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公开(公告)号：US07804577B2
公开(公告)日：2010-09-28
申请号：US11391683
申请日：2006-03-29
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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公开(公告)号：US20070268466A1
公开(公告)日：2007-11-22
申请号：US11436057
申请日：2006-05-18
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08681311B2
公开(公告)日：2014-03-25
申请号：US13154008
申请日：2011-06-06
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov , Sjoerd Nicolaas Lambertus Donders
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08023101B2
公开(公告)日：2011-09-20
申请号：US11798928
申请日：2007-05-17
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08421996B2
公开(公告)日：2013-04-16
申请号：US12872842
申请日：2010-08-31
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov , Rudolf Kemper , Joost Jeroen Ottens
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov , Rudolf Kemper , Joost Jeroen Ottens
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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公开(公告)号：US08144305B2
公开(公告)日：2012-03-27
申请号：US11436057
申请日：2006-05-18
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US20110235008A1
公开(公告)日：2011-09-29
申请号：US13154008
申请日：2011-06-06
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US20100321653A1
公开(公告)日：2010-12-23
申请号：US12872842
申请日：2010-08-31
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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9.发明申请公开(公告)号：US20100214543A1
公开(公告)日：2010-08-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
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10.发明申请FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 失效流体处理结构，平面设备和设备制造方法公开(公告)号：US20110292357A1
公开(公告)日：2011-12-01
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板的台面或两者。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
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