公开(公告)号：US6109208A

公开(公告)日：2000-08-29

申请号：US122061

申请日：1998-07-27

申请人： Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Mutumi Tuda ,  Kouichi Ono ,  Kouji Oku ,  Shinji Nakaguma

发明人： Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Mutumi Tuda ,  Kouichi Ono ,  Kouji Oku ,  Shinji Nakaguma

IPC分类号： H05H1/46 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  C23C14/00 ,  C23C16/00 ,  C23F1/02

CPC分类号： H01J37/3222 ,  H01J37/32192

摘要： A plasma generating apparatus capable of improving the uniformity of a plasma processing and coping with a larger diameter of a substrate is obtained. Microwaves are distributed and emitted from a waveguide through the branching portions of a T branch to four rod antennas. The microwaves are introduced through four dielectric tubes into a vacuum vessel. In the vacuum vessel, a multi-cusp magnetic field and an electron cyclotron resonance region are caused by permanent magnets located around the vessel and, by an interaction between a vibrational electric field of the microwaves and a magnetic field, highly uniform plasma is generated in a region where a substrate or the like is subjected to a plasma processing.

摘要翻译： 可以获得能够提高等离子体处理的均匀性并应对基板的较大直径的等离子体产生装置。 微波从波导通过T分支的分支部分分布并发射到四个棒状天线。 微波通过四个电介质导入真空容器中。 在真空容器中，多尖点磁场和电子回旋共振区域由位于容器周围的永磁体引起，并且通过微波的振动电场与磁场之间的相互作用，产生高度均匀的等离子体 对基板等进行等离子体处理的区域。

公开(公告)号：US6054016A

公开(公告)日：2000-04-25

申请号：US31706

申请日：1998-02-27

申请人： Mutumi Tuda ,  Kouichi Ono ,  Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Kouji Oku ,  Shinji Nakaguma

发明人： Mutumi Tuda ,  Kouichi Ono ,  Masaaki Tsuchihashi ,  Minoru Hanazaki ,  Toshio Komemura ,  Kouji Oku ,  Shinji Nakaguma

IPC分类号： H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H05H1/46 ,  C23F1/02 ,  C23C16/00

CPC分类号： H01J37/3222 ,  H01J37/32192 ,  H01J37/32688 ,  H05H1/46

摘要： There is provided a plasma generating apparatus comprising: a waveguide for guiding a microwave; a vacuum vessel connected to the waveguide, having a means for supplying a gas for discharging electrons and a means for evacuating; and a dielectric member in a tube-like shape or a rod-like shape which is inserted in the vacuum vessel, wherein the dielectric member is provided with a means for emitting the microwave, whereby it is possible to apply the electric power of microwave effectively to plasma of high density exceeding so-called cut-off density and to homogenize the distribution of plasma in the vacuum vessel.

摘要翻译： 提供了一种等离子体产生装置，包括：用于引导微波的波导; 连接到波导的真空容器，具有用于提供用于排出电子的气体的装置和用于排空的装置; 以及插入真空容器中的管状或棒状形状的电介质构件，其中，电介质构件设置有用于发射微波的装置，由此可以有效地施加微波的电力 到高密度的等离子体超过所谓的截止密度并使真空容器中的等离子体的分布均匀化。

公开(公告)号：US06929712B2

公开(公告)日：2005-08-16

申请号：US10235783

申请日：2002-09-06

申请人： Minoru Hanazaki ,  Keiichi Sugahara ,  Toshihiko Noguchi ,  Toshio Komemura ,  Masakazu Taki ,  Mutumi Tuda ,  Kenji Shintani

发明人： Minoru Hanazaki ,  Keiichi Sugahara ,  Toshihiko Noguchi ,  Toshio Komemura ,  Masakazu Taki ,  Mutumi Tuda ,  Kenji Shintani

IPC分类号： H05H1/00 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/46 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01J37/32082 ,  H01J37/32935

摘要： A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.

摘要翻译： 等离子体处理装置的高频电流检测器检测从高频电源向腔室供给不在室内产生等离子体的范围内的高频电力时产生的高频电流。 高频电流检测器将检测到的高频电流输出到计算机。 计算机将从高频电流检测器接收的高频电流与参考高频电流进行比较。 当接收的高频电流与参考高频电流相匹配时，计算机确定处理性能正常。 否则，计算机会确定进程性能异常。 以这种方式，检测到对装置特有的高频特性，并且基于检测到的高频特性来评估处理性能。

公开(公告)号：US06651678B2

公开(公告)日：2003-11-25

申请号：US10124729

申请日：2002-04-18

申请人： Kenji Shintani ,  Mutumi Tuda ,  Junji Tanimura ,  Takahiro Maruyama ,  Ryoichi Yoshifuku

发明人： Kenji Shintani ,  Mutumi Tuda ,  Junji Tanimura ,  Takahiro Maruyama ,  Ryoichi Yoshifuku

IPC分类号： H01L21302

CPC分类号： H01L21/32137 ,  H01L21/28123

摘要： A method of etching a semiconductor device preventing tapering of a gate electrode edge includes a main etching of an electrode or wiring material supported by a dielectric film at a semiconductor substrate surface to expose the dielectric film. After the main etching step, residues of the electrode or the wiring material by sequentially etching utilizing a first gas mixture including a halogen-containing gas and an additive gas suppressing etching of the dielectric film by the halogen-containing gas, and in a second gas mixture gas including the halogen-containing gas and the additive gas and having the additive gas amount in a larger concentration than the first gas mixture.

摘要翻译： 蚀刻半导体装置防止栅电极边缘变窄的方法包括在半导体衬底表面上由电介质膜支撑的电极或布线材料的主蚀刻以暴露电介质膜。 在主蚀刻步骤之后，通过使用包含含卤素气体的第一气体混合物和通过含卤素气体抑制介电膜蚀刻的附加气体，并且在第二气体中依次蚀刻电极或布线材料的残留物 包含含卤素气体和添加气体的混合气体，其添加气体量比第一气体混合物浓度大。

公开(公告)号：US06335595B1

公开(公告)日：2002-01-01

申请号：US09641340

申请日：2000-08-18

申请人： Kazuyasu Nishikawa ,  Hiroki Ootera ,  Mutumi Tuda

发明人： Kazuyasu Nishikawa ,  Hiroki Ootera ,  Mutumi Tuda

IPC分类号： H01J724

CPC分类号： H05H1/48 ,  F41J2/00 ,  G01S7/00 ,  G01S7/03 ,  H01Q3/20 ,  H01Q15/14

摘要： A plasma generating apparatus includes a vacuum container, an anode and a cathode including multiple electrodes, a power supply for applying a high voltage to the anode and the cathode, and switching elements for switching the electrodes in the anode and the cathode to which the high voltage is applied. The combination of the electrodes are switched by switching elements to form a sheet plasma at any desired angle relative to directional electromagnetic waves.

摘要翻译： 一种等离子体发生装置包括：真空容器，包括多个电极的阳极和阴极;用于向阳极和阴极施加高电压的电源;以及用于切换阳极和阴极中的电极的开关元件， 施加电压。 通过开关元件来切换电极的组合以相对于定向电磁波形成任何所需角度的片状等离子体。