
申请日：2010-12-16
申请人： Jeroen Gerard Gosen , Albert Johannes Maria Jansen , Nicolaas Ten Kate , Marco Koert Stavenga , Koen Steffens , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns , Koen Cuypers
发明人： Jeroen Gerard Gosen , Albert Johannes Maria Jansen , Nicolaas Ten Kate , Marco Koert Stavenga , Koen Steffens , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns , Koen Cuypers
CPC分类号： G03F7/70341 , G03F7/7085
摘要： An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
摘要翻译： 公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，所述传感器和/或目标具有与浸没液体疏液的第一区域和亲液的第二区域 液体置换装置，其构造成将传感器和/或目标物上的液体置换，所述液体置换装置包括气体出口开口，所述气体出口开口构造成将气流引向所述第一和第二区域，其中， 被引导到第一区域的气流不同于指向第二区域的一部分气流的特性。
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5.发明授权公开(公告)号：US07459701B2
公开(公告)日：2008-12-02
申请号：US11147465
申请日：2005-06-08
申请人： Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Jan Frederik Hoogkamp , Albert Johannes Maria Jansen , Jan-Jaap Kuit , Peter Schaap , Joep Janssen , Hubrecht Bastiaan Jasperse , Arjan Martin Van Der Wel
发明人： Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Jan Frederik Hoogkamp , Albert Johannes Maria Jansen , Jan-Jaap Kuit , Peter Schaap , Joep Janssen , Hubrecht Bastiaan Jasperse , Arjan Martin Van Der Wel
IPC分类号： A61N5/00
CPC分类号： G03F7/707
摘要： A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.
摘要翻译： 描述了用于移位具有基本平坦表面的物体的平台装置。 该装置包括用于支撑物体的物体台和用于沿着第一方向移动物体台的定位装置。 该装置还包括用于通过第一夹持力将物体夹持到物体台的夹紧装置，第一夹紧力由电子控制单元基于物体的状态控制。
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公开(公告)号：US07423722B2
公开(公告)日：2008-09-09
申请号：US10766526
申请日：2004-01-29
申请人： Albert Johannes Maria Jansen , Jan Jaap Kuit , Erik Roelof Loopstra , Raymond Laurentius Johannes Schrijver
发明人： Albert Johannes Maria Jansen , Jan Jaap Kuit , Erik Roelof Loopstra , Raymond Laurentius Johannes Schrijver
CPC分类号： G03F7/70066 , G03F7/70425 , G03F7/70475 , G03F7/707
摘要： A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
摘要翻译： 光刻设备具有适于在至少两个位置容纳掩模的掩模台，使得具有大于曝光场的图案区域的掩模可以通过首先在掩模的第一位置进行曝光，然后执行第二 第二位置的面罩曝光。
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