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    Lithographic apparatus and device manufacturing method
    1.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07131999B2

    公开(公告)日：2006-11-07

    申请号：US10950674

    申请日：2004-09-28

    申请人： Jan Frederik Hoogkamp ,  Jan Jaap Kuit ,  Raimond Visser

    发明人： Jan Frederik Hoogkamp ,  Jan Jaap Kuit ,  Raimond Visser

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70741 ,  H01L21/68707

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 支撑构造成支撑图案形成装置，图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及机器人，其构造成将可交换物体传送到支撑区域和从支撑区域传递，所述机器人包括臂和端部执行器，所述末端执行器包括构造成承载相应可更换物体的第一和第二托架，并且所述末端执行器可旋转地连接到 机器人的臂围绕基本上平行于支撑区域延伸的旋转轴线。

    Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method
    2.
    发明授权
    Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method 失效
    可替换物体处理装置，包括这种可更换物体处理装置的光刻设备和装置制造方法

    公开(公告)号：US07394525B2

    公开(公告)日：2008-07-01

    申请号：US10969244

    申请日：2004-10-21

    申请人： Jan Jaap Kuit ,  Jan Frederik Hoogkamp ,  Hubert Marie Segers ,  Raimond Visser ,  Johannes Maquine

    发明人： Jan Jaap Kuit ,  Jan Frederik Hoogkamp ,  Hubert Marie Segers ,  Raimond Visser ,  Johannes Maquine

    IPC分类号： G03B27/58 ,  G03B27/42

    CPC分类号： G03F7/70741

    摘要： The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.

    摘要翻译： 本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的图案形成装置支撑件，放置在图案形成装置支撑件上的图案形成装置能够在其横截面上赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 配置成将图案化的辐射束投射到基板的目标部分上的投影系统，以及包括用于与图案形成装置支撑件和装载站更换图案形成装置的单个机器人的图案形成装置处理装置，其中，所述机器人包括第一 保持装置，其构造成将图案形成装置保持在第一保持位置，以及第二保持装置，其构造成将图案形成装置保持在第二保持位置。 这种单机器人可以快速准确地交换图案形成装置。

    Lithographic apparatus and device manufacturing method
    3.
    发明授权
    Lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US07106420B2

    公开(公告)日：2006-09-12

    申请号：US11015763

    申请日：2004-12-20

    申请人： Jan Jaap Kuit ,  Dirk Jan Bijvoet ,  Jan Frederik Hoogkamp ,  Hubert Marie Segers ,  Raimond Visser ,  Johannes Maquine

    发明人： Jan Jaap Kuit ,  Dirk Jan Bijvoet ,  Jan Frederik Hoogkamp ,  Hubert Marie Segers ,  Raimond Visser ,  Johannes Maquine

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70733

    摘要： The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.

    Lithographic apparatus and device manufacturing method
    4.
    发明申请
    Lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US20060066832A1

    公开(公告)日：2006-03-30

    申请号：US10950674

    申请日：2004-09-28

    申请人： Jan Frederik Hoogkamp ,  Jan Jaap Kuit ,  Raimond Visser

    发明人： Jan Frederik Hoogkamp ,  Jan Jaap Kuit ,  Raimond Visser

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70741 ,  H01L21/68707

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.

    Lithographic apparatus substrate alignment
    9.
    发明授权
    Lithographic apparatus substrate alignment 有权
    平版印刷设备基板对准

    公开(公告)号：US07408618B2

    公开(公告)日：2008-08-05

    申请号：US11170796

    申请日：2005-06-30

    申请人： Raimond Visser

    发明人： Raimond Visser

    IPC分类号： G03B27/42 ,  G03B27/32 ,  G01B11/00

    CPC分类号： G03F9/7084 ,  G03F9/7076 ,  G03F9/7088

    摘要： A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a position of the alignment mark is measured in the window. A relationship between the measured position of the alignment mark and the position of the window is determined. The relationship is stored in a database and the substrate is aligned making use of the measured position of the alignment mark.The above may be repeated for a following aligning of the substrate, prior however to the measuring of the position of the alignment mark in the window, the position of the window is amended making use of the relationship between the measured position of the alignment mark and the position of the window as stored in the database for one or more preceding alignings.

    摘要翻译： 在光刻设备中对准衬底的方法包括从衬底的几何参考确定窗口在衬底上的位置。 该窗口表示可以预期基板的对准标记的区域。 然后，在窗口中测量对准标记的位置。 确定对准标记的测量位置和窗口的位置之间的关系。 将该关系存储在数据库中，并使用对准标记的测量位置对准基板。 可以重复以上对于基板的跟随对准，然而，在测量窗口中的对准标记的位置之前，利用对准标记的测量位置和对准标记的测量位置之间的关系来修改窗口的位置 存储在数据库中的窗口的位置用于一个或多个先前的对齐。