Wafer carrier
    5.
    发明授权
    Wafer carrier 失效
    晶圆载体

    公开(公告)号:US5417767A

    公开(公告)日:1995-05-23

    申请号:US174046

    申请日:1993-12-28

    申请人: Mark G. Stinson

    发明人: Mark G. Stinson

    摘要: A wafer carrier which supports at least one wafer, during a process in which material is deposited on the wafer from chemical vapor in a reactor, includes a base having an inner curved surface extending from a first lateral edge of the base to a second lateral edge of the base. Slots in the inner surface of the base extending generally continuously from the first lateral edge to the second lateral edge are defined by a bottom wall and opposing side walls. The slots may each receive at least a portion of a thin, outwardly facing edge of the wafer for holding the wafer in an upright position. The bottom wall of the slot closely conforms to the predetermined shape of the portion of the outwardly facing peripheral edge of the wafer to inhibit the entry of vapor between the base and the outwardly facing edge of the wafer and the formation of material bridges between the wafer and the carrier by deposition of the material from the chemical vapor.

    摘要翻译: 在材料从反应器中的化学蒸气沉积在晶片上的过程中,支撑至少一个晶片的晶片载体包括具有从基座的第一侧边缘延伸到第二侧边缘的内曲面的基座 的基地。 由底壁和相对的侧壁限定从第一侧边缘到第二侧边缘大致连续延伸的底座的内表面中的槽。 槽可以各自接收晶片的薄的向外的边缘的至少一部分,用于将晶片保持在直立位置。 槽的底壁与晶片向外的周边部分的一部分的预定形状紧密地一致,以防止在晶片的基部和向外的边缘之间进入蒸汽,并且在晶片之间形成材料桥 和通过从化学蒸气沉积材料的载体。