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1.发明授权公开(公告)号：US07459701B2
公开(公告)日：2008-12-02
申请号：US11147465
申请日：2005-06-08
申请人： Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Jan Frederik Hoogkamp , Albert Johannes Maria Jansen , Jan-Jaap Kuit , Peter Schaap , Joep Janssen , Hubrecht Bastiaan Jasperse , Arjan Martin Van Der Wel
发明人： Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Sjoerd Nicolaas Lambertus Donders , Jan Frederik Hoogkamp , Albert Johannes Maria Jansen , Jan-Jaap Kuit , Peter Schaap , Joep Janssen , Hubrecht Bastiaan Jasperse , Arjan Martin Van Der Wel
IPC分类号： A61N5/00
CPC分类号： G03F7/707
摘要： A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.
摘要翻译： 描述了用于移位具有基本平坦表面的物体的平台装置。 该装置包括用于支撑物体的物体台和用于沿着第一方向移动物体台的定位装置。 该装置还包括用于通过第一夹持力将物体夹持到物体台的夹紧装置，第一夹紧力由电子控制单元基于物体的状态控制。
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公开(公告)号：US07345736B2
公开(公告)日：2008-03-18
申请号：US10927532
申请日：2004-08-27
CPC分类号： G03F7/70733 , G03F7/7075
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
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公开(公告)号：US07408615B2
公开(公告)日：2008-08-05
申请号：US10871528
申请日：2004-06-21
IPC分类号： G03B27/42
CPC分类号： G03F7/70733 , G03F7/7075 , H01L21/67742 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
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公开(公告)号：US07349067B2
公开(公告)日：2008-03-25
申请号：US10892394
申请日：2004-07-16
CPC分类号： G03F7/7075 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
摘要翻译： 提出了一种具有改进的转印单元的光刻设备。 光刻设备包括处理单元，该处理单元执行涉及可更换物体的光刻处理，其中处理单元包括提供辐射束的照明系统，支撑结构，其被配置为支撑图案形成装置，所述图案形成装置将期望的图案赋予辐射束 ，被配置为保持衬底的衬底保持器，以及配置成将所述图案化的光束投影到所述衬底的目标部分上的投影系统。 光刻设备还包括包括单个机器人的传送单元。 单个机器人被配置为将第一可交换对象从加载站传送到处理单元，并将第二可更换对象从处理单元传送到放电站。
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公开(公告)号：US07106420B2
公开(公告)日：2006-09-12
申请号：US11015763
申请日：2004-12-20
申请人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
发明人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58
CPC分类号： G03F7/70733
摘要： The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.
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公开(公告)号：US07486384B2
公开(公告)日：2009-02-03
申请号：US10813687
申请日：2004-03-31
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
摘要翻译： 本发明涉及具有支撑结构以支撑和移动物体（如基底）的光刻投影装置。 支撑结构可以是具有机器人臂的机器人，其具有支撑框架的支撑框架，例如。 底物。 支撑框架包括具有用于在移动期间保持基板的一个或多个夹具的夹持结构。 机器人手臂包括一个或多个柔顺部件。 夹具可以是具有氧化的上表面的Johnson-Raybeck效应型夹具。 为了更好地去夹紧，可以向夹具提供RF AC衰减的去钳位电压。 该装置可以仅用一个单一的衬底清洁。
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公开(公告)号：US20080297758A1
公开(公告)日：2008-12-04
申请号：US12213930
申请日：2008-06-26
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
摘要翻译： 本发明涉及一种用于传送物体（W）的传送装置。 传送装置包括用于在第一位置处夹持物体（W）的至少一个然后在靠近接收器（20）的第二位置处释放物体（W）的至少一个并且释放物体（W）的夹持器（15） 在靠近接收器（20）的第二位置处夹持物体之后的第一位置。 传送装置还设置有测量装置（22），该测量装置设置成在至少一个维度上测量夹具（15）相对于接收器（20）的相对位置。 此外，基于测量的相对位置，相对于期望的相对位置来定义相对位置误差。 调整夹持器（15）和接收器（20）的相对位置以最小化第二位置中的相对位置误差。
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公开(公告)号：US07131999B2
公开(公告)日：2006-11-07
申请号：US10950674
申请日：2004-09-28
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , H01L21/68707
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 支撑构造成支撑图案形成装置，图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及机器人，其构造成将可交换物体传送到支撑区域和从支撑区域传递，所述机器人包括臂和端部执行器，所述末端执行器包括构造成承载相应可更换物体的第一和第二托架，并且所述末端执行器可旋转地连接到 机器人的臂围绕基本上平行于支撑区域延伸的旋转轴线。
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9.发明授权Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method 失效可替换物体处理装置，包括这种可更换物体处理装置的光刻设备和装置制造方法公开(公告)号：US07394525B2
公开(公告)日：2008-07-01
申请号：US10969244
申请日：2004-10-21
申请人： Jan Jaap Kuit , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
发明人： Jan Jaap Kuit , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
CPC分类号： G03F7/70741
摘要： The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.
摘要翻译： 本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的图案形成装置支撑件，放置在图案形成装置支撑件上的图案形成装置能够在其横截面上赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 配置成将图案化的辐射束投射到基板的目标部分上的投影系统，以及包括用于与图案形成装置支撑件和装载站更换图案形成装置的单个机器人的图案形成装置处理装置，其中，所述机器人包括第一 保持装置，其构造成将图案形成装置保持在第一保持位置，以及第二保持装置，其构造成将图案形成装置保持在第二保持位置。 这种单机器人可以快速准确地交换图案形成装置。
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公开(公告)号：US20060066832A1
公开(公告)日：2006-03-30
申请号：US10950674
申请日：2004-09-28
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , H01L21/68707
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.
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