公开(公告)号：US20130250297A1

公开(公告)日：2013-09-26

申请号：US13990103

申请日：2011-10-11

Applicant: Masaaki Ito ,  Minori Noguchi

Inventor： Masaaki Ito ,  Minori Noguchi

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/95607

Abstract: Disclosed here is a macro inspection apparatus for a sample such as a semiconductor wafer having a pattern formed thereon, the apparatus being capable of detecting abnormalities in dimension and size with high sensitivity.The inspection apparatus for a sample having pattern formed thereon includes: an illumination optical system which illuminates the sample having the pattern formed thereon; a detection optical system which receives scattered light from the pattern; an imaging device which is disposed over a pupil plane of the detection optical system, the imaging device acquiring Fourier images of the pattern; and a processing unit which compares the Fourier images with the Fourier image of the normal pattern to detect an irregularity of the pattern.

Abstract translation: 这里公开了一种用于诸如其上形成有图案的半导体晶片的样品的宏观检查装置，该装置能够以高灵敏度检测尺寸和尺寸的异常。 用于其上形成有图案的样品的检查装置包括：照射具有形成在其上的图案的样品的照明光学系统; 检测光学系统，其接收来自图案的散射光; 成像装置，其设置在所述检测光学系统的光瞳平面上，所述成像装置获取所述图案的付里叶图像; 以及处理单元，其将傅立叶图像与正常图案的傅里叶图像进行比较，以检测图案的不规则性。

公开(公告)号：US20090202138A1

公开(公告)日：2009-08-13

申请号：US12361954

申请日：2009-01-29

Applicant: Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

Inventor： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

IPC: G06K9/00

CPC classification number: G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G06K9/74

Abstract: The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

Abstract translation: 本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带（图1）。

公开(公告)号：US20100106443A1

公开(公告)日：2010-04-29

申请号：US12683455

申请日：2010-01-07

Applicant: Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

Inventor： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC: G06F19/00 ,  G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

Abstract translation: 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US20080059094A1

公开(公告)日：2008-03-06

申请号：US11846829

申请日：2007-08-29

Applicant: Kei SHIMURA ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

Inventor： Kei SHIMURA ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC: G06F19/00

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

Abstract translation: 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US07953567B2

公开(公告)日：2011-05-31

申请号：US12683455

申请日：2010-01-07

Applicant: Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

Inventor： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC: G06F19/00 ,  G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

Abstract translation: 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US08542354B2

公开(公告)日：2013-09-24

申请号：US12361954

申请日：2009-01-29

Applicant: Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

Inventor： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G06K9/74

Abstract: The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

Abstract translation: 本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带（图1）。

公开(公告)号：US07672799B2

公开(公告)日：2010-03-02

申请号：US11846829

申请日：2007-08-29

Applicant: Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

Inventor： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC: G06F19/00 ,  G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

Abstract translation: 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US08729514B2

公开(公告)日：2014-05-20

申请号：US13114160

申请日：2011-05-24

Applicant: Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

Inventor： Ichiro Ishimaru ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

IPC: G01N21/88

CPC classification number: G01N21/88 ,  G01N21/474 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8825 ,  G01N2021/8854

Abstract: A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.

Abstract translation: 一种缺陷检查装置，包括：第一照明光学系统，被配置为从相对于所述样品表面的法线方向或近似的方向照射样品表面上的检查区域; 第二照明光学系统，被配置为相对于所述样品表面从倾斜方向照射所述检查区域; 检测光学系统，具有分别相对于所述第二照明光学系统的照明方向位于所述检查区域的所述检查区域的前方和后方的多个第一检测器，并且其中所述规则反射光 从所述样品表面通过所述第二照明光学系统的照明光分量不会收敛; 以及信号处理系统，其被配置为基于从所述多个第一检测器获得的信号来检查缺陷。

公开(公告)号：US20120313650A1

公开(公告)日：2012-12-13

申请号：US13580273

申请日：2010-12-01

Applicant: Hiroshi Kawaguchi ,  Minori Noguchi ,  Kenji Aiko ,  Masami Makuuchi

Inventor： Hiroshi Kawaguchi ,  Minori Noguchi ,  Kenji Aiko ,  Masami Makuuchi

IPC: G01R27/26

CPC classification number: H01M10/04 ,  H01M4/04 ,  H01M4/13 ,  H01M10/0409 ,  H01M10/052 ,  H01M10/058

Abstract: An inspection device for detecting small foreign bodies is provided with a first electrode and a second electrode disposed on either side of the inspection target, a power source connected to the aforementioned first electrode, a conveyance speed control unit for controlling the conveyance speed of the aforementioned inspection target, a current detection unit which, connected to the aforementioned second electrode, detects currents generated by changes in the static capacitance formed between the aforementioned first electrode and the aforementioned second electrode, and a defect detection unit which detects defects on the basis of the aforementioned current. Furthermore, the aforementioned second electrode rotates in the direction opposite of the conveyance direction of the aforementioned inspection target. Furthermore, the aforementioned power source includes a DC or an AC power source.

Abstract translation: 用于检测小异物的检查装置设置有设置在检查对象的两侧的第一电极和第二电极，连接到上述第一电极的电源，用于控制上述第一电极的输送速度的输送速度控制单元 检测对象，连接到上述第二电极的电流检测单元，检测由上述第一电极和上述第二电极之间形成的静电电容的变化而产生的电流;以及缺陷检测单元，其基于 上述电流。 此外，上述第二电极沿与上述检查对象的输送方向相反的方向旋转。 此外，上述电源包括DC或AC电源。

公开(公告)号：US08319960B2

公开(公告)日：2012-11-27

申请号：US12770337

申请日：2010-04-29

Applicant: Kenji Aiko ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

Inventor： Kenji Aiko ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

IPC: G01N21/88

CPC classification number: H04N7/18 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is 10a, and an angle between the sample surface and a traveling direction of the light from a defect is α1. An oblique detection optics system receives the light from the defect at a reduced elevation angle α2 with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and to increase the amount of the light from the defect and detected. The diameter 10a of a lens is smaller than the diameter 10b, resulting in a reduction in the ability to focus the scattered light. When a lens with an outer diameter 10c is used to improve the focus ability, the lens interferes with the sample. To avoid the interference, a portion of the lens interfering with the sample is removed. The lens has an aperture larger than the diameter 10b while the lens receives the light scattered at the elevation angle α2, making it possible to improve the ability to detect defects and lens performance simultaneously.

Abstract translation: 缺陷检查系统可以抑制来自样品粗糙表面或常规电路图案的光的影响，并且增加来自诸如异物的缺陷的光的增益以高灵敏度检测样品表面上的缺陷。 当使用具有大NA值的透镜时，透镜的外径为10a，并且样品表面与来自缺陷的光的行进方向之间的角度为α1。 倾斜检测光学系统以相对于样品表面的降低的仰角α2接收来自缺陷的光，以减少来自样品粗糙表面，氧化膜粗糙底表面和电路图案的光，并且增加 来自缺陷的光并检测。 透镜的直径10a小于直径10b，导致散射光聚焦的能力降低。 当使用外径为10c的透镜来提高聚焦能力时，透镜会干扰样品。 为了避免干扰，去除了与样品干扰的一部分透镜。 透镜具有大于直径10b的孔径，而透镜接收以仰角α2散射的光，从而可以提高同时检测缺陷和透镜性能的能力。