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公开(公告)号：US20110235008A1
公开(公告)日：2011-09-29
申请号：US13154008
申请日：2011-06-06
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08681311B2
公开(公告)日：2014-03-25
申请号：US13154008
申请日：2011-06-06
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov , Sjoerd Nicolaas Lambertus Donders
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08023101B2
公开(公告)日：2011-09-20
申请号：US11798928
申请日：2007-05-17
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US07804577B2
公开(公告)日：2010-09-28
申请号：US11391683
申请日：2006-03-29
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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公开(公告)号：US20070268466A1
公开(公告)日：2007-11-22
申请号：US11436057
申请日：2006-05-18
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08421996B2
公开(公告)日：2013-04-16
申请号：US12872842
申请日：2010-08-31
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov , Rudolf Kemper , Joost Jeroen Ottens
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov , Rudolf Kemper , Joost Jeroen Ottens
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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公开(公告)号：US08144305B2
公开(公告)日：2012-03-27
申请号：US11436057
申请日：2006-05-18
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US20100321653A1
公开(公告)日：2010-12-23
申请号：US12872842
申请日：2010-08-31
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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公开(公告)号：US07602470B2
公开(公告)日：2009-10-13
申请号：US11212921
申请日：2005-08-29
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US20090303455A1
公开(公告)日：2009-12-10
申请号：US12541755
申请日：2009-08-14
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号： G03B27/54
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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