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    In-line contiguous resistive lapping guide for magnetic sensors
    6.
    发明授权
    In-line contiguous resistive lapping guide for magnetic sensors 失效
    用于磁传感器的在线连续电阻研磨导轨

    公开(公告)号：US07244169B2

    公开(公告)日：2007-07-17

    申请号：US10954868

    申请日：2004-09-30

    申请人： Marie-Claire Cyrille ,  Kuok San Ho ,  Tsann Lin ,  Scott Arthur MacDonald ,  Huey-Ming Tzeng

    发明人： Marie-Claire Cyrille ,  Kuok San Ho ,  Tsann Lin ,  Scott Arthur MacDonald ,  Huey-Ming Tzeng

    IPC分类号： B24B49/00 ,  B24B51/00 ,  G11B5/42

    CPC分类号： B24B37/00 ,  B24B37/013 ,  B24B41/06 ,  B24B49/10 ,  Y10T29/49036 ,  Y10T29/49048

    摘要： An in-line lapping guide uses a contiguous resistor in a cavity to separate a lithographically-defined sensor from the in-line lapping guide. As lapping proceeds through the cavity toward the sensor, the resistance across the sensor leads increases to a specific target, thereby indicating proximity to the sensor itself. The contiguous resistor is fabricated electrically in parallel to the sensor and the in-line lapping guide. The total resistance across the sensor leads show resistance change even when lapping through the cavity portion. One method to produce the contiguous resistor is to partial mill the cavity between the sensor and the in-line lapping guide so that a film of metal is left. Total resistance across leads is the parallel resistance of the sensor, the contiguous resistor, and the in-line lapping guide.

    摘要翻译： 在线研磨引导件使用空腔中的连续电阻器将光刻定影传感器与在线研磨导轨分离。 当研磨通过腔朝向传感器进行时，传感器引线上的电阻增加到特定目标，从而指示传感器本身的接近度。 连续的电阻器与传感器和在线研磨导轨平行地制造。 传感器引线上的总电阻即使在通过空腔部分研磨时也会显示电阻变化。 产生连续电阻器的一种方法是将传感器和在线研磨引导件之间的空腔部分研磨，使得留下金属膜。 引线之间的总电阻是传感器，相邻电阻器和在线研磨导轨的并联电阻。

    In-line contiguous resistive lapping guide for magnetic sensors
    7.
    发明申请
    In-line contiguous resistive lapping guide for magnetic sensors 失效
    用于磁传感器的在线连续电阻研磨导轨

    公开(公告)号：US20060068685A1

    公开(公告)日：2006-03-30

    申请号：US10954868

    申请日：2004-09-30

    申请人： Marie-Claire Cyrille ,  Kuok San Ho ,  Tsann Lin ,  Scott MacDonald ,  Huey-Ming Tzeng

    发明人： Marie-Claire Cyrille ,  Kuok San Ho ,  Tsann Lin ,  Scott MacDonald ,  Huey-Ming Tzeng

    IPC分类号： B24B49/00

    CPC分类号： B24B37/00 ,  B24B37/013 ,  B24B41/06 ,  B24B49/10 ,  Y10T29/49036 ,  Y10T29/49048

    摘要： An in-line lapping guide uses a contiguous resistor in a cavity to separate a lithographically-defined sensor from the in-line lapping guide. As lapping proceeds through the cavity toward the sensor, the resistance across the sensor leads increases to a specific target, thereby indicating proximity to the sensor itself. The contiguous resistor is fabricated electrically in parallel to the sensor and the in-line lapping guide. The total resistance across the sensor leads show resistance change even when lapping through the cavity portion. One method to produce the contiguous resistor is to partial mill the cavity between the sensor and the in-line lapping guide so that a film of metal is left. Total resistance across leads is the parallel resistance of the sensor, the contiguous resistor, and the in-line lapping guide.

