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    Manufacturing method of solid-state imaging device, solid-state imaging device, and camera
    1.
    发明申请
    Manufacturing method of solid-state imaging device, solid-state imaging device, and camera 审中-公开
    固态成像装置，固态成像装置和相机的制造方法

    公开(公告)号：US20070122935A1

    公开(公告)日：2007-05-31

    申请号：US11602179

    申请日：2006-11-21

    申请人： Masahiro Kasano ,  Yuichi Inaba ,  Keisuke Tanaka ,  Takumi Yamaguchi

    发明人： Masahiro Kasano ,  Yuichi Inaba ,  Keisuke Tanaka ,  Takumi Yamaguchi

    IPC分类号： H01L21/00

    CPC分类号： H01L27/14621 ,  H01L27/14627 ,  H01L27/14636 ,  H01L27/14685 ,  H01L27/14687

    摘要： A manufacturing method of a solid-state imaging device prevents generation of a space due to insufficient filling of a conductive material. Materials constituting a multilayer film 41 are sequentially deposited on a semiconductor substrate, and portions respectively included in a plug formation intended region and a surrounding region that surrounds the plug formation intended region are removed from the deposited multilayer film 41. Next, the plug formation intended region and the surrounding region from which the portions have been removed is refilled with a single insulating material, and a hole is formed on the plug formation intended region by etching. Then, the formed hole is filled with a conductive material to therefore form a plug.

    摘要翻译： 固态成像装置的制造方法防止由于导电材料的填充不充分而产生空间。 构成多层膜41的材料依次沉积在半导体衬底上，并且从沉积的多层膜41中去除分别包含在插塞形成预期区域中的部分和围绕插塞形成区域的周围区域。 接下来，使用单个绝缘材料重新填充已经去除了部分的插塞形成预期区域和周围区域，并且通过蚀刻在插塞形成预期区域上形成孔。 然后，形成的孔填充有导电材料，从而形成插头。

    Solid-State Image Sensor
    8.
    发明申请
    Solid-State Image Sensor 审中-公开
    固态图像传感器

    公开(公告)号：US20080265349A1

    公开(公告)日：2008-10-30

    申请号：US11662263

    申请日：2005-09-07

    申请人： Masahiro Kasano ,  Takumi Yamaguchi

    发明人： Masahiro Kasano ,  Takumi Yamaguchi

    IPC分类号： H01L31/0232

    CPC分类号： G03B11/00 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14632 ,  H01L31/02162 ,  H01L31/0232

    摘要： An object of the present invention is to provide a solid-state image sensor including a filter membrane that has excellent light resistance and can be thinned. A solid-state image sensor 1 having a plurality of pixels, wherein each of the plurality of pixels includes a filter membrane 21 for transmitting light of a predetermined color, and a photoelectric conversion unit 17 for converting the light transmitted through the filter membrane 21 into a charge; the filter membrane 21 is a single layer film composed of an inorganic material; and an optical thickness of the single layer film is smaller than a thickness equivalent to one half of a wavelength of the predetermined color, by a thickness corresponding to an amount of the light of the predetermined color absorbed by the inorganic material.

    摘要翻译： 本发明的目的是提供一种固态图像传感器，其包括具有优异的耐光性并且可以变薄的滤膜。 具有多个像素的固态图像传感器1，其中，所述多个像素中的每一个包括用于透射预定颜色的光的滤光膜21和用于将透过滤膜21的光转换成的光电转换单元17 收费 过滤膜21是由无机材料构成的单层膜; 并且单层膜的光学厚度小于等于预定颜色的波长的一半的厚度，其厚度对应于由无机材料吸收的预定颜色的光的量。

    Optical interference filter that performs excellent color separation, and liquid crystal display, electroluminescence display and projection display apparatus having the optical interference filter
    9.
    发明授权
    Optical interference filter that performs excellent color separation, and liquid crystal display, electroluminescence display and projection display apparatus having the optical interference filter 有权
    具有优异的分色性的光干涉滤光器，具有光干涉滤光器的液晶显示器，电致发光显示器和投影显示装置

    公开(公告)号：US07764340B2

    公开(公告)日：2010-07-27

    申请号：US11898408

    申请日：2007-09-12

    申请人： Yuichi Inaba ,  Takumi Yamaguchi ,  Daisuke Ueda

    发明人： Yuichi Inaba ,  Takumi Yamaguchi ,  Daisuke Ueda

    IPC分类号： G02F1/1335

    CPC分类号： G02B5/285 ,  G02F2001/133521 ,  H01L27/322 ,  H05B33/22

    摘要： An optical interference filter whose major component is a film member. The film member includes a plurality of window regions arranged discretely in a surface direction selectively transmit, using an effect of optical interference, light having a waveband that substantially belongs to a visible spectrum, the plurality of window regions being arranged discretely in the surface direction, and one or more boundary regions selectively transmit, using the effect of the optical interference, light having a waveband that substantially belongs to an invisible spectrum excluding the visible spectrum, the one or more the boundary regions being located between adjacent window regions.

    摘要翻译： 一种光学干涉滤光器，其主要成分是膜元件。 该薄膜构件包括多个沿着表面方向离散布置的窗口区域，该多个窗口区域使用光学干涉的作用选择性地发送具有基本上属于可见光谱的波段的光，该多个窗口区域沿离散方向布置在表面方向上， 并且一个或多个边界区域使用光学干涉的作用选择性地发射具有基本上属于不可见光谱的不可见光谱的波段的光，所述一个或多个边界区域位于相邻窗口区域之间。

    Solid-state imaging device and camera
    10.
    发明申请
    Solid-state imaging device and camera 审中-公开
    固态成像装置和相机

    公开(公告)号：US20070188635A1

    公开(公告)日：2007-08-16

    申请号：US11633583

    申请日：2006-12-05

    申请人： Takumi Yamaguchi ,  Yuichi Inaba ,  Daisuke Ueda

    发明人： Takumi Yamaguchi ,  Yuichi Inaba ,  Daisuke Ueda

    IPC分类号： H04N9/04

    CPC分类号： H01L27/14623 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14643

    摘要： A solid-state imaging device 101 is composed of a transparent film 204, a color filter 205, a planarizing film 207, and a plurality of microlenses 208 that are sequentially formed on a semiconductor substrate 201. A photodiode 202 is formed in a surface of the semiconductor substrate 201 that is closer to the transparent film 204. A light shielding film 203 is formed in a surface of the transparent film 204 that is closer to the semiconductor substrate 201. Color filters 205 respectively corresponding to two adjacent pixels are partitioned by a light shielding wall 206. The light shielding wall 206 is a λ/4 multilayer film that reflects visible light.

    摘要翻译： 固态成像装置101由依次形成在半导体基板201上的透明膜204，滤色器205，平坦化膜207和多个微透镜208构成。光电二极管202形成在 更靠近透明膜204的半导体衬底201.在透明膜204的更靠近半导体衬底201的表面中形成遮光膜203.分别对应于两个相邻像素的滤色器205被分隔开 遮光壁206.遮光壁206是反射可见光的λ/ 4多层膜。