    摘要翻译： 在线研磨引导件使用空腔中的连续电阻器将光刻定影传感器与在线研磨导轨分离。 当研磨通过腔朝向传感器进行时，传感器引线上的电阻增加到特定目标，从而指示传感器本身的接近度。 连续的电阻器与传感器和在线研磨导轨平行地制造。 传感器引线上的总电阻即使在通过空腔部分研磨时也会显示电阻变化。 产生连续电阻器的一种方法是将传感器和在线研磨引导件之间的空腔部分研磨以留下金属膜。 引线之间的总电阻是传感器，相邻电阻器和在线研磨导轨的并联电阻。

    Method for reducing damage to sliders during lapping
    9.
    发明授权
    Method for reducing damage to sliders during lapping 失效
    在研磨过程中减少滑块损坏的方法

    公开(公告)号：US07360296B2

    公开(公告)日：2008-04-22

    申请号：US10957098

    申请日：2004-09-30

    申请人： Marie-Claire Cyrille ,  Prakash Kasiraj ,  Huey-Ming Tzeng

    发明人： Marie-Claire Cyrille ,  Prakash Kasiraj ,  Huey-Ming Tzeng

    IPC分类号： G11B5/187 ,  B24B1/00

    CPC分类号： G11B5/3169 ,  G11B5/332 ,  G11B5/3932 ,  Y10T29/49041 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A process is described for fabricating sliders with reduced lapping damage to the hard-bias materials. The stack of layers for the magnetic sensor is deposited on a wafer and patterned into an initial shape. The hard-bias structures are fabricated at the side of the magnetic sensor as in the prior art. In each of the two described embodiments of the invention, the hard-bias material below the ABS is reduced or removed and replaced with a fill material such as alumina. A first embodiment reduces the hard-bias material below the ABS by forming an extended lapping gap along the ABS in both the sensor and hard-bias material. A second embodiment forms a photoresist mask over the sensor and the portion of the hard-bias/lead structures above the ABS and the exposed hard-bias/lead material below the ABS is thinned or completely removed by milling.

    摘要翻译： 描述了一种用于制造滑块的方法，减少了对硬偏置材料的研磨损伤。 用于磁传感器的层堆叠沉积在晶片上并图案化成初始形状。 如现有技术那样，在磁性传感器侧制造硬偏压结构。 在本发明的两个所描述的实施例的每一个中，ABS下面的硬偏压材料被减少或移除，并用诸如氧化铝的填充材料代替。 第一实施例通过在传感器和硬偏压材料中沿着ABS形成延伸的研磨间隙来减少ABS之下的硬偏置材料。 第二实施例在传感器上形成光致抗蚀剂掩模，并且在ABS之上的硬偏置/引线结构的部分以及ABS下方的暴露的硬偏置/引线材料通过研磨被薄化或完全去除。

    Method for reducing damage to sliders during lapping
    10.
    发明申请
    Method for reducing damage to sliders during lapping 失效
    在研磨过程中减少滑块损坏的方法

    公开(公告)号：US20060064866A1

    公开(公告)日：2006-03-30

    申请号：US10957098

    申请日：2004-09-30

    申请人： Marie-Claire Cyrille ,  Prakash Kasiraj ,  Huey-Ming Tzeng

    发明人： Marie-Claire Cyrille ,  Prakash Kasiraj ,  Huey-Ming Tzeng

    IPC分类号： G11B5/33 ,  G11B5/187 ,  G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3169 ,  G11B5/332 ,  G11B5/3932 ,  Y10T29/49041 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A process is described for fabricating sliders with reduced lapping damage to the hard-bias materials. The stack of layers for the magnetic sensor is deposited on a wafer and patterned into an initial shape. The hard-bias structures are fabricated at the side of the magnetic sensor as in the prior art. In each of the two described embodiments of the invention, the hard-bias material below the ABS is reduced or removed and replaced with a fill material such as alumina. A first embodiment reduces the hard-bias material below the ABS by forming an extended lapping gap along the ABS in both the sensor and hard-bias material. A second embodiment forms a photoresist mask over the sensor and the portion of the hard-bias/lead structures above the ABS and the exposed hard-bias/lead material below the ABS is thinned or completely removed by milling.

    摘要翻译： 描述了一种用于制造滑块的方法，减少了对硬偏置材料的研磨损伤。 用于磁传感器的层堆叠沉积在晶片上并图案化成初始形状。 如现有技术那样，在磁性传感器侧制造硬偏压结构。 在本发明的两个所描述的实施例的每一个中，ABS下面的硬偏压材料被减少或移除，并用诸如氧化铝的填充材料代替。 第一实施例通过在传感器和硬偏压材料中沿着ABS形成延伸的研磨间隙来减少ABS之下的硬偏置材料。 第二实施例在传感器上形成光致抗蚀剂掩模，并且在ABS之上的硬偏置/引线结构的部分以及ABS下方的暴露的硬偏置/引线材料通过研磨被薄化或完全去除。